Abstract: A method of processing a substrate. A polymer is applied to a substrate. A portion of the polymer is not retained on the substrate and is collected by a catch basin. The catch basin is cleaned by exposing the catch basin and collected polymer to a material comprising acetic acid.

Abstract: An object is treated by contacting it with an organic solvent and then removing the organic solvent by directly displacing it with a fluid comprising a drying vapor (e.g., isopropyl alcohol or IPA vapor) such that substantially no liquid droplets of organic solvent are left on the surfaces of the object to evaporate after the direct displacement of the organic solvent with the fluid.

Abstract: A method for cleaning a two-stage emission electrode of an electrofilter suitable for use with an internal combustion engine, whereby a cleaning body moves along the emission electrode to strip it of deposits. Only the first stage of the electrode is cleaned by the cleaning body.

Abstract: A method and an apparatus for removing a liquid, i.e. a wet processing liquid, from at least one surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate. Simultaneously or thereafter the liquid or the substrate is locally heated to thereby reduce the surface tension of said liquid. By doing so, at least locally a sharply defined liquid-ambient boundary is created. According to one aspect of the invention, the substrate is subjected to a rotary movement at a speed to guide said liquid-ambient boundary over the surface of the substrate thereby removing said liquid from said surface.

Abstract: An ultrasonic cleaning process having ultraclean characteristics and the product of this process are disclosed whereby a conventional ultrasonic cleaning bath is augmented via the use of a cleaning target support structure and an optional mechanical isolator whereby the cleaning target is permitted to be motional with respect to the source of ultrasonic excitation energy. This mechanical isolation permits ultrasonic harmonics that are normally damped (suppressed) in amplitude due to conventional mechanical connections between the bath and the containment vessel to be fully applied to the cleaning target, resulting in substantial reduction in overall cleaning time and an improvement in cleaning efficiency. Various embodiments of the proposed system and method are disclosed, with several being preferred.

Abstract: A method and an apparatus for removing particulate contaminant are provided in order to ensure high purity during a tungsten suicide deposition process. The method for removing particulate contaminant in tungsten silicide deposition process using SiH4 as silicon source gas and NF3 as cleaning gas, includes purging a carrier gas line for an SiH4 silicon source gas to remove the contaminant in the chamber and carrier gas line when the carrier gas is supplied with the chamber, and the NF3 cleaning gas is supplied to the chamber to form plasma. After a plasma cleaning, the gas line flowing reaction gas responding to the SiH4 is purged to remove the contaminant in the chamber and the reaction gas line. As a result, any particulate contaminant is removed or remains at a minimum level that has no effect on the tungsten silicide deposition process.

Abstract: A method for drying a substrate after the substrate is rinsed in a rinsing bath in which a rinsing liquid is contained. The substrate is vertically held selectively by first and second holders. The second holder is located between and below the first holders. Each of the first and second holders includes grooves with which the substrate is engageable. When the level of the rinsing liquid downwardly passes past the grooves of the first holders, the substrate is held solely by the second holder. Then, when the level of the rinsing liquid downwardly passes past the grooves of the second holder, the substrate is held solely by the first holder.

Abstract: The invention relates to a method of determining the extent to which a milk line system is rinsed with a cleaning fluid, whereby in one or more places in the milk line system the electric conductivity of the cleaning fluid is determined. More in particular, according to the invention, the electric conductivity is measured in places which are difficult to reach for the cleaning fluid and/or in places in the milk line system which are more susceptible to contamination.

Abstract: A cleaning method for an electrophotographic photosensitive member that eliminate corrosion and cleaning irregularities of a substrate during cleaning, and a method of producing an electrophotographic photosensitive member which is easy to operate and capable of stably forming the photosensitive member at a low cost, in a high yield, and at a high speed. The cleaning method is a water-based cleaning method of cleaning a cylindrical substrate for an electrophotographic photosensitive member, using at least one selected from the group consisting of pure water, pure water having dissolved carbon dioxide, and pure water containing a surface active agent, wherein the cylindrical substrate is cleaned by a cleaning liquid ejected from a plurality of nozzles, and wherein those surfaces of the cleaning liquid ejected from the respective nozzles which are in contact with a surface of the cylindrical substrate do not interfere with each other, and the cleaning apparatus is arranged to carry out the cleaning method.

Abstract: Disclosed is a method for servicing a lawn sprinkler head removed from a sprinkler system. Included within a servicing kit is a controller that may be used to regulate the flow of water through the sprinkler head remotely from the sprinkler system, a plug to secure the hole in the sprinkler system from where the sprinkler head was removed, a spacer that may be used to retain the nozzle of the sprinkler head in the deployed position, and a cleaning tool that may be used to dislodge debris from the nozzle water exit perforations. Other features are disclosed.

Abstract: Semiconductor material has a low metal concentration at the surface. The semiconductor material has an iron content and/or chromium content on the surface of less than 6.66×10−11 g/cm2. A method for producing this semiconductor material includes a preliminary cleaning, a main cleaning and hydrophilization. A device for use in this method has a container with pyramid-shaped recesses at the bottom.

Abstract: A method for precision-cleaning the aluminum alloy inner wall surface of a tank is disclosed. In one embodiment, the inner wall surface is cleaned by a method including the steps of washing the inner wall surface with a first portion of water, applying an aqueous cleaning solution comprising sodium silicate, sodium tetrafluoroborate and sodium molybdate, and rinsing the inner wall surface with a second portion of water. In a second embodiment, the method is directed to precision-cleaning a launch vehicle booster propellant tank. In this embodiment, the method includes the steps of applying washes of water and aqueous cleaning solution on at least upper and lower sections of the inner wall surface of the tank, washing such sections with water, and analyzing samples of effluent cleaning solution and water collected from the effluent drain of the tank for hydrocarbon and particulate contaminants.

Abstract: A process and device for treating sheet objects, especially fragile sheet objects, by rotation through a liquid bath. The objects are disposed in radial slots in a rotating disk, retained therein by a flexible element moving synchronously with the disk, and by a retaining element mounted adjacent the disk and spaced therefrom along its axis of rotation.

Abstract: A method and apparatus for processing or cleaning ceramic components that are contaminated with dust deposits are provided. Relative vibrations are generated between the ceramic components and the ambient atmosphere for dislodging dust deposits from the ceramic components. Dislodged dust deposits are collected and conveyed away for disposal or further use. To accomplish this, a screen base is disposed within a closable chamber. A first conveyor is disposed within the chamber below the screen base and leads to a transfer station. A mechanism for generating relative vibrations is disposed between the screen base and the atmosphere of the chamber. An enclosed second conveyor leads from the transfer station to a replacable receiving vessel. An infra sound producer is disposed within the chamber.

Abstract: A method for cleaning a tube-in-shell heat exchanger, comprising removably inserting an ultrasonic transducer within the shell of the heat exchanger; providing a liquid medium within the shell of the heat exchanger; exciting the ultrasonic transducer to produce cavitational acoustic waves within the liquid medium; and repositioning the ultrasonic transducer with respect to a tube within the heat exchanger. The system preferably includes a control for controlling transducer excitation and transducer position. Closed loop control may be effected with fluid medium contamination sensor(s) and/or position sensor(s).

Abstract: The present invention relates to a method for cleaning heavy hydrocarbon scale from a shell and tube heat exchanger or other such equipment incorporated in a device in a petroleum refining plant or the like that processes petroleum hydrocarbons as a raw material. A mixture of petroleum-derived hydrocarbon A which can dissolve the oil component of the heavy hydrocarbon scale and an oxygen-containing polar organic compound B that promotes dissolution and dispersion is employed as the organic cleaning solvent. As a result, the heavy hydrocarbon scale can be removed with surety within a short period of time at low cost.

Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

Abstract: Disclosed are a printed wiring board having micro-via holes highly reliable for conduction and a method of making the micro-via hole by providing a coating or sheet of an organic substance containing 3 to 97% by volume of at least one selected from a metal compound powder, a carbon powder or a metal powder having a melting point of at least 900° C.

Abstract: A self-contained apparatus for cleaning contact lenses comprising a deformable, non-abrasive material having an enzyme enriched layer for contact with the optical surfaces of the lenses. While in contact with the optical surfaces, the contaminants on the lens surfaces are enzymatically removed. Upon separation of the lenses and the deformable material, substantially all of the enzymes are retained on the deformable material, largely eliminating the need to perform additional operations to inactivate the enzymes or otherwise rid the lenses of residual enzymatic matter.

Abstract: An apparatus for washing glasses and other articles, includes a washing compartment and a plurality of fluid outlets. A tray for retaining the glasses and other articles is positionable in the washing compartment. The tray has at least one fluid directing nozzle which is alignable with the fluid outlets in the washing compartment to permit fluid to flow from the nozzles through the tray and to direct the fluid into contact with the glasses and other articles. In a preferred embodiment, at least a portion of the fluid contacts the glasses substantially tangentially. A method for washing glasses and other articles is also disclosed.