Patents Examined by Ponder Thompson-Rummel
  • Nitrogen-containing organic compound, chemically amplified resist composition and patterning process
    Patent number: 7261995
    Abstract: Chemically amplified resist compositions comprising nitrogen-containing organic compounds having a 7-oxanorbornane-2-carboxylic ester structure have resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: August 28, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Koji Hasegawa, Katsuya Takemura, Kazumi Noda