Patents Examined by Olik Chaudruri
  • Method of forming silicon dioxide glass films
    Patent number: 5028566
    Abstract: The manufacture of semiconductor devices and, specifically, deposition of SiO.sub.2 films on semiconductor devices by oxidative decomposition of oligo siloxanes at low temperature is disclosed.
    Type: Grant
    Filed: July 27, 1990
    Date of Patent: July 2, 1991
    Assignee: Air Products and Chemicals, Inc.
    Inventor: Andre Lagendijk