Patents Examined by R. Bruce Brenean
  • Uniform gas flow arrangements
    Patent number: 5789324
    Abstract: A uniform gas flow is provided at the surface of a planar device or wafer in a processing system having a substantially cylindrical chamber through which processing gases flow toward an asymmetrically located outlet port by using an appropriately disposed collar or baffle along the gas stream in the chamber in the plane of the surface of the planar device or wafer.
    Type: Grant
    Filed: March 18, 1997
    Date of Patent: August 4, 1998
    Assignee: International Business Machines Corporation
    Inventors: Anthony John Canale, Randy Dean Cox, Dennis Stanley Grimard, Tracy Charles Hetrick