Patents Examined by Nicholas J Tobertge
  • Patent number: 11024630
    Abstract: A memory cell comprises first and second transistors laterally displaced relative one another. A capacitor is above the first and second transistors. The capacitor comprises a container-shape conductive first capacitor node electrically coupled with a first current node of the first transistor, a conductive second capacitor node electrically coupled with a first current node of the second transistor, and a capacitor dielectric material between the first capacitor node and the second capacitor node. The capacitor dielectric material extends across a top of the container-shape first capacitor node. Additional embodiments and aspects, including method, are disclosed.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: June 1, 2021
    Assignee: Micron Technology, Inc.
    Inventor: Scott E. Sills