Abstract: Oxides on the surfaces of metal are reduced by directing reducing gases at them in a forceful and turbulent manner. In a preferred version, the gas is passed through at least two reducing zones designed to maintain a higher concentration of reducing gas in at least one of them than would be the case in a single reducing zone. The oxide-bearing surface is heated at the beginning of the process.

Abstract: A copper wiring is desirable for a high-speed logic circuit integrated on a semiconductor substrate, and is patterned through a chemical mechanical polishing, wherein polishing particles are brushed away from the major surface of the resultant semiconductor structure by using hydrogen-containing water without damage to the copper wiring, and, thereafter, metallic contaminants such as copper is removed by using washer containing decontaminating agent selected from polycarboxylic acid, ammonium salts thereof and polyaminocarboxylic acid also without damage to the copper wiring.

Abstract: A method for rinsing and drying semiconductor wafers. The method includes placing a semiconductor wafer into a chamber of a rinse/dry apparatus, directing rinse liquid over the semiconductor wafer, and moving a portion of the chamber, such as a portion of a wall of the chamber, substantially vertically relative to the remainder of the chamber to remove rinse liquid therefrom. The method may also include directing a drying fluid onto a surface of the rinse liquid to facilitate drying of the rinsed semiconductor wafers as rinse liquid is being removed from the chamber.

Abstract: A system is provided to prepare deionized water having a 100% saturated concentration of a gas, e.g., nitrogen, at a hot temperature, e.g., 50-85° C., and an attendant pressure, e.g., atmospheric pressure, to clean a semiconductor wafer, e.g., of silicon. The gas concentration of a first deionized water portion having a predetermined concentration of the gas at a cold temperature, e.g., 20-30° C., is adjusted in a gassifier chamber having a pressure pump and a pressure sensor, to provide a predetermined under-saturated concentration of the gas at the cold temperature. The temperature of the adjusted gas concentration first water portion is then adjusted by mixing therewith a second deionized water portion having a predetermined concentration of the gas at a predetermined very hot temperature, e.g., 80° C., in a predetermined ratio in a mixer having a temperature sensor.

Abstract: A liquid displacement apparatus comprises a processing tank for placing a target object in its inside, a supply unit for supplying at least pure water into the processing tank from a lower part thereof, in which the pure water is drained by overflow from an upper part of the processing tank, and a drain unit disposed in the upper part of the processing tank for partially increasing a flow rate of the pure water in the processing tank.

Abstract: A method of absorbing oil or wax by contacting the oil or wax with a nonwoven or woven fabric prepared from a polyvinyl alcohol fiber. A method of recovering oil or wax contained in such a fabric using water and at a rate surprisingly faster than the rate of oil or wax recovery from cotton. A method of absorbing oil or wax from a mixture of oil or wax and sand by contacting the mixture with a fabric made from polyvinyl alcohol. Method of disposing of such fabrics which have been soiled or saturated with the oil or wax. The method is also applicable to other hydrocarbons such as aliphatic or aromatic hydrocarbon solvents.

Abstract: A method and apparatus for converting crude oil tank bottoms in the cargo tanks of a ship to a liquid state is provided. The method comprises subjecting crude oil sludge contained in the tanker cargo tank to a collection system to facilitate extracting the sludge mixture from the bottom of the tank; comminuting the sludge mixture to reduce the size of sludge globules contained therein to produce a homogeneous mixture; optionally adding crude oil from the cargo tank to increase the homogeneity of the mixture; optionally adding an additional quantity of cutter stock and/or other selected additives to the sludge mixture, either before, during or after comminution, to form a blend stock.

Abstract: A fine surface treatment for micromachining having an etching speed whose difference is smaller to oxide films each obtained by a different method as well as conditions of forming film or having different concentration of various impurities such as P, B and As in the film, and also having a practical etching speed to each of the films. The surface treatment for micromachining contains 0.1 to 8 weight percent of hydrogen fluoride and not less than 40 weight percent to not more than 47 weight percent of ammonium fluoride. It should be noted that it is preferable the surface treatment agent contains 0.001 to 1 weight percent of surfactant.

Abstract: A degreasing and cleaning method for removing oils from an object includes the steps of heating an object deposited with oils in a container, jetting a cleaning liquid which is mainly water or steam into the container and subsequently evacuating the container to reduce the pressure in the inside of the container to thereby evaporate the deposited oils to remove them from the object. The degreasing and cleaning method can be conducted by an apparatus which includes a vacuum container having a heating means for heating an object deposited with oils, a jetting means for jetting the cleaning liquid into the vacuum container and an exhausting means for exhausting evaporated ingredients formed by steam distillation in the vacuum container therefrom.

Abstract: Cleaning of water intake and outfall pipe passage wall incrustation is effected by propelling an incrustation dislodging device along the wall while running fluid through the pipe to flush the dislodged incrustation, which may be collected for disposition at the pipe discharge. A preferred form of the cleaning device comprises a circular stiff wire brush assembly through which the flushing fluid can flow at a greater speed than the propulsion speed of the device. A sea anchor may be used to run propulsion line for the device through the pipe passage. Before effecting operation of the device, a camcorder may be run along the incrusted passage wall for determining the nature of the incrustation.