Abstract: A wafer carrier for growing wafers includes a plate having a first surface and a second surface, a plurality of openings extending from the first surface to the second surface of the plate, and a porous element disposed in each of the plurality of openings, each porous element being adapted to support one or more wafers. The wafer carrier also has a blind central opening extending from the second surface toward the first surface of the plate, and a plurality of shafts extending outwardly from the blind central opening. Each shaft has a first end in communication with the blind central opening and a second end in communication with one of the porous elements for providing fluid communication between the blind central opening and one of the porous elements. Suction is formed at a surface of each porous element by drawing vacuum through the blind central opening and the shafts.
Type:
Grant
Filed:
October 28, 2004
Date of Patent:
June 26, 2007
Assignee:
Veeco Instruments Inc.
Inventors:
Vadim Boguslavskiy, Alex Gurary, Richard A. Stall
Abstract: A substrate processing apparatus is disclosed. In one embodiment, the apparatus includes a first atmospheric deposition station and a second atmospheric deposition station. The second atmospheric deposition station comprises an atmospheric pressure vapor deposition chamber. A substrate handling system is adapted to transfer substrates between the first and the second atmospheric deposition stations.
Type:
Grant
Filed:
August 23, 2001
Date of Patent:
January 11, 2005
Assignee:
Applied Materials, Inc.
Inventors:
Michael Barnes, Michael S. Cox, Canfeng Lai, John Parks