Patents Examined by Pegah Parvin
  • Patent number: 8012253
    Abstract: Precipitated silicas and wax-coated precipitated silicas, their preparation, and their use as matting agents in inks and paints, the precipitated silicas characterized by: BET 350-550 m2/g DBP number 320-400 g/100 g d50 5-15 ?m, and tamped density 20-90 g/l.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: September 6, 2011
    Assignee: Evonik Degussa GmbH
    Inventors: Juergen Schubert, Robert Kuhlmann, Hans Dieter Christian
  • Patent number: 7875091
    Abstract: A rapid structuring media cartridge includes a cartridge body, a first binder and first abrasive particles. The cartridge is operable to deposit successive patterned layers including the first binder and first abrasive particles to form an abrasive structure.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: January 25, 2011
    Assignee: Saint-Gobain Abrasives, Inc.
    Inventors: Damien Nevorct, Gwo Swei, Alain Zanoli
  • Patent number: 7867303
    Abstract: A cerium oxide abrasive slurry having, dispersed in a medium, cerium oxide particles whose primary particles have a median diameter of from 30 nm to 250 nm, a maximum particle diameter of 600 nm or smaller, and a specific surface area of from 7 to 45 m.2/g, and slurry particles have a median diameter of from 150 nm to 600 nm. The cerium oxide particles have structural parameter Y, representing an isotropic microstrain obtained by an X-ray Rietveld method (with RIETAN-94), of from 0.01 to 0.70, and structural parameter X, representing a primary particle diameter obtained by an X-ray Rietveld method (with RIETAN-94), of from 0.08 to 0.3. The cerium oxide abrasive slurry is made by a method of obtaining particles by firing at a temperature of from 600° C. to 900° C. and then pulverizing, then dispersing the resulting cerium oxide particles in a medium.
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: January 11, 2011
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno, Yuuto Ootuki