Abstract: A cleaning method includes a first removal step of causing an inert gas to which a pulsation is applied to flow into an exhaust pipe after a silicon single crystal doped with an n-type dopant is produced, to peel and remove a deposit; and a second removal step of causing an atmospheric air to which no pulsation is applied to flow into the exhaust pipe through a chamber to burn a part of the deposit with the atmospheric air, the part being not removable in the first removal step, and peel and remove a burned substance of the deposit.

Abstract: A cleaning apparatus for cleaning a cleaning tool that scrub-cleans a substrate includes a cleaning body. The cleaning body includes a contact portion configured to come into contact with the cleaning tool, and the contact portion includes a suction area configured to remove foreign matter from the cleaning tool.

Abstract: A portable spray cleaning system with a device for sanitizing the interior surface of residential trash cans. The device includes adjustable arms, a plurality of spray nozzles, and rubber clamps. On one end, the device may also include a port for connecting to a water supply via a hose. Once the hose is connected, water can then be sprayed out through the spray nozzles. The pressure created by the water flow enables the device to rotate while water is being sprayed. There may also be a compartment for inserting a disinfectant that mixes in with the water. The device is collapsible for easy storage and packaging. It is known that trash receptacles often become very dirty and contaminated after repeated use.

Abstract: An assembly for frothing a fluid having an air channel with a controllable air valve and having a fluid channel with an air inlet emanation point in which the air channel emanates, a pump, a fluid restriction, a heater, and a valve assembly having a first state in which fluid is channeled to a fluid outlet of the fluid channel and a second state in which the fluid is diverted from the fluid channel to a second fluid outlet. A water supply channel is connected to the fluid channel. The assembly also includes a cleaning reservoir and a return channel that is connected to the second fluid outlet of the valve assembly and that emanates in the cleaning reservoir. An electronic controller assembly is configured to control at least the pump, the heater, and the valve assembly, and to operate the assembly in a production mode and a cleaning mode.

Abstract: A supercritical drying apparatus and a method of drying a substrate, the apparatus including a drying chamber configured to receive a supercritical fluid and to dry a substrate; a chuck in the drying chamber, the chuck being configured to receive the substrate; and a particle remover in the drying chamber, the particle remover being configured to remove dry particles from the substrate by heating the substrate with radiant heat.

Abstract: A device for cleaning and drying a spraying unit, the device containing: a top end and a bottom end; the top and bottom end connected to each other by a housing; the housing having an opening proximate the top end, for receiving at least a portion of a spraying unit; a first liner within the housing; a second liner within the first liner; the first liner fitting within the housing forming a space between an outside wall of the first liner and an inside wall of the housing; the second liner fitting within the first liner forming a space between an outside wall of the second liner and an inside wall of the first liner; the opening further containing an open cap, proximate the top end; the device having at least one vacuum air supply influent port, at least one drying air supply influent port and at least one solvent supply influent port.

Abstract: The step of removing the reaction product includes a step of loading a dummy wafer on the loading table, a step of increasing the temperature of the loading table, and a step of removing the reaction product after increasing the temperature of the loading table. In the step of increasing the temperature of the loading table, the temperature of the loading table is increased by opening an expansion valve between an output terminal of a condenser and an input terminal of the heat exchange unit, inputting heat to the loading table, opening a flow dividing valve between an output terminal of a compressor and the input terminal of the heat exchange unit, and adjusting an opening degree of the flow dividing valve.

Abstract: An appliance having: a control unit managing the operation of the appliance; at least one hydraulic component actionable for distributing water/treating liquids within the appliance; a plurality of sensors arranged for acquiring information regarding physical parameters associated with the operation of the appliance, and a module managing at least part of the water/treating liquids distribution within the appliance. The module includes the at least one hydraulic component; at least two sensors of the plurality of sensors, and a local control unit managing the operation of the at least one hydraulic component and/or receiving the information acquired by the at least two sensors.

Abstract: A detoxifying device 100 having an inner wall 104 that forms a flow passage 103 through which treatment gas flows includes a first piping 130 that forms a part of the flow passage 103, a replaceable piping section 170 that forms a part of the flow passage 103 at the position downstream of the first piping 130, and is connected thereto for sprinkling the cleaning water to remove the solid product adhering to the inner wall 104, and a second piping 150 that forms a part of the flow passage 103 at the position downstream of the piping section 170, and is connected thereto.

Abstract: A back-blush cleaning container may have a spring-biased piston that allows the container to fill with hot water when attached to a group head of the espresso machine. When the hot water of the espresso machine is turned off, the piston due to the spring urges the hot water out and back through a 3-way valve to clean the espresso machine. The backflush cleaning container also may have a steam conduit that allows steam from a steam wand of the espresso machine to clean the group head, 3-way valve and tubes. Moreover, the container may have a window which based on the position of the piston, a particular color is shown. The colors indicate whether the container is safe to remove from the group head of the espresso machine and when the container is full of water.

Abstract: A mechanism that conveys a substrate is cleaned in a cleaning unit. A substrate processing apparatus that includes a substrate polishing device and a substrate cleaning unit is disclosed. The substrate cleaning unit includes a cleaning module and a cleaning unit conveyance mechanism. The cleaning unit conveyance mechanism includes a hand and a hand open/close mechanism. The substrate processing apparatus further includes a hand cleaning unit. The hand cleaning unit includes a hand cleaning tank and a cleaning liquid injection mechanism.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A denuder, such as a bone stock denuder container, is disclosed. The denuder includes a nozzle and a container body. The nozzle is configured to be fluidically coupled to a source of fluid and to direct a fluid stream. The container body includes curved chamber wall that forms a wash chamber. The wash chamber is configured to receive a bone stock. The nozzle is configured to direct the fluid stream to impact the curved chamber wall.

Abstract: A method of removing an obstruction of coke built up in a riser of a fluid catalytic converter and of cleaning the riser involves using a suspended centralizer and narrowly angled nozzles for first hydroblasting a drainage orifice in the obstruction, adjusting guide arms and manipulating the suspended apparatus to allow enlargement of the orifice, further adjusting the guide arms and enlarging the angles of the nozzles to work the remaining coke built up.

Abstract: Cleaning compositions and methods of use thereof for cleaning fryers and other hard surfaces soiled by grease, shortening, oils and other soils commonly encountered in the food service industry are disclosed. Cleaning compositions and methods of use which beneficially remove soils from vertical and/or inverted surfaces, reduce the cleaning time required for removing such difficult to remove and baked on soils, reduce exposure to hot surfaces by allowing cleaning at or near room temperature, reduce exposure to caustic chemicals, and/or eliminate the need for personal protective equipment (PPE) for use of the cleaning compositions are disclosed.

Abstract: An aqueous composition for reducing corrosive removal of material in pickling of metallic surfaces comprising bare and/or galvanized steel. The composition includes a mixture of a compound of the formula R1O—(CH2)x—C?C—(CH2)y—OR2 in which R1 and R2 are both H, and a compound of the formula R1O—(CH2)x—C?C—(CH2)y—OR2 in which R1 and R2 are each, independently of one another, an HO—(CH2)w— group with w?2. X and y are each, independently of one another, from 1 to 4 in each of the two compounds of the formula R1O—(CH2)x—C?C—(CH2)y—OR2. A process for pickling a metallic surface with reduced corrosive removal of material is disclosed.

Abstract: A substrate processing method includes a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate, a holding layer forming step of solidifying or curing the first processing liquid to form a particle holding layer on the upper surface of the substrate, a holding layer removing step of peeling and removing the particle holding layer from the upper surface of the substrate, a liquid film forming step of forming, after removing the particle holding layer from the substrate, a liquid film of the second processing liquid, a solidifying step of cooling the liquid film to a temperature not more than a melting point of the sublimable substance to make the liquid film solidify on the substrate and form a solid film, and a sublimating step of sublimating and thereby removing the solid film from the substrate.

Abstract: Provided are a cleaning device and a method for driving the cleaning device which cleans a wafer after chemical mechanical polishing. The cleaning device includes a cleaning modules and a running beam, the running beam including a first blade and a second blade to insert or remove the wafer with respect to one of the cleaning modules in a second direction, the first blade and the second blade being fixed to the running beam and movable in the second direction, and the cleaning modules including an input module, a megasonic module, a first brush module, a second brush module and a drying module. The driving method includes performing an operation of inserting or removing the wafer in the second direction using the first blade in a first area; and performing an operation of inserting or removing the wafer in the second direction using the second blade in a second area.

Abstract: The tube cleaning device has a frame having a plurality of top and bottom vertical slots and a first and second upper slotted bracket, each bracket being located above an upper and lower window. First and second lower brackets are located below the windows forming a ledge. First and second riggings engage the slots and releasably connect the frame to a tube bank. A spreader bar is inserted through a window. A releasable connector secures the spreader bar to the frame. A vibrating motor is releasably secured to the frame. Vibration of the motor is passed through the frame to the spreader bar, which vibrates the tubes to effectuate cleaning.

Abstract: A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove particle contaminants from the substrate.