Abstract: Trenching techniques for forming a channel partially through and a via completely through the insulating layer of a substrate are disclosed. With additional steps the channel can form an electrically conductive line, an electrode of an integrated capacitor, or an optical waveguide.
Type:
Grant
Filed:
February 24, 1992
Date of Patent:
June 15, 1993
Assignee:
Microelectronics and Computer Technology Corporation
Inventors:
David H. Carey, Douglass A. Pietila, David M. Sigmond
Abstract: A programmable resistive element is provided which includes a channel 16 comprising a layer of gallium arsenide. A programming barrier 18 is disposed outwardly from channel 16. A storage gate 20 comprising a layer of intrinsic gallium arsenide is disposed outwardly from programming barrier 18. An insulator 22, comprising a layer of aluminum-gallium-arsenide, is disposed outwardly from storage gate 20. A control gate 24 is disposed outwardly from insulator 22. First and second spaced apart contacts 26 and 28 contact channel 16.