Abstract: Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at ?-position and/or ?-position and/or ?-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.

Abstract: In a method of using a donor element in a radiation-induced thermal transfer process, an assemblage is provided that includes a donor element and a receiver element, wherein the donor element has a support layer and a transfer layer having one side adjacent the support layer and the other side adjacent the receiver element. After image-wise exposing the assemblage to radiation whereby a portion of the transfer layer is transferred to the receiver element, relative movement between the support layer and the receiver element is provided before separating the donor element from the receiver element. Advantages include improved edge straightness, image width predictability, improved thermal mass transfer, and improved color filters.

Abstract: A method for fabricating an array substrate having a color filter on a thin film transistor structure for a liquid crystal display device is disclosed in the present invention.

Abstract: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.

Abstract: A method of processing a photothermographic material by a thermal processor is disclosed, wherein the photothermographic material comprises on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and a light-insensitive layer and on the other side of the support a back coating layer; the thermal processor uses a transport system in which a feed roller is disposed with being in contact with a bundle of plural stacked film sheets of the photothermographic material so as to feed the uppermost film sheet of the bundle of film sheets through rotation of the feed roller to expose and develop the fed film sheet; the light-insensitive layer or the back coating layer contains a lubricant having a mass average molecular weight of 550 or more.

Abstract: A radiating-sensitive composition and negative-working imageable element includes a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, and particles of a poly(urethane-acrylic) hybrid that are distributed throughout the composition forming an imageable layer in the element. Imaging can be accomplished at a wide range of wavelengths from about 150 to about 1500 nm, and development can be accomplished using an organic solvent-based developer, warm water, plate cleaner, or on-press using a combination of a lithographic printing ink and a fountain solution.

Abstract: A photosensitive resin composition for a black matrix comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) a solvent; and (E) a black pigment; wherein the alkali-soluble resin (A) comprises a functional group having a general formula (a-1); viscosity of said photosensitive resin composition for the black matrix is 0.5-4.0 cps at 25° C.; the solid content of said photosensitive resin composition is 5-17.5 wt. %; and said solvent (D) has a saturated vapor pressure below 4.5 mmHg at 20° C.; which presents no pinhole on the surface after low pressure drying, no line and cloud defect on the film, good inner uniformity of the coated film and high photosensitivity after pre-bake, high heat resistance for black matrix after post-bake, especially no poor coating on substrates of LCD by the slit coating. (Each of R is independently H, linear or branch alkyl of C1-C5, phenyl or halogen.

Abstract: The present invention relates to a support and an imaging element utilizing the support, wherein the support comprises at least one nacreous resin layer, wherein the uppermost layer comprises nacreous pigment in a polyolefin matrix polymer, and wherein the FLOP value of the imaging element, and, hence, the support, is greater than 25. Also included is a method of making the nacreous support.

Abstract: Provided is an image recording material capable of being directly recorded by various kinds of lasers, excellent in alkali-developability by alkaline developer and capable of forming an image which is good in curability by exposure. The image recording material is characterized by including on a support: an image recording layer containing a binder polymer (A); a compound (B) having a polymerizable unsaturated group, and a polymerization initiator (C); and a layer containing an organic ionic polymer (a) formed of a non-metallic element and an inorganic layered compound (b) that are layered in this order. It is preferable that the image recording layer further contains a dye (D) having an absorption maximum in a region of 300 to 1,200 nm, and it is preferable that the binder polymer (A) is a polymer having an alkali-soluble group.

Abstract: There is provided an aluminum alloy blank for a lithographic printing plate including iron in a range of 0.20 to 0.80 wt %; and the balance being aluminum, a crystal grain refining element, and unavoidable impurity elements. The unavoidable impurity elements may include silicon and copper, wherein a content of silicon is in a range of 0.02 to 0.30 wt % and a content of copper is equal to or below 0.05 wt %. A solid solution amount of silicon is in a range of 150 ppm to 1500 ppm.

Abstract: A radiation-sensitive composition includes a free radically polymerizable component, an initiator composition capable of generating free radicals sufficient to initiate polymerization upon exposure to imaging radiation, an infrared radiation absorbing dye having a tetraaryl pentadiene chromophore, a polymeric binder comprising a polymer backbone to which are directly or indirectly linked poly(alkylene glycol) side chains, and a nonionic phosphate acrylate having a molecular weight of at least 250. This composition can be used to prepare a negative-working imageable element that is sensitive to suitable imaging radiation and can be imaged at relatively low energy and developed either on-press or off-press.

Abstract: The invention provides an imaging element comprising a support having thereon, in order, at least one imaging layer, at least one interlayer containing a lubricant which provides scratch-resistance and at least one outermost layer containing a different lubricant which provides abrasion-resistance and a method of processing the element. The element has increased durability, especially with regard to scratch- and abrasion- (especially photoabrasion-) resistance, whilst retaining performance and ease of manufacture. Preferably the element is for use in the manufacture of printed circuit boards or the production of printing plates, wherein abrasion and scratches are particularly acute.

Abstract: A laser induced thermal imaging (LITI) donor film having a substrate, a light-to-heat conversion layer overlaying the substrate, and a transfer layer overlaying the light-to-heat conversion layer. A surface of the transfer layer includes microstructured or nanostructured features, in a continuous or discontinuous pattern, embossed or otherwise imparted in the transfer layer. The features provide break points to assist in release and transfer of portions of the transfer layer to a permanent receptor in a pattern defined by the features.

Abstract: Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent.

Abstract: According to an aspect of the invention, there is provided a method of recording an image, including irradiating a CO2 laser having a wavelength of from 9 to 11 ?m onto a recording material in which a recording layer and a protective layer are provided on a support in this order, wherein the recording layer includes at least microcapsules encapsulating a basic dye precursor, and the protective layer includes a binder.

Abstract: The present invention relates to a protective heat transferable overcoat element comprising a support having thereon a protective polymer layer of at least one benzoated phenoxy resin of Formula I. The present invention also relates to a thermal transfer dye donor element comprising a support having on one side thereof at least one dye layer and a protective polymer layer of at least one benzoated phenoxy resin of Formula I and a thermal transfer assemblage comprising at least one thermal transfer donor element comprising a support having on one side thereof a protective polymer layer of at least one benzoated phenoxy resin of Formula I. Finally, the present invention relates to a protected image reproduction comprising a support, an imaging layer containing an image, and a transferred protective heat transferable overcoat comprising a protective polymer layer of at least one benzoated phenoxy resin of Formula I.

Abstract: A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.

Abstract: The negative resist compositions especially suitable for electron beam-based lithographic processes are obtained by using a polymeric component containing first silsesquioxane moieties functionalized with a first reactive group having a first crosslinking reactivity and a first dissolution rate in aqueous alkaline solutions, and second silsesquioxane moieties functionalized with a second reactive group having a second crosslinking reactivity and a second dissolution rate in aqueous alkaline solutions, said reactivities being different from one another and said dissolution rates being different from one another. These negative resists enable improved negative lithographic processes, especially in the context of mask-making and direct-write techniques using electron beam lithography. The negative resists are also useful more generally in methods of forming patterned material features and advantageously show reduced incidence of image collapse at smaller groundrules.

Abstract: Radiation curable thermal transfer elements including a substrate and a light-to-heat conversion layer overlaying the substrate, and processes to make the thermal transfer elements. The light-to-heat conversion layer is derived from a radiation curable material capable of being cured by exposure to radiation at a curing wavelength and an imaging radiation absorber material not substantially increasing radiation absorbance at the curing wavelength. The radiation curable transfer elements can be used in processes for making organic microelectronic devices.

Abstract: The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula ?O3S—CF2CF2OCF2CF2—SO3?. The compounds are useful as photoactive materials.