Abstract: A blend of aliphatic hydrocarbons and polyglycol ether(s) is used in a process for cleaning railroad tank cars that have been gravity drained of hydrocarbon fluids but may be left with a residuum containing heavy hydrocarbons, paraffin and noxious gas. A simple recirculation system is established between the chemical source, the contaminated railcar, canister filters and back to the chemical source. Contaminates are removed from the cleaning chemical by the filters and there is no water or steam used which might otherwise damage the railcar.

Abstract: The present invention provides purge devices having micronozzles and operating methods thereof. The purge device having micronozzles are operated to clean pellicles used in semiconductor manufacturing. The purge devices having micronozzles comprises a base, at least one track configured on the base, a rotation platform, and a micronozzle array, in which the micronozzle array further comprises an air duct and a plurality of nozzles. Additionally, the rotation platform and the micronozzle array are able to move relatively to another along the at least one track.

Abstract: The present disclosure relates to compositions and methods for cleaning medical and dental instruments. The disclosed compositions are preferably non-foaming or generate low foam to allow visual inspection of the cleaning process as well as safe handling of the instruments. The disclosed compositions preferably employ select proteases, a carbonate and a nonionic surfactant.

Abstract: The demulsifying cleaning of metallic surfaces which may be contaminated with oil(s) with at least one further nonpolar organic compound, with fat(s), with soap(s), with particulate dirt or with at least one anionic organic compound using an aqueous, alkaline, surfactant-containing bath solutions.

Abstract: The present invention relates to a cleaning method and a cleaning apparatus for a mask. The cleaning method includes: step 1, providing a to-be-cleaned mask which is made of metal and has an organic material film attached thereto; step 2, heating the to-be-cleaned mask with microwave to break up the organic material film attached to the mask; step 3, stopping heating with microwave, and spraying the heated mask with a solution to remove off the broken organic material film from the mask; step 4, cleaning residual organic material film on the mask with a solution; step 5, rinsing the cleaned mask to wash off residual solution on the mask; step 6, drying the rinsed mask with microwave. Accordingly, the cleaning period of mask is dramatically shortened, the cleaning productivity is increased and the probability of material residue is decreased.

Abstract: A household appliance includes a water inlet configured to connect the appliance to an external water supply; a pressure control device configured to prevent water entering the appliance from the water inlet from exceeding atmospheric pressure; a treatment container configured to treat household items with water; and a seal between the pressure control device and the treatment container configured to prevent gas flowing from the treatment container to the pressure control device.

Abstract: A control method of a dishwasher that includes at least two flow paths having different flow rates, a chamber having communication holes that each communicate with a respective flow path, a water supply pump configured to supply washing water to the chamber through an impeller rotated by a motor, and a flow path switching unit located within the chamber and configured to sequentially open the communication holes is described. The control method includes the actions of measuring an amount of current supplied to the motor while the motor rotates the impeller to supply washing water to the chamber, and determining a position of the flow path switching unit by comparing the amount of current supplied to the motor with reference current amounts that are each designated as an amount of current supplied to the motor when the motor rotates the impeller to supply washing water to the respective flow path.

Abstract: A thread-cleaning tool comprises a partially hollow nut for use with a pneumatic, hydraulic, or electrical nut-running power tool. The nut comprises a plurality of brushes mounted in alignment with the outside corners of the nut, and facing inward to the central orifice of the nut, such that the nut abrasively removes corrosion and particulates from the threads of a shaft. In an embodiment, the brushes of the nut are mounted upon brush assemblies comprising rotating cam members, located in recesses spaced to align with the outer corners of the nut, providing a mechanism for the brushes to move back and forth as the nut is rotated up and down the thread. The brush assemblies can be easily removed or substituted as wear and tear accumulates.

Abstract: The invention relates to a method for the dynamic cleaning of supply ducts for drinking water in a vehicle (A), said method being noteworthy in that it consists in creating a shockwave (0) in the duct (210) to be cleaned. The invention also relates to a device for implementing said method. Applications: cleaning of water supply ducts in vehicles including aircraft.

Abstract: An ultrasonic cleaning apparatus includes: an ultrasonic vibrator (11); a liquid storage part (12) provided in contact with the ultrasonic vibrator; an inflow port (12a) that makes a cleaning liquid (13) flow in the liquid storage part; and an outflow port (12b) that makes the cleaning liquid flow out of the liquid storage part. A contact surface (11a), of the ultrasonic vibrator, which comes into contact with the cleaning liquid, is disposed lower than each of the inflow port and the outflow port.

Abstract: A cleaning tool device for cleaning a desired area with a cleaning implement is provided. The cleaning tool device comprises a handle portion having a first end and a second end and a tool portion having a first end and a second end. The first end of the tool portion releasably secured to the second end of the handle portion. A clip mechanism is mounted to the second end of the tool portion for releasably securing the cleaning implement. Upon positioning the cleaning implement in the clip mechanism, a user can manipulate the cleaning implement to clean in hard to reach areas.

Abstract: An electronic device manufacturing system is provided that may reduce the amount of resources used in electronic device manufacturing processes. In some embodiments, unreacted ozone exiting a process tool operating in an ozone mode may be diverted and used as an oxidant in an abatement tool when the process tool is operating in a non-ozone mode. Numerous other embodiments are provided.

Abstract: Equipment and method for a system implementing a multistep washing process, with a chemical container (110A-110D) for each chemical (111A-111D) and means for conveying one chemical at a time from the container through a feed channel (120) to a washing object (100) and from the washing object through a return channel (130) back to the container. First and second sensors (122, 132) monitor a first parameter set in the feed channel (120) and a second parameter set in the return channel (130), respectively. Both parameter sets include parameter(s) indicating the purity of the chemical. A control center (150) includes calculation means (153) arranged to determine the mutual uniformity of the first and second monitored parameter sets. Action time of the chemical is determined on the basis of the mutual uniformity of the first and the second monitored parameter sets.

Abstract: A cleaning apparatus for microsurgical instruments has a flush chamber closed off at one end by a first plug adapted to liquid-tightly grip one end of the instrument, allowing a portion of the instrument to extend past the first plug and out of the flush chamber. The other end of the flush chamber is closed off by a second plug having an inlet port. Liquid injected through the inlet port on the second plug passes through an internal passageway formed in the instrument and exits the instrument through the portion that extends past the first plug. In another embodiment the instrument has an internal passageway and an end cap through which flushing ports are formed which communicate with the passageway. A first plug having an inlet port is liquid-tightly attached to the end cap and liquid injected into the first plug passes through the plug, through the flushing ports and through the passageway to clean detritus from the instrument.

Abstract: A reflow oven includes a chamber housing including surfaces that are in contact with heated air mixed with contaminants, including flux, and a water-soluble layer selectively applied to the surfaces of the chamber housing. Embodiments of the reflow oven include an acrylic-based layer, such as an acrylic paint. In one embodiment, the acrylic paint includes a water-soluble polymer, a polymer emulsion, and water. The water-soluble polymer includes butyl benzyl phthalate. In some embodiments, the acrylic paint includes 1-10% by weight butyl benzyl phthalate, 30-55% by weight acrylic polymer emulsion, and balance water. In a certain embodiment, the acrylic paint includes 1-5% by weight butyl benzyl phthalate, 35-50% by weight acrylic poly emulsion, and balance water. Methods of treating surfaces of the reflow oven are further disclosed.

Abstract: A robot for cleaning submersed marine structures is provided. The robot has a drive system for traversing the robot over the submersed structure. The robot further has an attachment system for attaching the robot to the submersed structure. The robot further has a cleaning arrangement for removing biofouling from the submersed structure as the robot is traversed thereover. The robot further has one or more flexible detector strips which contact the submersed structure as the robot is traversed thereover. The strips have a plurality of electrodes and are formed from electroactive polymer material which produces electrical signals in the electrodes on deflection of the strips. The signals are indicative of the surface roughness of the submersed structure.

Abstract: A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.

Abstract: A pulse jet liquid gas cleaning system has an ultrasonic transducer operable to transform a high-pressure stream of cryogenic fluid from a cryogenic fluid supply into pulsed jets of individual cryogenic fluid slugs.

Abstract: A method of cleaning an interior of a process chamber by supplying a cleaning gas into the process chamber after a process of forming a thin film on a substrate in the process chamber is performed, including alternately repeating changing a pressure in the process chamber from a first pressure range to a second pressure range, and changing the pressure in the process chamber from the second pressure range to the first pressure range. In this method, when the pressure in the process chamber is changed to the first pressure range, the pressure in the process chamber is changed to the first pressure range without being maintained at the second pressure range, and when the pressure in the process chamber is changed to the second pressure range, the pressure in the process chamber is changed to the second pressure range without being maintained at the first pressure range.

Abstract: A random orbit scrubber comprises a main body having a front end and a rear end, a squeegee assembly coupled to the rear end of the main body, and a cleaning head assembly coupled to the front end of the main body. The cleaning head assembly can include a cleaning element structured for contact with a floor surface. The cleaning head assembly can further include a motor that is operable to impart rotational and orbital movement on the cleaning element.