Abstract: This invention pertains to systems for extending the pulse length of pulsed sources of optical radiation. These systems reduce peak optical pulse power without reducing average optical power. The pulse-width extending systems split optical pulses into pulse portions, introduce relative delays among the pulse portions, and then redirect the pulse portions (or portions thereof) along a common axis. Such pulse-width extending systems are especially useful in projection-exposure apparatus for the manufacture of semiconductor devices where short wavelength, high power optical sources tend to damage optical components.

Abstract: A projection aligner and a projection aligning method for projecting light onto a circuit pattern on a reticle and for aligning and projecting the circuit pattern onto a substrate via a projection lens assembly. A reticle reference data curve is generated, which indicates a relationship between exposure time of the reticle and a variation in the exposure magnification of the reticle, which curve is obtained when exposure is performed under a reference exposure condition established using a parameter governing the exposure magnification of the reticle. A projection lens reference data curve is generated, indicating a relationship between exposure time of the projection lens assembly and a variation in the exposure magnification of the lens assembly, which curve is obtained when exposure is performed under a reference exposure condition established using a parameter governing the exposure magnification of the projection lens assembly.

Abstract: A resist process method includes the steps of, preparing a process section for processing a wafer, means for extracting the wafer from a cassette and conveying the substrate to the process section, a cleaning section for finally cleaning the wafer processed by the process section, means for transferring the wafer from the process section to the cleaning section, and means for receiving the wafer from the cleaning section and storing the wafer in a cassette, extracting the wafer from the cassette, conveying the extracted wafer to the process section, causing the process section to include at least a process of developing the resist coated onto the wafer, transferring the wafer from the process section to the cleaning section after at least the developing process, finally cleaning the non-resist coated surface of the wafer by applying a cleaning solution to at least the non-resist coated surface of the substrate in the cleaning section, and storing the finally cleaned wafer in the cassette.

Abstract: A digital electron lithography system includes a plurality of cathodes oriented in a plane and positioned substantially parallel to a substrate surface in a vacuum chamber. The substrate surface is coated with a layer of an electron resist material and, in operation, individual cathodes in the array are selectively activated to emit electrons which alter the resist material. In order to create a predetermined pattern on the substrate, a focusing magnet is provided to direct the electrons from the respective cathodes to be focused on the substrate surface along substantially parallel electron paths. Additionally, a steering magnet is provided to change electron path directions so that electrons are steered to sequentially affect a plurality of pixels in a pixel matrix on the substrate surface. To minimize ion damage to the cathodes the electron paths are oriented at an angle to the perpendicular direction between the plane of the array and the substrate surface.

Abstract: An iris diaphragm for selectively varying a diameter of an aperture, the iris diaphragm comprises at least two movable blades which are adaptable for forming the aperture; and a plurality of ceramic motors respectively attached to each one of the blades for causing said blades to vary the aperture formed therefrom.

Abstract: A copying apparatus is adjusted in order to produce high-quality copies of transparent negatives or diapositives having excessive variations in brightness. The adjustment is performed using a reference master. The apparatus is properly adjusted when a copy of the reference master meets specific criteria.

Abstract: An image forming apparatus for forming an image by exposing and developing the photosensitive record medium, the photosensitive record medium having a first microcapsule whose strength is changed by being emitted a blue light, a second microcapsule whose strength is changed by being emitted a green light, and a third microcapsule whose strength is changed by being emitted a red light, the image forming apparatus comprising: an exposing device on which a first light emitting device for emitting the blue light, a second light emitting device for emitting the green light and a third light emitting device for emitting the red light are mounted, for exposing the photosensitive record medium by the blue light, the green light and the red light; a developing device for developing the exposed photosensitive record medium by applying a pressure to the exposed photosensitive record medium; and a transporting unit for transporting the photosensitive record medium from an exposing position where the exposing device is mo

Abstract: A heating device, in which a photosensitive material and an image receiving material can be heated quickly and which has a reduced number of parts. A plate-shaped heating plate, which can move reciprocally within the device, is provided at a heat development transfer section. Attaching/peeling rollers, which can move closer to and away from the heating plate, are disposed above the heating plate. Further, a photosensitive material peeling pawl and an image receiving material peeling pawl are provided on the sides of the attaching/peeling rollers. During two reciprocal movements of the heating plate, the photosensitive material and the image receiving material are loaded on the heating plate, heat-development-transferred, and peeled. Because the respective materials are pressed by the attaching/peeling rollers and adhered to the heating plate, good heat development transfer can be effected in a short time.

Abstract: An image frame selecting device for a photographic printer comprises an image processing device for reading an image frame of a negative film and for multiple image frames in a multi-frame illustrative pattern on a monitor; an illustrative pattern switching device for changing the multi-frame illustrative patterns; a plurality of selection keys disposed corresponding to the arrangement of each image frame in the multi-frame illustrative pattern; and a selection key control device for assigning the selecting function of the image frames displayed on the monitor to only the keys whose positions correspond respectively to those of image frames in the multi-frame illustrative pattern selected by the illustrative pattern switching device.

Abstract: In a method for structuring a photolithographic layer a first pattern is ated on a first plane light modulator. The first plane light modulator comprises a plurality of picture elements, and the first pattern is defined by a prescribed number of addressed picture elements. Then a second pattern is created on a second plane light modulator. The second plane light modulator comprises a plurality of picture elements, and the second pattern has a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to this a second region of addressed picture elements. Finally the first and the second pattern are imaged onto a region to be exposed of the layer to be structured.

Abstract: A method is providing for making a multi-level reticle which transmits a plurality of incident light intensities, which in turn, are used to form a plurality of thicknesses in a photoresist profile. A partially transmitting film, used as one of the layers of the reticle, is able to provide an intermediate intensity light. The intermediate intensity light has an intensity approximately midway between the intensity of the unattenuated light passing through the reticle substrate layer, and the totally attenuated light blocked by an opaque layer of the reticle. The exposed photoresist receives light at two intensities to form a via hole in the resist in response to the higher intensity light, and a connecting line to the via at an intermediate level of the photoresist in response to the intermediate light intensity. A method for forming the multi-level resist profile from the multi-level reticle is provided as well as a multi-level reticle apparatus.

Abstract: To improve the focus accuracy during alignment and to improve the alignment accuracy even if a substrate has warpage, during alignment, an approximate focus plane is obtained by using only the detection results at focus points of focus sensors located near the ends of a substrate, close to alignment points, and without using the detection results at focus points of two central focus sensors. The auto-focus operation is performed by using the above operation results. As a result, a substrate is driven so as to be adjusted to the approximate focus plane during alignment.

Abstract: A master to be copied has a picture in which a dark region and a light region are located one behind the other. The two regions are separated by a light/dark transition where a halo can develop on copies of the master. Prior to copying, the master is scanned and the resulting data used to produce a mask for the master. The mask has a light/dark transition corresponding to the light/dark transition of the master. However, the light/dark transition of the mask is shifted relative to the light/dark transition of the master. The shift is such that, when the mask is superimposed on the master, the light/dark transition of the mask is superimposed on a region of the master which reduces the visibility of the halo. The master is copied following masking.

Abstract: A film holder holds a plurality of film pieces which are obtained by cutting a film having a plurality of frames between the forward and rear longitudinal ends. The film pieces are cut from the film in such a manner that the first and the last two pieces will contain fewer frames than a predetermined total number of frames while the others will contain the predetermined total number of frames. The invention provides a method and a system capable of specifying a position of a designated frame in these film pieces as held in the holder based on a serial frame number of a first reference frame selected from the frames contained in the second to last film piece and a serial frame number of a second frame selected so as to allow determination of the total number of the frames contained in the second to last film piece.

Abstract: An average density of an image is calculated based on image data of an original and a calculated average density is compared with a previously determined threshold value. When the average density is less than or equal to the threshold value, the image is recorded on a negative photosensitive material of which density becomes higher with an increase in exposure amount. When the average density exceeds the threshold value, the image is recorded on a positive photosensitive material of which density becomes low with an increase in exposure amount. When the average density is less than or equal to the threshold value and the image is recorded on the positive photosensitive material, a density value of image data is converted to be suitable for the positive photosensitive material and when the average density exceeds the threshold value and the image is recorded on the negative photosensitive material, a density value of image data is converted to be suitable for the negative photosensitive material.