Abstract: An electrode-built-in susceptor is formed by a susceptor base body which is made of an aluminium-nitride-group-sintered-member on one of which surface a plate sample is mounted, an inner electrode which is built in the susceptor member, a power supplying terminal which is disposed in the susceptor base body so as to be attached to the inner electrode, and an insulating layer which is formed mainly by one of a boron nitride, a lithium oxide, an aluminium oxide, or a magnesium oxide is formed between the inner electrode and the mounting surface. By doing this, it is possible to provide an electrode-built-in susceptor which has a superior durability under a high temperature oxidizing atmosphere condition without a concern in that a thermal efficiency decreases and a plate sample is contaminated.

Abstract: A method and system for monitoring and/or controlling the conditions of a wafer on an electrostatic chuck during plasma processing. The method and system include utilizing backflow gas pressure and DC clamping voltage as control variables to adjust the wafer temperature based upon impedance measurements determined by RF sensors located in the electrostatic chuck RF feed line. The method and system further include utilizing the clamping status of the wafer on the electrostatic chuck to monitor impedance during the plasma process.

Abstract: The invention provides a wafer holding apparatus which enables ascertainment of gripping and presence/absence of a wafer through use of single detection means. The apparatus has drive means (2) having a pressing element (8) which advances or recedes in a longitudinal direction; and detection means (9) for detecting advancement/receding of the pressing element (8). When the detection means (9) has detected that the pressing element (8) has advanced to and come to a halt at a predetermined position, the wafer is determined to be properly held. When the detection means (9) has detected that the pressing element (8) has advanced in excess of the predetermined position, the wafer is determined not to be present on the wafer holding apparatus.

Abstract: Particle flaking is reduced in a semiconductor wafer processing apparatus by installing a chamber shield assembly in the chamber of the apparatus. The shield assembly includes a plurality of nested shields that are supported out of contact with each other and suspended such that, during thermal expansion and contraction, gaps are maintained that are sufficient to avoid arcing. Alignment structure on the shields and on the chamber walls force the shields to align concentrically and maintain the gaps. The shields are made of aluminum or another thermally conductive material and have cross-sectional areas large enough to provide high thermal conductivity throughout the shields. Mounting flanges and other mounting surfaces are provided on the shields that form intimate thermal contact with sufficient contacting area to insure high thermal conductivity from the shields to the temperature controlled walls of the chamber.

Abstract: An electrode-built-in susceptor comprises a mounting plate and a supporting plate which are made of an aluminium-nitride-group-sintered member, an inner electrode which is made of a conductive aluminium-nitride-tantalum-nitride-composite-sintered-member or a conductive aluminium-nitride-tungsten-composite-sintered-member so as to be formed between the mounting plate and the supporting plate, power supplying terminals 16, 16 which is disposed in fixing holes 13, 13 which are formed on the supporting plate so as to be attached to the inner electrode. The power supplying terminals are made of a conductive aluminium-nitride-tantalum-nitride-composite-sintered-member. By doing this, it is possible to provide an electrode-built-in susceptor which has superior durability under a high temperature oxidizing atmosphere condition and a method for manufacturing an electrode-built-in susceptor with a high product yield and a low production cost.

Abstract: A multi-stage type processing apparatus which can be positioned in a limited space without having a complicated driving mechanism, includes processing units which are stacked in a multi-stage state in the vertical direction. Each processing unit has a cup surrounding a substrate and a chuck for retaining and rotating a substrate, and the cup can be elevated and lowered with respect to the chuck. A cylinder unit is contracted and thereby all the cups are unitarily lowered, so that the top surface of the chuck is located in a slightly upper position with respect to the top surface of the cup. In this state, a substrate is mounted on the chuck and attracted. Next, the cylinder unit is extended and thereby all the cups are unitarily elevated so as to accommodate the substrate therein.

Abstract: A heating device for controllably heating an article defines a processing chamber to hold the article and includes a housing and an EMF generator. The housing includes a susceptor portion surrounding at least a portion of the processing chamber, and a conductor portion interposed between the susceptor portion and the processing chamber. The EMF generator is operable to induce eddy currents within the susceptor portion such that substantially no eddy currents are induced in the conductor portion. The conductor portion is operative to conduct heat from the susceptor portion to the processing chamber. The heating device may further include a platter and an opening defined in the conductor portion, wherein the opening is interposed between the susceptor portion and the platter.