Abstract: An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.
Type:
Grant
Filed:
September 28, 1978
Date of Patent:
April 1, 1980
Assignee:
Bell Telephone Laboratories, Incorporated
Inventors:
Frank B. Alexander, Jr., Cesar D. Capio, Victor E. Hauser, Jr., Hyman J. Levinstein, Cyril J. Mogab, Ashok K. Sinha, Richard S. Wagner