Abstract: Disclosed is a dishwasher, by which the dishwasher is simply configured as well as the door is facilitated to open/close. The present invention includes a cabinet having an open front side, a door opening/closing the front side of the cabinet, a locker at the door, a coupling member inside the cabinet to be elastically coupled to or separated from the locker in opening/closing the door, and a switch in rear of the coupling member to sense opening/closing of the door.

Abstract: A tub protection bolt for a washing machine is disclosed for fixing a tub to a cabinet for the washing machine. The tub protection bolt includes a screwed shaft configured to penetrate a cabinet of the washing machine to be coupled with a boss of a tub and a head part at one end of the screwed shaft having a narrow cut-away portion configured to hold a power cable of the washing machine. The head part includes a head at the one end of the screwed shaft, a flange extending outward from an outer circumference of the head, and the narrow cut-away portion provided from an outer circumference of the flange toward the head. The cut-away portion includes an insertion portion provided from the outer circumference of the flange in a direction of a center of the head and a fixing portion bent from an end of the insertion portion.

Abstract: The invention is a sealing mechanism for a steam chest (14) used in the manufacture of textile materials. This invention is a device for heating continuous textile material comprising: a steam chest (14) having a steam inlet, a material inlet (18), and a material outlet (18). A first seal means (16) is located adjacent to the material inlet (18). A second seal means (16) is located adjacent to the material outlet (19). One of the seal means (16) comprising a plurality of expansion chambers (32) located along a curvilinear path.

Abstract: A method for cleaning a semiconductor device has the steps of securing a wafer (16) with a modified chuck (11) and applying a cleaning solution (18) to the backside (20) of the wafer (16). The cleaning solution (18) is formulated to remove PTFE from the wafer (16). The cleaning solution (18) is applied to the edge (14) of the wafer (16) because of the characteristics of the modified chuck (11) to remove PTFE impurities that gather on the edge (14) of the wafer (16).

Abstract: An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles for spraying a first cleaning solution onto the first surface of the wafer, and a second plate disposed to face a second surface of the wafer that is opposite to the first surface, the second plate having a plurality of second nozzles for spraying a second cleaning solution onto the second surface of the wafer. In operation, the first and second plates and the wafer are rotated in opposite directions. The opposite rotation causes the cleaning solutions to flow abruptly thereby increasing a frictional force between the surfaces on the wafer and the cleaning solutions to improve the efficiency of the cleaning process.

Abstract: The invention relates to a laundry treatment machine, more especially a washing machine or a laundry dryer, comprising a drivable drum which accommodates laundry and is rotatably mounted in a container integral with the housing, wherein the container is provided with an elastic sleeve, covering the transition from the front opening of the container to the housing opening, around the filler opening of the drum, and wherein a laundry rejector is attached in this transitional region in the region of the top dead center of the drum. For improvement purposes, a specially configured laundry rejector is provided in the region of the top dead center of the drum in conjunction with a receiving means in the sleeve in order to avoid laundry items from becoming damaged.

Abstract: An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry the wafers, a liquid supply nozzle for supplying cleaning liquid into the chamber and a discharge system. The spray pipe of the bubbler has a liquid retention portion that keeps condensate of the alcohol vapor from issuing into the chamber. The gas supply nozzle has a spray outlet configured to spray the same amount of the drying gas onto all of the wafers in the chamber. The liquid supply nozzle has liquid supply openings only in a side portion thereof so that liquid alcohol will not become trapped therein.

Abstract: A system for removing paint and other coatings from hard surfaces is mounted on a truck for over-the-road travel. The truck bed carries a high power vacuum pump, a self propelled tractor with an attached blast head, a liquid reservoir, a sump or vacuum tank, and a ramp for loading the tractor. The reservoir is connected to a low pressure pump that transfers water to the high pressure pump. The high pressure pump is connected to the blast head by a high pressure hose. A vacuum hose is connected to the sump which has an internal enclosure for separating the waste materials from the liquid for easy dumping of semi dried materials.

Abstract: A wafer cleaning apparatus with multiple wash-heads is applied in chemical and mechanical polishing process after wafer cleaning. The wafer cleaning apparatus device includes a supporting base, which supporting base comprises a driving device and at least one fluid pipe. A rotation module is also included in the wafer cleaning apparatus. The top side of the rotation module is connected with the driving device. Besides, the rotation module comprises multiple wash-heads and at least one nozzle. The bottom side of wash-head here is contacted with the surface of the wafer. By using driving device, the rotation module can be wholly driven. Also, multiple wash-heads can rotate individually along a cleaning path for cleaning wafer. The fluid was jetted from nozzle and assistant to clean wafer through fluid pipe. The prior art of single wafer wash-head is easily to reform a cleaning dead angle in wafer cleaning process.

Abstract: A filter assembly for a washing machine is provided which uses a simple structure to separate dirt and/or particles from washing water using. The filter assembly includes a filter case with an inlet and an outlet each positioned along its circumference, and an opening within the filler case which allows for communication between the inlet and outlet. A filter is provided in the filter case, the filter having a plate disposed in front of the opening to prevent particles from passing through the opening. Rather, the heavy particles are gathered in a central area of the filter by a centrifugal force generated by the water flowing in the filter case.

Abstract: A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical liquid is supplied to the wafers W for their processing. The rotor 45 has holding members 95, 96, 97, 98, 99 for holding the peripheries of the wafers W in parallel arrangement and a press member 100 for holding the wafers W while applying a pressure on their peripheries. Irrespective of rotation of the rotor 45, the press member 100 always applies a pressure on the peripheries of the wafers W so as to prevent the peripheries from sifting with respect to the holding members 95, 96, 97, 98, 99. With the action of the press member 100, it becomes possible to prevent the peripheries of the wafers W from being worn and also possible to elongate the span of life of the holding members 95, 96, 97, 98, 99 while performing a chemical processing.

Abstract: The invention concerns a washing fluid pump (1) for windows and/or headlamp cleaning installations on motor vehicles including at least one motor, at least one pump housing (2) with at least one impeller (11) arranged therein, at least one intake (8) and at least two selectively actuable outlets (7). The washing fluid pump (1) is distinguished in that the pump housing (2) includes at least two pump chamber regions which are arranged in mutually superposed relationship, that at least two outlets (7) are associated with different pump chamber regions, and the impeller (11) is axially displaceably supported in the pump housing (2) in such a way that it can assume its operative position selectively in one pump chamber region or the other.

Abstract: Provided is a substrate processing apparatus capable of supplying pure water that is stabilized with respect to the concentration of nitrogen gas. First and second nitrogen concentration meters to measure the nitrogen gas concentration of pure water are respectively disposed before and after a concentration change part that can dissolve and degas nitrogen gas by using a hollow fiber type separation membrane. In order to maintain the nitrogen gas concentration of pure water at a target concentration value, the dissolution and degassing in the concentration change part are controlled by adjusting the degree to which a first valve on a nitrogen gas supply path and a second valve on a nitrogen gas degassing path are opened, based on a concentration difference between a target concentration and both of the first and second nitrogen concentration meters.

Abstract: A transducer for use in an acoustic energy cleaner is provided. The transducer includes a resonator and a plurality of crystals bonded to a surface of the resonator. The plurality of crystals is configured to be bonded to the surface of the resonator in a staggered arrangement with respect to each other. In one embodiment, the plurality of crystals is bonded to the surface of the resonator in a horizontally staggered arrangement. In another embodiment, the plurality of crystals is bonded to the surface of the resonator in a vertically staggered arrangement.

Abstract: The invention relates to a flushing device for a sealing system on a housing element with a sealing surface and an associated closing element with a radially outer elastic seal, comprising at least one source for a flushing medium, an annular channel arranged in the housing element, and an annular gap, out of which the flushing medium can pass, the annular gap being closed by the radially outer elastic seal in the closed position of the closing element. At least one further closable outlet is provided for the flushing medium on the annular channel. At least one side of the opening of the annular gap is of undulating or serrated design. In accordance with the process for using the flushing device, with the closing element closed and the annular gap closed and with the further outlet open, a flushing medium is let into the annular channel from the source and is let out via the further outlet.

Abstract: Dying or bleaching apparatus for yarn wound on reels or similar packages, comprising a dying boiler (15) having an annular section suitable for receiving a single circular load of mobile reel holder shafts (13) which can be removed at the same time for the subsequent water draining and drying operations, operating with less liquid and also capable of being used with fractional capacities with a constant soaking ratio.

Abstract: A damper includes: a cylinder: a piston rod inserted to be movable linearly in the cylinder; a guide member provided with a coupling hole to which an insertion portion of the rod member is coupled at a center thereof, and provided with first and second grooves at an outer circumferential surface thereof; a fixed damping member fitted into the first groove and adhered to an inner surface of the cylinder; and a movable damping member up and down movably fitted into the second groove and selectively adhered to the inner surface of the cylinder.

Abstract: The present invention is directed to a device for dispensing a unit dose water-soluble pouch containing a laundry additive during the spin cycle of a washing machine process having a spinning wash drum. The device is attached to the vertical center post of a washing machine and holds a water-soluble pouch above the high water level. During the spin cycle, the spinning center post will create sufficient centrifugal force so that the water-soluble pouch is released from the device. The water-soluble pouch will then fall into the laundry where the water-soluble pouch will dissolve when rinse water fills the machine thereby releasing the laundry additive to treat the washed articles.

Abstract: An assembly for rotating and axially directing a high pressure spray hose and spray head to clean residue from the bores of thermal transfer tubes. Modular subassemblies are concentrically aligned and mounted to rotate in synchrony and direct a high-pressure water hose and spray head. An air controlled operator control gun directs spray pressure and hose movement. A hose drive assembly controls hose rotation and axial hose movement via biased pinch wheels that abut the hose. An eccentric linkage and spring tensioners coupled to the pinch wheels release and re-engage the wheels to the hose at a preset pressure. A layering arm stacks the hose in uniform layers at a hose reel. Rotational sensors and/or a pneumatic booster and a disk brake assembly facilitate hose collection and release without kinking or spillage.

Abstract: Object of the present invention lies on improving a system stability by reducing an allowable eccentricity of laundry below a preset value when a spinning speed reaches to a maximum even if a voltage higher than a rated voltage is applied, by varying a maximum limit of a lead angle with a voltage applied to a drum type washing machine. For achieving the object of the present invention, in a method for controlling a spinning speed of the present invention, a maximum value of a lead angle is set to vary with an applied voltage after detection of the applied voltage.