Abstract: Provided is a UV reaction apparatus for treating waste liquid caused by system decontamination in a nuclear power plant. The UV reaction apparatus comprises a UV irradiation unit for irradiating UV light as a bar-shaped body; and a transit unit accommodating the UV irradiation unit therein, and for passing organic waste liquid to be irradiated with the UV light, wherein the transit unit comprises, an input unit, into which the organic waste liquid is input a discharge unit, through which the organic waste liquid is discharged, and an intermediate unit located between the input unit and the discharge unit, and in which the UV irradiation unit is located.

Abstract: An electron beam monitoring device monitors an electron beam in an electron beam irradiation system having an electron beam irradiation device configured to irradiate an irradiation target object with the electron beam via an emission window. The electron beam monitoring device includes a first X-ray detection unit and a second X-ray detection unit. The first X-ray detection unit has a detection surface directed toward between the emission window and the irradiation target object and detects an X-ray. The second X-ray detection unit is arranged to face the emission window and detects a one-dimensional or two-dimensional distribution of the X-ray.

Abstract: A mass spectrometer that includes a mass filter and a TOF mass analyzer receives the ion beam from an ion source device that ionizes a compound of a sample. The mass filter selects a precursor ion mass range and the mass analyzer mass analyzes the mass range. A continuous flow of selected precursor ions is maintained between the mass filter and the mass analyzer. A first set of parameters is applied to the mass spectrometer to produce a resolution above a first resolution threshold. A space charge effect is detected by determining if the measured TIC exceeds a TIC threshold or the measured resolution is less than the first resolution threshold. If a space charge effect is detected, at least one precursor ion transmission window with a width smaller than the mass range is applied to the ion beam by the mass filter and mass analyzed to reduce the space charge.

Abstract: The present invention relates to the field of electron beam machines, such as linear straight through machines, and methods used for therapeutic uses. More particularly, the present invention relates to electron beam machines that incorporate a rotary coupling system to easily attach and manually or automatically rotate field defining members such as applicators and/or shields to the electron beam machines. The rotary coupling systems also incorporate functionality to automatically detect collisions involving the electron beam machines such as between an electron beam machine and other equipment or a patient.

Abstract: A system that reduces the amount of contaminants that enters a process chamber or air bearing via a movable shaft is disclosed. The movable shaft includes an outer shell made from a material having a low coefficient of thermal expansion. This allows the outer shell to be heated to sufficiently high temperatures to avoid condensation of contaminants on the shaft, while minimizing any change in the diameter of the shaft, which passes through an air bearing. The shaft may also have a temperature modification device disposed adjacent to the interior surface of the outer shell. In some embodiment, the shaft may include an inner liner. An insulative layer may be provided between the inner liner and the outer shell, such that the temperature of the outer shell does not cause the inner liner to thermally expand.

Abstract: Aspects of the present disclosure relate generally to systems and methods for use in the implementation and/or operation of quantum information processing (QIP) systems, and more particularly, for beam shaping for large aspect ratios with a single cylindrical lens. In some aspects, a QIP system includes a laser source, a cylindrical lens, and an ion trap. The laser source produces a Gaussian laser beam. The cylindrical lens is aligned with at least a portion of the laser beam and shapes the laser beam into a beam having an anamorphic shape. The ion trap includes a plurality of trapped ions addressable by the beam. The cylindrical lens orients the beam relative to the ion trap such that a fast axis of the beam is aligned with an axis of the plurality of trapped ions, and a slow axis of the beam is traverse to the plurality of trapped ions.

Abstract: Techniques to dynamically tune components of an ion implanter are described. A method includes generating a first histogram for a first setting parameter of an ion implanter and a second histogram for a second setting parameter of the ion implanter. The histograms comprise a graphical representation of a distribution of data points across a range of values for each setting parameter. The method includes presenting the histograms on a user interface, receiving a control directive to modify a first range of values for the first setting parameter, predicting a modification to a second range of values for the second setting parameter based on the modification to the first range of values by a machine learning model, and presenting the second histogram for the second setting parameter to indicate the modification to the second range of values for the second setting parameter. Other embodiments are described and claimed.

Abstract: The purpose of the present disclosure is to provide a technology which enables, in a step for analyzing a defect of an element, identification of the position of the defect even in a case where the defect is thin or there is an influence of contamination. An inspection apparatus according to the present disclosure irradiates a first region including a defect of a sample with a low-energy first electron beam and then generates a second electron beam image obtained by irradiating a second region including the first region with a high-energy second electron beam, and identifies the position of the first region in the second electron beam image, thereby identifying the position of the defect.

Abstract: There are provided a sample holder that allows in-situ observation of a sample such as a gas or liquid under light irradiation and an electron microscope. An environment cell is formed in combination of two silicon chips, each including a membrane and a frame supporting the membrane, the frame being provided on the opening. The environment cell is accommodated in a main body of the sample holder, and fixed by a lid. The openings of the lid, the two silicon chips, and the main body are placed so as to overlap with each other along the optical axis of an electron beam of an electron microscope. A light emitting element is placed at a position where any one of the openings of the two silicon chips is allowed to be irradiated with light.

Abstract: A radiation shield assembly is described, configured to block radiation emanating from a radiation source from reaching a user. Two shields are supported by a support arm, and are configured to rotate and translate relative to one another about the support arm's longitudinal axis. This allows the shield to be easily configured and reconfigured as necessary to visualize various parts of a patient's body via radiography.

Abstract: An ion source includes a vaporizer, an arc chamber, and an extraction electrode. The vaporizer includes a crucible and a heater. The crucible stores a solid material. The heater heats the crucible. The crucible has an interior space formed by a wall, an inlet connected to the wall that releases a reactive gas into the interior space, and an outlet connected to the wall that releases the reactive gas and a vapor of the reaction product generated by a reaction between the solid material and the reactive gas from the interior space. The interior space narrows toward at least one of the inlet and the outlet.

Abstract: A radiation shield assembly is described, configured to block radiation emanating from a radiation source from reaching a user. Two shields are supported by a support arm, and are configured to rotate and translate relative to one another about the support arm's longitudinal axis. This allows the shield to be easily configured and reconfigured as necessary to visualize various parts of a patient's body via radiography.

Abstract: The invention generally relates to systems and methods for relay ionization of a sample. In certain aspects, the invention provides systems that include an ion source that generates ions, a sample emitter configured to hold a sample, and a mass spectrometer. The system is configured such that the ions generated by the ion source are directed to interact with the sample emitter, thereby causing the sample to be discharged from the sample emitter and into the mass spectrometer.

Abstract: An ion source includes an ion source chamber having a longitudinal axis, the ion source chamber operative to define a plasma therein. The ion source also includes a split solenoid assembly comprising a first solenoid and a second solenoid that are mutually disposed along opposite sides of the ion source chamber, where each of the first solenoid and second solenoid comprises a metal member having a long axis parallel to the longitudinal axis of the ion source chamber, and a main coil having a coil axis parallel to the long axis and comprising a plurality of windings that circumscribe the metal member. The main coil defines a coil footprint that is larger than an ion source chamber footprint of the ion source chamber.

Abstract: To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met.

Abstract: A charged particle beam writing apparatus includes an area density calculation unit to calculate a pattern area density weighted using a dose modulation value, which has previously been input from an outside and in which an amount of correction of a dimension variation due to a proximity effect has been included, a fogging correction dose coefficient calculation unit to calculate a fogging correction dose coefficient for correcting a dimension variation due to a fogging effect by using the pattern area density weighted using the dose modulation value having been input from the outside, a dose calculation unit to calculates a dose of a charged particle beam by using the fogging correction dose coefficient and the dose modulation value, and a writing unit to write a pattern on a target object with the charged particle beam of the dose.

Abstract: A method of operating an electrostatic trapping mass analyzer, comprising: introducing a sample of ions into a trapping region of the mass analyzer, wherein a trapping field within the trapping region is such that the ions exhibit radial motion with respect to a central longitudinal axis of the trapping region while undergoing harmonic motion in a dimension defined by the central longitudinal axis, the frequency of harmonic motion of a particular ion being a function of its mass-to-charge ratio; superimposing a modulation field onto the trapping field within the trapping region, the modulation field acting to either increase or reduce the harmonic motion energies of the ions by an amount varying according to the frequency of harmonic motion; and acquiring a mass spectrum of the ions in the trapping region by measuring a signal representative of an image current induced by the harmonic motion of the ions.

Abstract: A sample vessel retention mechanism for an inverted microscope having an optical objective and a scanning probe microscope (SPM) head. The inverted microscope includes a platform for supporting a sample vessel, in which is formed an aperture sized to provide a passage for the objective of the inverted microscope to approach the sample vessel from below. The retention mechanism provides a vacuum region formed in the platform, with the vacuum region being barometrically coupled with a vacuum generator. Establishment of a vacuum in the vacuum region prevents or substantially reduces oscillation of the sample vessel floor in an operating frequency range of the SPM head.

Abstract: Surface modification of a cryogenic specimen can be obtained using a charged particle microscope. A specimen is situated in a vacuum chamber on a specimen holder and maintained at a cryogenic temperature. The vacuum chamber is evacuated and a charged-particle beam is directed to a portion of the specimen so as to modify a surface thereof. A thin film monitor is situated in the vacuum chamber and has at least a detection surface maintained at a cryogenic temperature. A precipitation rate of frozen condensate in the vacuum chamber is measured using the thin film monitor, and based on the measured precipitation rate, the surface modification is initiated when the precipitation rate is less than a first pre-defined threshold, or interrupted if the precipitation rate rises above a second pre-defined threshold.

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target supplied into the chamber with a laser beam; a target generator that supplies the target into the chamber as a droplet; a droplet measurement unit that measures the droplet supplied from the target generator into the chamber; and a shielding member that shields the droplet measurement unit from electromagnetic waves emitted from the plasma, the droplet measurement unit including: a light source that emits continuous light to the droplet; a window provided in the chamber to allow the continuous light to transmit therethrough; and an optical sensor that receives the continuous light via the window. The shielding member includes a shielding body provided on the chamber side with respect to the window and configured to cover an optical path of the continuous light.