Abstract: A reflective mask blank for EUV lithography includes a substrate and, formed on or above the substrate in the following order, a reflective layer for reflecting EUV light, a protective layer for the reflective layer, an absorption layer for absorbing EUV light, and a hard mask layer. The protective layer contains ruthenium (Ru), the absorption layer contains tantalum (Ta), the hard mask layer contains chromium (Cr) and at least one of nitrogen (N) and oxygen (O), and the hard mask layer has a film density of from 3.00 g/cm3 to 5.40 g/cm3.

Abstract: A pattern decomposition method including following steps is provided. A target pattern is provided, wherein the target pattern includes first patterns and second patterns alternately arranged, and the width of the second pattern is greater than the width of the first pattern. Each of the second patterns is decomposed into a third pattern and a fourth pattern, wherein the third pattern and the fourth pattern have an overlapping portion, and a pattern formed by overlapping the third pattern and the fourth pattern is the same as the second pattern. The third patterns and the first pattern adjacent to the fourth pattern are designated as first photomask patterns of a first photomask. The fourth patterns and the first pattern adjacent to the third pattern are designated as second photomask patterns of a second photomask.

Abstract: An imprinting photomask including: a transparent substrate; a light blocking pattern provided on the transparent substrate; and a dry film resist (DFR) pattern provided on the light blocking pattern.

Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: A method of making photolithography mask plate is provided. The method includes: providing a carbon nanotube layer on a substrate; depositing a chrome layer on the carbon nanotube layer, wherein the chrome layer includes a first patterned chrome layer and a second patterned chrome layer, the first patterned chrome layer is located on the carbon nanotube layer, and the second patterned chrome layer is deposited on the substrate corresponding to holes of the carbon nanotube layer; transferring the carbon nanotube layer with the first patterned chrome layer thereon from the substrate to a base, and the carbon nanotube layer being in contact with the base; and depositing a cover layer on the first patterned chrome layer.

Abstract: A blankmask for EUV lithography includes a substrate, a reflective layer, a capping layer, and a phase shift layer. The phase shift layer is made of a material containing ruthenium (Ru) and chromium (Cr), and a total content of ruthenium (Ru) and chromium (Cr) is 50 to 100 at %. The phase shift layer may further contain boron (B) or nitrogen (N). The phase shift layer of the present invention has a high relative reflectance (relative reflectance with respect to a reflectance of the reflective layer under the phase shift layer) with respect to a tantalum (Ta)-based phase shift layer and has a phase shift amount of 170 to 230°. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.

Abstract: The present invention refers to a method for determining an effect of one or more of pixels to be introduced into a substrate of a photolithographic mask, the photolithographic mask having one or more pattern elements, wherein the one or more pixels serve to at least partly correct one or more errors of the photolithographic mask, the method comprising: determining the effect of the one or more introduced pixels by determining a change in birefringence of the substrate of the photolithographic mask having the one or more pattern elements.

Abstract: The present invention provides an FPD pellicle frame body in which external color is controlled so as to make it easy to prevent scattering of exposure light, to perform the foreign object non-adhesion inspection before use, and the like, and a method for manufacturing the frame body efficiently. The FPD pellicle frame body of the present invention comprises: a stainless-steel member having a transparent oxide coating, and a film thickness of the transparent oxide coating being 420 nm to 700 nm. It is preferable that a brightness index L* due to the interference color of the reflected lights from the surface of the transparent oxide coating and the surface of the stainless-steel member is 33 or less.

Abstract: A method, tool, and machine for hardening a photoresist image while the photoresist image is immersed in a liquid.

Abstract: An electrical power generator is characterized by a plurality of system parameters. The generator includes a controller for protecting the generator. The controller obtains data from which a present operating point of the generator and a power generating capacity of the generator can be determined. The controller further monitors data indicative of at least one system parameter as a function of time to detect an abnormality in a value of the system parameter. The controller then categorizes a type of event that caused the abnormality with respect to the data indicative of the system parameter as a function of time, the present operating point, and the power generating capacity. Finally, the controller provides a response for addressing the type of event that caused the abnormality.

Abstract: A system and technique for detecting a device that requires power is implemented with a power detection station. The power detection system includes a detector having an output and a return which are coupled together by the device when the device requires power. The detector includes a word generator for generating test pulses for transmission to the device via the detector output, and a comparator for comparing the detector output with the detector return. The power detection station has a wide variety of applications, including by way of example, a switch or hub.

Abstract: A simulation method includes the step of momently measuring a value of each of a strain, a strain speed, and a stress generated in the viscoelastic material, deriving time history data of a viscous drag, the strain speed and the stress, thereby deriving a relationship among the strain, the strain speed, and the viscous drag and setting the product as a product model whose performance is analyzed; inputting the relationship to the product model; and computing a stress and strain of a deviation component by using a deviation main strain and a deviation main strain speed converted from an entire coordinate system into a main strain coordinate system and a main strain speed coordinate system respectively to thereby conduct a simulation in consideration of a change of the viscous drag which occurs in dependence of a variation of the strain and the strain speed.

Abstract: The use of an ScFv Ab (ScFv Ab) capable of recognising a disease associated molecule (DAM) in the manufacture of a medicament for the prevention and/or treatment of a disease condition associated with a DAM is described. The ScFv Ab has therapeutic, diagnostic and prognostic applications.

Abstract: The present invention relates to prognostic methods which are useful in medicine, particularly cancer chemotherapy. The object of the invention to provide a method for assessing TS and/or ERCC1 expression levels in fixed or fixed and paraffin embedded tissues and prognosticate the probable resistance of a patient's tumor to treatment with 5-FU and oxaliplatin-based therapies by examination of the amount of TS and/or ERCC1 mRNA in a patient's tumor cells and comparing it to a predetermined threshold expression level for those genes. More specifically, the invention provides to oligonucleotide primer pairs ERCC1 and TS and methods comprising their use for detecting levels of ERCC1 and TS mRNA, respectively.

Abstract: Disclosed are antibodies that specifically recognize the new amino terminus of a protein cleaved by a protease during apoptosis. Methods of using and making the antibodies are also provided. The antibodies are particularly useful in methods of detecting apoptosis and testing candidate compounds for enhancing or inhibiting apoptosis.

Abstract: Embodiments of the present invention generally provide a system and method for testing integrity of data transmitted to and from a target device through a data connection. In one embodiment, the method generally includes creating one or more test threads. The method further includes, for each test thread, generating a data load on the data connection by repetitively writing test data patterns to the target device and reading data patterns from the target device using a synchronous I/O dispatch method, measuring data throughput to and from the target device while generating the data load, comparing the data patterns read from the target device to the test data patterns to detect data corruptions. The method may further include generating debug information if a data corruption is detected by one of the test threads.

Abstract: The invention relates to a method for the automated production and iterative automated optimization of a substance library and/or at least one reaction parameter relating to a performance characteristic comprising at least two substances comprising the steps of: a) defining at least one production parameter and at least one test parameter; b) automated preparation of a substance library by producing at least two substances on the basis of the at least one production parameter; c) automated testing of the at least two substances of the substance library with respect to at least one performance characteristic on the basis of the at least one test parameter; d) evaluating the test using electronic data analysis; e) varying the at least one production parameter and/or the at least one test parameter for optimizing the performance characteristics, and single or repeated repetition of steps b) to e) or c) to e); characterized in that the steps b) to e) are carried out in an integrated automated process.

Abstract: Process for estimating the correlation matrix of signals of unknown characteristics in an array of N sensor. The process determines the correlation matrix {circumflex over (R)}s of the signals of known characteristics, estimates the correlation matrix {circumflex over (R)}x of the sensor signals, forms a matrix A equal to A={circumflex over (R)}s?1/2{circumflex over (R)}x {circumflex over (R)}s?1/2 and decomposes the matrix A into eigenelements, constructs a matrix B based on the eigenelements of the matrix A, and determines the estimated correlation matrix {circumflex over (R)}b of the interfering signals based on the estimated matrix {circumflex over (R)}s and of the matrix B, such that {circumflex over (R)}b={circumflex over (R)}s1/2 B {circumflex over (R)}s1/2. Such a process may find application to antenna processing.

Abstract: An eye diagram analyzer assigns a plurality of SUT data signals to be members of a labeled group of channels. There may be a plurality of such groups. In addition to mere superposition in an (X, Y) display space of the various i-many (X, Y)-valued pixels for individual component eye diagrams associated with that group, other measured data for those pixels within a group can be merged in various different modes to produce corresponding composite eye diagram presentations. E.g., in a Normalized Signal Density Mode the number of hits at each trial measurement point is summed over all channels in the group, and then divided by the total number of clock cycles measured for the ith measurement point in that group to produce a density Di associated with the corresponding ith pixel: (Xi, Yi, Di). If Di is rendered as a color or an intensity, the resulting eye diagram includes a representation (the Di) of a normalized density of transitions at each point (Xi, Yi), relative to that group as a whole.

Abstract: One embodiment of the present invention provides a system that facilitates measuring quality-of-service of a computer network server or collection of servers by determining the effect that transactions in one category of service have on transactions in other categories of service. The system operates by generating a varying pattern of synthetic transactions for one category of service and a fixed pattern of synthetic transactions for the other categories of service. The system sends the varying pattern and the fixed pattern of synthetic transactions and receives responses to these patterns across a network between the computer network servers and the synthetic transaction generator. The system measures the response time for the varying pattern of synthetic transactions and the response time for the fixed pattern of synthetic transactions. Additionally, the system calculates the effect of transactions in one category of service on response times in the other category of service.