Abstract: The present invention relates to a semiconductor device, and more particularly to a structure of a semiconductor wafer and a fabrication method of semiconductor chips. According to the present invention, a semiconductor wafer containing a plurality of semiconductor chip portions has a plurality of chip scribe lanes formed between the semiconductor chip portions. A plurality of chip bonding pads are formed on the semiconductor chip portions of the wafer, and a plurality of wafer probing pads are formed on the chip scribe lanes. The wafer probing pads are electrically connected to internal circuits of the semiconductor chip portions and/or to corresponding ones of the chip bonding pads.

Abstract: A grid array package and a method for fabricating the same. The contact pads of the grid array package form three distinct groups: an outer array, a intermediate group, and a center array. The center array is positioned in the center of the package, the intermediate group forms a ring around the center array, and the outer array forms a ring around both the intermediate group and the inner array. The contact pads of the center array connect to ground. Most of the contact pads of the intermediate group connect to power, but selected contact pads of the intermediate group connect to ground. Within the outer array, most of the contact pads connect the integrated circuit to outside circuitry, but selected contact pads of the outer array connect to ground.

Abstract: A reduction in parasitic leakages of shallow trench isolation vias is disclosed wherein the distance between the silicon nitride liner and the active silicon sidewalls is increased by depositing an insulating oxide layer prior to deposition of the silicon nitride liner. Preferably, the insulating oxide layer comprises tetraethylorthosilicate. The method comprises of etching one or more shallow trench isolations into a semiconductor wafer; depositing an insulating oxide layer into the trench; growing a thermal oxide in the trench; and depositing a silicon nitride liner in the trench. The thermal oxide may be grown prior to or after deposition of the insulating oxide layer.

Abstract: Disclosed is a semiconductor package having: a semiconductor chip; a package substrate; a wire connected to the semiconductor chip; and an electric connection member formed on the package substrate to electrically connect the wire to a printed board when the package substrate is mounted on the printed board. One surface of the package substrate has a first area in which the semiconductor chip is mounted and a second area in which the wire are arranged, and the other surface has a third area which is located in the rear of the second area and in which the electric connection member connects the wire to the printed board and a fourth area which is located in the rear of the first area. A heat-transfer member is provided in the fourth area and transmits heat generated by the semiconductor chip to the printed board through the package substrate.

Abstract: A method of forming a self-aligned salicide is provided. The invention twice performs selective epitaxial growth to form an amorphous silicon layer on gate electrodes and source/drain regions of a substrate after forming the gate electrodes and the source/drain regions. Then, a molybdenum impurity is doped to perform a silicidation process and to convert a metal deposited on the substrate into a salicide layer.

Abstract: An efficient method is proposed for the preparation of a silicon single crystal wafer for discrete semiconductor devices, such as transistors, deeply doped with a dopant on one surface, the other surface being mirror-polished.