Abstract: There are disclosed a method and apparatus for depositing a layer of material onto the outer surfaces of a plurality of cylindrical members. The cylindrical members are arranged to form a substantially closed loop with the longitudinal axes thereof disposed substantially parallel and the outer surfaces of adjacent members being closely spaced apart to form an inner chamber which is substantially closed. Adjacent cylindrical members form narrow passages which communicate with the inner chamber. At least one reaction gas is introduced into the inner chamber through at least one of the narrow passages and a plasma is formed from the at least one reaction gas within the inner chamber to deposit the layer of material onto the outer surfaces of the cylindrical members. The plasma can be formed by using either microwave energy or radio frequency energy. More particularly disclosed is a method and apparatus for making electrophotographic drums.
Type:
Grant
Filed:
November 24, 1986
Date of Patent:
March 8, 1988
Assignee:
Energy Conversion Devices, Inc.
Inventors:
Eugene W. Fournier, Erik J. Bjornard, Annette G. Johncock, Joachim Doehler
Abstract: A process for forming an integral edge seal in a gas distribution plate for use in a fuel cell. A seal layer is formed along an edge of a porous gas distribution plate by impregnating the pores in the layer with a material adapted to provide a seal which is operative dry or when wetted by an electrolyte of a fuel cell. Vibratory energy is supplied to the sealing material during the step of impregnating the pores to provide a more uniform seal throughout the cross section of the plate.
Abstract: A vaporization arrangement for coating substrates disposed in an areal region, or past through an areal region, comprises a rectangular vaporization crucible with a crucible rim, as well as plurality of electron guns each having an X-Y deflecting system. The electron guns are disposed on one side of the drucible axis separately from the crucible in such a manner that their beam axis extend parallel to one another and are directed on a plane passing vertically through the longitudinal axis of the crucible. The arrangement further comprises means for deflecting the electron means onto the surface of the contents of the crucible. Such means include an alternating serial arrangement of linear coils, on the side of the crucible opposite to the electron guns, and pole plates disposed both between the linear coils and at their ends.
Type:
Grant
Filed:
December 15, 1986
Date of Patent:
February 16, 1988
Assignee:
Leybold-Heraeus GmbH
Inventors:
Horst Ranke, Volker Bauer, Albert Feuerstein, Walter Dietrich
Abstract: Cup lubricating process and apparatus in which cup-shaped can bodies are controllably conveyed in spaced relationship to each other through a lubrication application chamber. Lubricant is atomized to particle sizes permitting them to be gas borne and introduced into such chamber from a plurality of locations about the travel path for can bodies. Provision is made for augmented external surface deposition by electrically charging at least a portion of the gas-borne lubricant particles and electrically grounding can bodies individually during passage through such lubricant application chamber. Endless loop conveyor means are provided with adjustable features enabling a travel path to be adapted to differing dimension can bodies.
Abstract: A self-contained modular processing apparatus is disclosed for processing workpieces, and in particular, silicon wafers. The apparatus is constructed of framed modules which plug into a service facility docking subassembly and interlock therewith to make up a complete modular processing system for wafer processing. Each module may be provided with its own wafer transporting mechanism and includes a built-in CPU such that each module is an independent, stand-alone processing unit. Each processing unit, by being capable of independent operation, functions as a building block to configure a modular processing system capable of handling wafer flow in multiple directions while performing a multitude of processing functions or operations. Individual modules are arranged along a line of single fold symmetry such that a single transport mechanism may be employed for transferring wafers among adjacent modules.
Type:
Grant
Filed:
May 19, 1986
Date of Patent:
February 2, 1988
Assignee:
Machine Technology, Inc.
Inventors:
Richard H. Rubin, Benjamin J. Petrone, Richard C. Heim, Scott M. Pawenski
Abstract: An electron-emitting surface is provided with a material reducing the electron work function, which is obtained from a suitable reaction. The reaction mixture or the product to be decomposed, for example CsN.sub.3, is present in a surface depression of a semiconductor body, while one or more pn junctions act as a heating diode. Upon heating, cesium is released and deposited on the electron-emitting surface.
Type:
Grant
Filed:
May 21, 1987
Date of Patent:
February 2, 1988
Assignee:
U.S. Philips Corporation
Inventors:
Arthur M. E. Hoeberechts, Henricus A. M. van Hal, Harm Tolner, Gerardus G. P. van Gorkom
Abstract: A combustible gas sensor element prepared by the process of applying, to a sheathed wire coil, separate coats of catalytic wash each heated in a furnace, separate and alternating coats of porous ceramic and platinum each heated by passing an electric current through the coiled wire filament, and separate coats of porous ceramic top coating, each heated by passing an electric current through the filament.
Abstract: An apparatus according to the present invention for thin film formation using a photo-induced chemical reaction comprises a reaction chamber in which a substrate can be set, means to introduce a reactive gas into the reaction chamber for the purpose of causing a surface of the substrate to adsorb the reactive gas, means to evacuate the reaction chamber, means to irradiate the substrate surface having adsorbed the reactive gas with photon energy for the purpose of forming a nucleus required for growing a film on the substrate surface, means to generate metastable excited molecules which can react with the reactive gas to decompose it, and means to introduce the reactive gas and the metastable excited molecules into the reaction chamber for the purpose of growing the film on the substrate formed with the nucleus on the basis of the nucleus.
Type:
Grant
Filed:
April 7, 1986
Date of Patent:
January 5, 1988
Assignee:
Hitachi, Ltd.
Inventors:
Kanji Tsujii, Yusuke Yajima, Seiichi Murayama