Abstract: A wafer restraining device clips onto a semiconductor wafer cassette. The wafer restraining device is provided with at least one opening to allow bubbles forming during acid baths on excess resist-covered semiconductor wafers to escape. Portions of the wafer restraining device only contact the periphery of the sensitive, disc-shaped semiconductor wafers.

Abstract: In a sensor layer for quantitative determination of at least one chemical component in a gaseous or liquid sample medium containing a chromophore which is directly or indirectly responsive to the component being determined by changing its absorption spectrum, and a luminophore which is not responsive to the component being determined, where there is an at least partial overlap between the emission spectrum of the luminophore and the absorption spectrum of the chromophore, and where the energy transfer between luminophore and chromophore produces a measurable change in at least one luminescence characteristic of the luminophore, the luminophore L and the chromophore .GAMMA. are ionic substances with differing electrical charges, which are incorporated in a matrix material that is permeable to the chemical component being determined.

Abstract: An under counter dish washing machine has an upper spray assembly with a spray base recessed at the top of the wash compartment. An enclosed control housing is provided around the recess to house various controls in order to make use of what is otherwise wasted space. The sump of the machine is covered by a screen having an opening in which a pump filter moves up and down to open and close the drain opening. The filter has a perforated body so that all water draining to the sump must pass through either the screen openings or the perforations of the pump filter. The supply hose which delivers water to the machine is relieved from constant water pressure by a solenoid valve which closes except during a fill cycle of the machine.

Abstract: An under counter dish washing machine has an upper spray assembly with a spray base recessed at the top of the wash compartment. An enclosed control housing is provided around the recess to house various controls in order to make use of what is otherwise wasted space. The sump of the machine is covered by a screen having an opening in which a pump filter moves up and down to open and close the drain opening. The filter has a perforated body so that all water draining to the sump must pass through either the screen openings or the perforations of the pump filter. The supply hose which delivers water to the machine is relieved from constant water pressure by a solenoid valve which closes except during a fill cycle of the machine.

Abstract: Apparatus and method are provided for improved washing and drying of semiconductor wafers utilizing an enhanced "Marangoni effect" flow of liquid off of the wafers for superior prevention of watermarks (water spots) on integrated circuits (ICs) on the wafers. The apparatus includes a housing 12 which may be hermetically sealed, an open-top wash tank 60 within a lower part of the housing, a moveable rack 16 for holding the wafers either in the tank for washing or in an upper part of the housing for drying, apparatus 34 for supplying chilled (near freezing) de-ionized water (DIW) to a lower part of the tank, the DIW flowing within the tank and overflowing the top thereof, a pump 20 for draining overflowing DIW from the housing, and apparatus 40 for supplying to the housing organic vapor such as isopropyl alcohol (IPA) in a dry gas such as nitrogen. During wafer drying operation of the apparatus the pressure within the housing is kept at about one Torr or less.

Abstract: An apparatus for use in removing oil containing contaminants from articles includes a wash station and a rinse station. At the wash station, the articles are immersed in a tank of wash water containing detergent to remove oil containing contaminants from the articles. A flow of wash water containing the detergent and oil is conducted through an oil retainer. The oil is removed from the wash water and retained by the oil retainer. A flow of wash water which contains detergent and is substantially free of oil, is conducted from the oil retainer apparatus back to the wash tank. After having been removed from the wash tank, the articles are immersed in deionized rinse water in a rinse tank to remove detergent and any remaining oil containing contaminants from the articles.

Abstract: A headspace autosampling apparatus (92) for generating and delivering gaseous samples to a gas chromatograph or other instrument. The vials are delivered one at a time through a vial delivery mechanism (160) to a heated zone (146) wherein the substances (94, 96) to be analyzed reach equilibrium with the headspace (100, 102) above the samples in the vials. The vials are generally cylindrical and extend horizontally to facilitate attainment of equilibrium rapidly upon heating. The vials are also preferably rotated about their longitudinal axis prior to sampling so as to achieve a film effect on the interior walls of the vials which further aids in attainment of equilibrium. The apparatus is operative to first pressurize the headspace in the vial with an inert gas, and then to place said headspace in fluid communication with the inlet of a gas chromatograph wherein analyses in the headspace volume are analyzed to determine the composition thereof.

Abstract: A megasonic cleaning system includes a transducer on which a substrate to be cleaned is placed. An oscillating electrically energy source is coupled to the transducer for driving the transducer to produce acoustical energy at substantially megasonic frequencies to vibrate the substrate. A blower assembly is arranged over the substrate, and the blower assembly contains a hollow elongate member having a plurality of nozzles spaced along a length thereof. A drive mechanism is connected to the blower assembly such that the blower assembly is horizontally movable relative to the surface of the substrate. A source of cleaning fluid is in flow communication with the nozzles, and the nozzles are arranged such that a flow path of cleaning fluid through the nozzles is inclined toward an upper surface of the substrate to be cleaned. A vacuum source is in flow communication with the substrate for vacuum-adhering the substrate on the transducer via a vacuum force.

Abstract: A denture cleaning apparatus is provided including a housing including a lower extent and an upper extent. A basket is situated in the upper extent of the housing. An agitator is rotatably mounted within the upper extent of the housing below the basket. Finally, a motor is mounted within the lower extent of the housing and coupled to the agitator for rotating the same only during the receipt of power.

Abstract: In order to remove, after treatment of wafer-shaped articles (2), prefera a silicon wafer, with a treatment medium, preferably with an etching fluid, on the bottom of wafer-shaped article (2), i.e. the side facing chuck (1) for wafer-shaped article (2), residual treatment medium adhering in its edge area, there is nozzle (20) from which flushing liquid, preferably deionized water, can be sprayed onto the outside edge of article (2) and between chuck (1) and wafer-shaped article (2). The flushing liquid, which penetrates more or less deeply, depending on the pressure with which the flushing liquid emerges from nozzle (20) and depending on the alignment of nozzle (20) relative to wafer-shaped article (2), is flung off again by the rotation of wafer-shaped article (2) and in doing so entrains residues of treatment medium. For optimum action the alignment of nozzle (20) can be changed relative to edge (16) of wafer-shaped article (2).

Abstract: To provide a wash tank which is excellent in washing effect with a simple structure, compact, highly practical and effective in washing small molded parts made of rubber or plastic, the wash tank includes a sealable lid having a washing fluid outlet, a conical bottom wall portion having a washing fluid inlet and a cylindrical side wall portion, having a draft tube in a bugle-like shape a bottom end and an upper end of which are expanded and which is disposed at the inside of the tank and a partition plate arranged at a front face of the draft tube and further provided with a jet stream nozzle at a washing fluid inlet portion where the tank is constituted reversibly.

Abstract: A drying apparatus 20 for removing residual liquid from a substrate surface comprises a vapor chamber 25 having a vapor distributor 30 for introducing vapor into the chamber. The drying apparatus 20 further comprises a fluid system 35 comprising (i) a reservoir 40, (ii) a fluid dispenser 45 for introducing fluid into the reservoir, and (iii) a fluid level adjuster 50 for lowering a fluid surface level in the reservoir 40. A multi-point holder 62 is used for holding the substrate 55 at different holding points 63 on the substrate, while the fluid surface level is lowered relative to the substrate, so that residual liquid flows off the substrate surface without intersection of the lowering fluid surface level with holding points 63 on the substrate. The drying apparatus 20 dries substrates 55 substantially without forming stains or streaks, or causing contamination or liquid residue to remain on the substrate 55.

Abstract: A manifold unit for extracting water from a photographic film strip. The manifold unit comprises a base wall lying along a plane transversely intercepting the broad face of the curved film strip, a number of elongated members extending from the base wall towards the broad face of the film strip and spaced apart to define air conduits therebetween, the elongated members having terminal surfaces adjacent to the film strip and forming an acute angle with the film strip path such that the trailing edge of the terminal surface is closest to the film strip, air pressure conduit in communication with some of the air conduits and air suction conduit in communication with other of the air conduits.

Abstract: The invention is a corner unloader for a warewasher. The corner unloader includes a frame defining a corner having an inlet end and a discharge end; a pivoting carriage mounted within the frame; the carriage comprising at least two spokes and a bracket interconnecting the spokes; a plurality of pusher elements pivotally mounted to the bracket; a drive arm for providing motion to and driving the carriage; such that retraction of the drive arm causes the carriage to rotate in a counterclockwise direction and causes pusher elements to advance any racks received on the carriage from the inlet end in a direction toward the discharge end of the unloader and extension of theorize arm causes the carriage to rotate in a clockwise direction and the pusher elements pivot under the racks, whereby repeatedly extending and retracting of the carriage pushes racks through the unloader from the inlet end to the discharge end.

Abstract: A liquified gas dry-cleaning system including a storage tank containing a liquified gas derived from a liquifiable gas, a pressure vessel for containing a liquid bath derived from the liquifiable gas, and a circulating system for transporting the liquified gas between the storage tank and the pressurized vessel. The pressurized vessel includes a compressor mounted in a wall structure of the vessel for use in evacuating a gaseous form of the liquifiable gas released from the liquid bath during a cleaning cycle. Positioning of the compressor in this manner allows heat generated during each compression stroke of the compressor to be directed to the interior of pressure vessel to minimize the effects of a temperature decrease incident to the gaseous evacuation.

Abstract: A nozzle for spraying a cleaning solution, a body of the nozzle having its intake at one end, its sealed end portion at the other end, and a plurality of holes arranged linearly on its surface form inside of the body to outside of the body are disclosed. Also disclosed is a cleaning apparatus of a semiconductor device which includes a bath where wafers are cleaned and a cleaning solution spraying nozzle mounted at the bottom of the bath for spraying a cleaning solution through a plurality of holes formed on its surface, with the nozzle's one side being connected to a cleaning solution supply tube and the nozzle's other side being sealed. The hole's area through which the solution passes gradually decreases from one side of the nozzle through which the cleaning solution is induced, to the other side sealed so that the solution is sprayed with a uniform pressure.

Abstract: An improved blind washing device comprising a frame supporting a plurality of open-ended tubes, closure mechanism for selectably closing said tubes, mechanism for elevating one end of said tubes, a hose connection for delivering water into said tubes, a spray arm, an extensible hose connected to deliver water to said spray arm, an outlet drain and filter mechanism connected between said tubes and said outlet drain.