Abstract: An aperture stop that can be used in an exposure apparatus and method includes a central aperture region defined by a circular arc and a peripheral region having a decreased width.

Abstract: An illumination optical apparatus and method forms a plurality of illumination regions on a first object, and positional relationships between the plurality of illumination regions can be adjusted. An exposure apparatus that includes the illumination optical apparatus can, while moving the first object and a second object in a certain moving direction, effect projection exposure of an image of the first object onto the second object. The plurality of illumination regions can have polygon shapes. A field stop used in the illumination optical apparatus can have an aperture portion with first and second regions, the second region corresponding to an overlap region on the first object, wherein a transmittancy of the second region is smaller than a transmittancy of the first region.

Abstract: An apparatus and system for fabricating a wafer utilizing a dual damascene process. A photolithographic device having transparent portions and radiant energy inhibiting portions is used to process a wafer-in-process having a first dielectric layer, a hard mask over the first dielectric layer, vias in a second dielectric layer which overlies the hard mask, and a photoresist material within the vias. The photolithographic device is registered to the wafer-in-process to prevent radiant energy from being directly transmitted into the photoresist material overlaying the vias. This prevents the exposure of a portion of the photoresist material at a lower portion of the vias, thus protecting the hard mask layer and/or the conductive plugs from damage during a subsequent etching process. The exposed photoresist material is then removed.

Abstract: A lithographic projection apparatus includes an illumination system for supplying a projection beam of electromagnetic radiation having a wavelength less than or equal to 50 nm, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, wherein the radiation system comprises an integrating element disposed in the path of the radiation, the integrating element comprising a hollow waveguide.