Abstract: A theoretical expression of a workpiece (W) the curved surface of which is measured by a measuring probe (110) equipped with a stylus (111) is specified, a measuring area where the measurement is executed on the measuring surface of the workpiece (W) is determined, and the axis angles of the stylus (111) are determined based on the coordinate values and the normal vector of a representative point determined in the measuring area.

Abstract: Flow meter electronics are described for providing a flow rate of a material flowing through a flow meter sensor of a Coriolis flow meter. The flow meter electronics comprise a processing system and a single output port. The processing system receives pick-off signals from the flow meter sensor and processes the pick-off signals to determine the flow rate. The processing system receives an instruction for a frequency output signal or a digital communication protocol signal. If the instruction is for a frequency output signal, then the processing system processes the flow rate to generate a frequency output signal and transmits the frequency output signal over the single output port. If the instruction is for a digital communication protocol signal, then the processing system processes the flow rate to generate a digital communication protocol signal and transmits the digital communication protocol signal over the single output port.

Abstract: A high precision system for adapting mass spectrometry for leak detection in high production applications is described. In one embodiment the system includes a plurality of sampling ports and a background port coupled to a console including a process controller. The console includes a vacuum maintenance manifold, and a separate sample manifold to which the sampling ports and background port are connected. The console further includes a helium mass spectrometer with a nitrogen purge supply, calibrated leak inputs, and a vacuum maintenance pump. The separate vacuum maintenance and sampling manifolds allow a constant flow from the gas sampling port to the sampling manifold, while continuous injection of the nitrogen gas into the sampling manifold prevents saturation of the mass spectrometer with helium from a tested part having excessive leakage.

Abstract: A heat treatment apparatus has a controller (100) provided with a temperature estimator (110) for estimating a temperature of a wafer by detection signals of temperature sensors (Sin, Sout) and a temperature calibrator (120) for correcting the estimated temperature of the wafer. In order to calibrate the temperature, an offset value stored in an offset table (122) is used. The offset value is determined based on the relationship between film-thickness of films formed in an experimental heat treatment process and process temperatures.

Abstract: A processing system and method is used to process acoustic and non-acoustic test data acquired from a number of data collectors. The post-processing system and method is implemented as software and hardware capable of running on a PC. The processing system interfaces with a data acquisition (DAQ) system that acquires calibration signals and test data from the data collectors at a test facility. The processing system uses the calibration signals to determine calibration factors representing the relationship between the test data and the appropriate engineering units. The processing system processes the acoustic and non-acoustic test data, applies the appropriate calibrations factors, and plots the acoustic and non-acoustic test data as a function of time to generate run-time plots. Data values are stored and plotted against calculated baseline curves to generate envelope or baseline plots of the collected data.