Abstract: Apparatus for providing pulsed or continuous energy in a process chamber are provided herein. The apparatus may include: a process chamber body of the semiconductor process chamber; one or more solid state source arrays providing pulsed or continuous energy to the process chamber, wherein each of the one or more solid state source arrays include a substrate having a plurality of solid state light sources disposed on a first surface of the substrate, wherein the plurality of solid state light sources are connected in series and in a recursive pattern on the first surface of the substrate, and a heat sink coupled to a second surface of the substrate configured to remove heat from the substrate; and a power source coupled to the one or more solid state source arrays to electrically power the plurality of solid state sources.
Type:
Grant
Filed:
February 18, 2014
Date of Patent:
September 5, 2017
Assignee:
APPLIED MATERIALS, INC.
Inventors:
John Gerling, Joseph M. Ranish, Oleg V. Serebryanov, Joseph Johnson