Abstract: A method of treating a substrate comprises, in one aspect, placing a substrate having material on a surface thereof in a treatment chamber; directing a stream of a liquid treatment composition to impinge the substrate surface; and directing a stream of water vapor to impinge the substrate surface and/or to impinge the liquid treatment composition. A preferred aspect of this invention is the removal of materials, and preferably photoresist, from a substrate, wherein the treatment composition is a liquid sulfuric acid composition comprising sulfuric acid and/or its desiccating species and precursors.

Abstract: The invention relates to a method for controlling a vehicle washing installation with the use of a light-section procedure, wherein at least one treatment device (1) and a vehicle (2) to be washed are moved relative to each other in the washing direction (L), the vehicle surfaces are illuminated by two light fans (11, 12) starting from different positions, a first (FIG. 7) and a second (FIG. 8) two-dimensional depiction of the vehicle surfaces illuminated by the light fans (11, 12) are recorded from shooting angles which are oblique with respect to the planes of the light fans, and are stored in a control unit (20) together with the relative position and/or relative movement of treatment devices (1) and vehicle (2), the preceding steps are repeated during a traversing operation from one end to the other end of the vehicle (2), and, during or after the end of the traversing operation, a three-dimensional representation of the vehicle surfaces is calculated from the two-dimensional depictions (FIG. 7, FIG.

Abstract: A method of controlling a dish washing machine capable of automatically washing items to be washed is disclosed. The method includes performing a steam spraying action defined to spray stream on a plurality of racks containing items to be washed, initiating a first water spraying action defined to spray on at least one first rack which is exposed firstly to the stream, and initiating a second water spraying action defined to spray water on at least one second rack, different from the first rack, wherein spraying water on the first rack begins prior to spraying water on the second rack.

Abstract: Disclosed is a substrate cleaning apparatus including a brush cleaning unit which cleans a substrate by making a roll brush in contact with a surface of the substrate, and a transporting unit which conveys the substrate. The roll brush includes a bristle. At least one of a diameter of the roll brush, stiffness of the bristle, and density of the bristle becomes larger from an end portion of the roll brush to a central portion thereof.

Abstract: A board terminal cleaning apparatus for cleaning a terminal portion by bringing a cleaning member in contact with the terminal portion of a board comprises a first support member that supports the cleaning member in a first position, a second support member that supports the cleaning member in a second position, a cleaning head that pressurizes part of the cleaning member supported between the first position and the second position by bringing the part in contact with the terminal portion of the board, a support member moving unit that moves the first support member and the second support member in the direction along the terminal portion, and a cleaning head moving unit that moves the cleaning head in the direction along the terminal portion at a second movement velocity different from the first movement velocity of the first support member and the second support member by the support member moving unit.

Abstract: A dish washing machine is provided having a dosing device operable to add an additive product into the dishwasher, the dosing device being operatively connected to an arrangement that separately stores the basic chemical products of an all-round additive product independent of one another. The dosing device is operable to independently add into the dishwasher one basic chemical product not used for clear rinsing of the all-round additive product, at least two, but not all, of the basic chemical products of the all-round additive product together, or at least one reaction mixture consisting of the basic chemical products of the all-round additive product.

Abstract: A cleaning device for a medical implement is disclosed. The cleaning device includes a cap having an opening to an inner cavity, the opening being adapted to receive a site of the medical implement. The cleaning device further includes a compressible cleaning material that contains a cleaning agent prior to receipt of the site of the medical implement, i.e. the cleaning material is pre-loaded with the cleaning agent. The compressible cleaning material is at least partially secured in the inner cavity and adapted to swab and clean the site with the cleaning agent.

Abstract: An apparatus for controlling an operation of a robot cleaner including: a battery installed in the robot cleaner; and a means for selectively cutting off power supply of the battery to at least one or more units operated for performing a cleaning operation when the cleaning operation of the robot cleaner is stopped. When the cleaning operation of the robot cleaner is stopped, the robot cleaner is changed to the power saving mode or to the standby mode, and accordingly, power consumption of the battery of the robot cleaner can be reduced.

Abstract: A cleaning device comprising an enclosure, a cover allowing it to be opened in order to place an object to be cleaned within the enclosure, a supply of cleaning fluid, the enclosure comprising a piston that can move thanks to a motor, a geometry allowing a contact with an external fluid reservoir when the piston occupies a certain position within the enclosure in order to generate a sudden release of pressure, the device comprising an outlet valve remaining closed when the piston increases the volume of the enclosure so as to cause the pressure reduction within the enclosures.

Abstract: A control system for controlling a fill operation of a dishwasher having a pump and a pump motor driving the pump, and the dishwasher having a valve for controlling the flow of water to the dishwasher includes a monitoring device configured to be coupled to at least one of the pump and the pump motor. The monitoring device generates an output relating to at least one of an operating current and a speed of the pump motor. The control system also includes a controller configured to be operatively coupled to the valve, wherein the controller receives the output and is configured to operate the valve based on the output. The output relates to a fill condition of the dishwasher.

Abstract: A method of removing and/or reducing undesirable contaminants removes residues including graphitic layers, fluorinate layers, calcium sulfate (CaSO4) particles, tin oxides and organotin, from a chip passivation layer surface. The method uses a plasma process with an argon and oxygen mixture with optimized plasma parameters to remove both the graphitic and fluorinated layers and to reduce the level of the inorganic/tin oxides/organotin residue from an integrated circuit wafer while keeping the re-deposition of metallic compounds is negligible. This invention discloses the plasma processes that organics are not re-deposited from polymers to solder ball surfaces and tin oxide thickness does not increase on solder balls. The ratio of argon/oxygen is from about 50% to about 99% Ar and about 1% to about 50% O2 by volume. Incoming wafers, after treatment, are then diced to form individual chips that are employed to produce flip chip plastic ball grid array packages.

Abstract: The present application relates to a method and device for cleaning surfaces. In one embodiment, a cleaning device includes a cleaning tool, a motor, a reservoir, an extractor, and a recovery tank. The reservoir stores fluid and may act as a base of the cleaning device. The extractor suctions used fluid from the surface and may be removably attached to the reservoir such that the extractor may be raised and lowered relative to the surface. The recovery tank stores the used fluid from the extractor and may be located adjacent the reservoir. The reservoir may also be formed to fit at least partially around the motor. The cleaning device may also be designed such that at least a portion of the weight of the fluid in the reservoir and the used fluid in the recovery tank is over the cleaning tool.

Abstract: Systems and methods for treating workpieces are described. One embodiment relates to a deflux system including at least one array of nozzles, the nozzles adapted to transmit a fluid outward therefrom. The nozzles are moveable relative to one another, so that a distance between adjacent nozzles can be varied. The nozzles are individually adjustable with respect to an angle of spray emitted therefrom during operation. The system also includes a controller adapted to send a signal to each of the nozzles to transmit the fluid therethrough at a desired angle at a desired time. Other embodiments are described and claimed.

Abstract: A cleaning method for cleaning a powder container by introducing a cleaning medium into the powder container from a first opening part of the powder container for attaching powder in the powder container to the cleaning medium and discharging the cleaning medium together with the powder from a second opening part situated opposite from the first opening part is disclosed. The method includes a step of releasing the cleaning medium from a position higher than the first opening part of the powder container.

Abstract: Method for cleaning a surface is disclosed comprising a cleaning step with an aqueous cleaning medium, which is supplied to said semiconductor surface wherein the cleaning medium comprises cleaning particles suspended in a colloidal form and mechanical agitation is applied to the particles to be removed for at least part of the time during the cleaning step.

Abstract: Some embodiments include methods for treating surfaces. Beads and/or other insolubles may be dispersed within a liquid carrier to form a dispersion. A transfer layer may be formed across a surface. The dispersion may be directed toward the transfer layer, and the insolubles may impact the transfer layer. The impacting may generate force in the transfer layer, and such force may be transferred through the transfer layer to the surface. The surface may be a surface of a semiconductor substrate, and the force may be utilized to sweep contaminants from the semiconductor substrate surface. The transfer layer may be a liquid, and in some embodiments may be a cleaning solution.

Abstract: A drawer-type dishwasher includes a tub having front, rear, bottom and opposing side walls that collectively define a washing chamber and a lid shiftably mounted relative to the tub for selectively closing the washing chamber. A dispenser is mounted to one of the front, rear and opposing side walls and includes a detergent storage portion that is selectively exposed to release detergent into the washing chamber. The lid includes a dispenser rinse system having an inlet portion and an outlet portion, with the outlet portion guiding a flow of water from the lid onto the dispenser to wash out the detergent storage portion and fill the washing chamber. The outlet portion is preferably provided with a shaped contour and a wall that ensures that the all detergent is washed out from the dispenser.

Abstract: Methods, apparatus, and kits are described, one method embodiment comprising loading a solids-laden screen into a carriage of a washing enclosure, the solids-laden screen comprising a screen mesh partially obstructed with solids from a well drilling or work-over operation, and spraying a cleaning composition onto first and second sides of the screen while vibrating the screen. Apparatus and kits for practicing the methods are also described. This abstract allows a searcher or other reader to quickly ascertain the subject matter of the disclosure. It will not be used to interpret or limit the scope or meaning of the claims.

Abstract: According to one embodiment of the present invention, a method of cleaning one or more fluid plenums of an electrode assembly is provided. According to the method, a plurality of fluid ports in communication with the fluid plenum are isolated and differentiated into respective sets of plenum input ports and plenum output ports. The input and output ports are engaged with respective cleaning fluid couplings. A cleaning fluid is directed through the fluid plenum by creating a fluid pressure differential ?P=PIN?POUT across the plenum input and output ports. The pressure differential ?P is large enough to force cleaning fluid from the cleaning fluid supply duct to the cleaning fluid waste duct through the fluid plenum. Additional embodiments are disclosed and claimed.

Abstract: Chemical method of cleaning metallic residue from forming tools utilizing the application of a caustic material including base or mild acid to the tool for a short period of time. The caustic material is held in substantially fixed relation for a period of time to dislodge the metallic residue followed by neutralization or removal.