Patents Examined by Sean Luck
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Patent number: 12761174Abstract: A mass spectrometer system including a non-transitory computer readable medium is described. The non-transitory computer readable medium includes instructions, which, when executed by one or more hardware processors, cause the mass spectrometer to allow an amplifier current to settle, for a time determined by a threshold current, between generating signals due to an ion current from the mass spectrometer's detector.Type: GrantFiled: November 14, 2023Date of Patent: October 13, 2026Assignee: Thermo Enviromental Instruments LLCInventors: Robert Wright, Nigel Johnson
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Patent number: 12748073Abstract: Apparatus and methods are disclosed to improve performance of ion mobility separation. Deleterious bend effects are counteracted by adjusting phase shifts between adjoining traveling wave sections at bends; superior trajectories and performance are achieved. Improvements are also achieved by arranging serpentine paths primarily along a lengthwise direction of a substrate, thereby reducing the number of bends. An ion mobility spectrometers is coupled to a mass spectrometer, and intermittent traveling waves improve sample utilization or reduce total time required for combined ion analysis with both modalities.Type: GrantFiled: November 20, 2023Date of Patent: September 29, 2026Assignee: Battelle Memorial InstituteInventors: Adam L. Hollerbach, Yehia M. Ibrahim, Richard D. Smith
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Patent number: 12748128Abstract: Among other things, an imaging device has a photosensitive array of pixels, and a surface associated with the array is configured to receive a specimen with at least a part of the specimen at a distance from the surface equivalent to less than about half of an average width of the pixels.Type: GrantFiled: May 16, 2024Date of Patent: September 29, 2026Assignee: Alentic Microscience Inc.Inventor: Alan Marc Fine
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Patent number: 12744196Abstract: The disclosed invention relates to mass spectrometry (MS) and related instruments (‘analyzer device’). More specifically, the disclosed description relates to an improved apparatus, herein termed a vacuum chamber assembly device configured to enable a multitude of functions to enhance ionization and analyte ion transfer through the application of a plurality of Ports. The Ports being designed to provide on a single analyzer device capabilities of atmospheric pressure ionization, inlet ionization, and vacuum ionization rapidly available in order to maximize information obtained from a sample in a timely manner. Ports may also have auxiliary functions which expand and improve the available ionization methods as well as provide functions not commonly available.Type: GrantFiled: April 5, 2024Date of Patent: September 22, 2026Assignee: MSTM, LLCInventors: Charles N. McEwen, Milan Pophristic
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Patent number: 12744181Abstract: An electron beam apparatus including: an electron beam source configured to generate an electron beam; a beam conversion unit including an aperture array configured to generate a plurality of beamlets from the electron beam, and a deflector unit configured to deflect one or more groups of the plurality of beamlets; and a projection system configured to project the plurality of beamlets onto an object, wherein the deflector unit is configured to deflect the one or more groups of the plurality of beamlets to impinge on the object at different angles of incidence, each beamlet in a group having substantially the same angle of incidence on the object.Type: GrantFiled: May 24, 2019Date of Patent: September 22, 2026Assignee: ASML NETHERLANDS B.V.Inventors: Erwin Paul Smakman, Albertus Victor Gerardus Mangnus, Maikel Robert Goosen
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Patent number: 12736870Abstract: A method of removing a defect of a mask may include generating a probe profile, the probe profile including characteristics of a probe of an atomic force microscope (AFM); generating a design-based reference image of a defect area by applying the probe profile to a design image of the defect area of the mask including a location of the defect; obtaining an AFM image of the defect area by scanning the defect area of the mask using the probe of the AFM; recognizing the defect as a recognized defect by comparing the AFM image of the defect area with the design-based reference image; and removing the recognized defect using the probe of the AFM.Type: GrantFiled: November 29, 2023Date of Patent: September 15, 2026Assignee: Samsung Electronics Co., Ltd.Inventors: Yoonki Hwang, Sanghyeon Lee
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Patent number: 12725771Abstract: The present disclosure provides an artificial cell for single-cell mass spectrometry (SCMS) measurement and a preparation method thereof. In the present disclosure, the artificial cell includes an internal aqueous phase, an intermediate oil phase, and an external aqueous phase; where the internal aqueous phase includes polyethylene glycol (PEG) and a polyvinyl alcohol (PVA) aqueous solution, and the intermediate oil phase includes a chloroform-hexane mixture of L-?-phosphatidylcholine; and the external aqueous phase includes PVA and an F-68 aqueous solution. Compared with natural cell samples, new artificial single cells based on microfluidic self-assembly provided by the present disclosure have better uniformity, stability, and controllability. The artificial cell can effectively avoid significant measurement differences between individual single-cell samples, and effectively solve the problem of difficulty in stably preserving biological samples.Type: GrantFiled: September 1, 2023Date of Patent: September 1, 2026Assignee: NATIONAL INSTITUTE OF METROLOGY, CHINAInventors: Siyuan Tan, Xiaoyun Gong, Xinchi Yin, Zhichao Xue, Xinhua Dai, Xiang Fang
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Patent number: 12709556Abstract: Provided is a UV reaction apparatus for treating waste liquid caused by system decontamination in a nuclear power plant. The UV reaction apparatus comprises a UV irradiation unit for irradiating UV light as a bar-shaped body; and a transit unit accommodating the UV irradiation unit therein, and for passing organic waste liquid to be irradiated with the UV light, wherein the transit unit comprises, an input unit, into which the organic waste liquid is input a discharge unit, through which the organic waste liquid is discharged, and an intermediate unit located between the input unit and the discharge unit, and in which the UV irradiation unit is located.Type: GrantFiled: March 4, 2022Date of Patent: August 18, 2026Assignee: KOREA HYDRO & NUCLEAR POWER CO., LTDInventors: Cho Rong Kim, Hak Soo Kim, Jeong Ju Kim, Sang Ho Lee, Eun Hee Hong, Ji Eun Park, Ka Hee Jeong
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Patent number: 12712150Abstract: An electron beam monitoring device monitors an electron beam in an electron beam irradiation system having an electron beam irradiation device configured to irradiate an irradiation target object with the electron beam via an emission window. The electron beam monitoring device includes a first X-ray detection unit and a second X-ray detection unit. The first X-ray detection unit has a detection surface directed toward between the emission window and the irradiation target object and detects an X-ray. The second X-ray detection unit is arranged to face the emission window and detects a one-dimensional or two-dimensional distribution of the X-ray.Type: GrantFiled: June 10, 2022Date of Patent: August 18, 2026Assignee: HAMAMATSU PHOTONICS K.K.Inventor: Shinjiro Matsui
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Patent number: 12712173Abstract: A mass spectrometer that includes a mass filter and a TOF mass analyzer receives the ion beam from an ion source device that ionizes a compound of a sample. The mass filter selects a precursor ion mass range and the mass analyzer mass analyzes the mass range. A continuous flow of selected precursor ions is maintained between the mass filter and the mass analyzer. A first set of parameters is applied to the mass spectrometer to produce a resolution above a first resolution threshold. A space charge effect is detected by determining if the measured TIC exceeds a TIC threshold or the measured resolution is less than the first resolution threshold. If a space charge effect is detected, at least one precursor ion transmission window with a width smaller than the mass range is applied to the ion beam by the mass filter and mass analyzed to reduce the space charge.Type: GrantFiled: August 3, 2022Date of Patent: August 18, 2026Assignee: DH TECHNOLOGIES DEVELOPMENT PTE. LTD.Inventors: Pavel Ryumin, Nicholas G. Bloomfield, Igor Chernushevich
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Patent number: 12702868Abstract: The present invention relates to the field of electron beam machines, such as linear straight through machines, and methods used for therapeutic uses. More particularly, the present invention relates to electron beam machines that incorporate a rotary coupling system to easily attach and manually or automatically rotate field defining members such as applicators and/or shields to the electron beam machines. The rotary coupling systems also incorporate functionality to automatically detect collisions involving the electron beam machines such as between an electron beam machine and other equipment or a patient.Type: GrantFiled: May 19, 2022Date of Patent: August 11, 2026Inventors: Richard L. Johnson, Michael F. Turk
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Patent number: 12706271Abstract: A system that reduces the amount of contaminants that enters a process chamber or air bearing via a movable shaft is disclosed. The movable shaft includes an outer shell made from a material having a low coefficient of thermal expansion. This allows the outer shell to be heated to sufficiently high temperatures to avoid condensation of contaminants on the shaft, while minimizing any change in the diameter of the shaft, which passes through an air bearing. The shaft may also have a temperature modification device disposed adjacent to the interior surface of the outer shell. In some embodiment, the shaft may include an inner liner. An insulative layer may be provided between the inner liner and the outer shell, such that the temperature of the outer shell does not cause the inner liner to thermally expand.Type: GrantFiled: February 26, 2024Date of Patent: August 11, 2026Assignee: Applied Materials, Inc.Inventors: Roger B. Fish, Jeffrey E. Krampert
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Patent number: 12700520Abstract: Aspects of the present disclosure relate generally to systems and methods for use in the implementation and/or operation of quantum information processing (QIP) systems, and more particularly, for beam shaping for large aspect ratios with a single cylindrical lens. In some aspects, a QIP system includes a laser source, a cylindrical lens, and an ion trap. The laser source produces a Gaussian laser beam. The cylindrical lens is aligned with at least a portion of the laser beam and shapes the laser beam into a beam having an anamorphic shape. The ion trap includes a plurality of trapped ions addressable by the beam. The cylindrical lens orients the beam relative to the ion trap such that a fast axis of the beam is aligned with an axis of the plurality of trapped ions, and a slow axis of the beam is traverse to the plurality of trapped ions.Type: GrantFiled: February 15, 2024Date of Patent: August 4, 2026Assignee: IonQ, Inc.Inventor: Joachim Welte
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Patent number: 12683111Abstract: Techniques to dynamically tune components of an ion implanter are described. A method includes generating a first histogram for a first setting parameter of an ion implanter and a second histogram for a second setting parameter of the ion implanter. The histograms comprise a graphical representation of a distribution of data points across a range of values for each setting parameter. The method includes presenting the histograms on a user interface, receiving a control directive to modify a first range of values for the first setting parameter, predicting a modification to a second range of values for the second setting parameter based on the modification to the first range of values by a machine learning model, and presenting the second histogram for the second setting parameter to indicate the modification to the second range of values for the second setting parameter. Other embodiments are described and claimed.Type: GrantFiled: October 30, 2023Date of Patent: July 14, 2026Assignee: Applied Materials, Inc.Inventor: Richard Allen Sprenkle
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Patent number: 12674770Abstract: The purpose of the present disclosure is to provide a technology which enables, in a step for analyzing a defect of an element, identification of the position of the defect even in a case where the defect is thin or there is an influence of contamination. An inspection apparatus according to the present disclosure irradiates a first region including a defect of a sample with a low-energy first electron beam and then generates a second electron beam image obtained by irradiating a second region including the first region with a high-energy second electron beam, and identifies the position of the first region in the second electron beam image, thereby identifying the position of the defect.Type: GrantFiled: July 28, 2021Date of Patent: July 7, 2026Assignee: Hitachi High-Tech CorporationInventors: Takashi Hiroi, Yuko Otani, Yuya Isomae, Muneyuki Fukuda, Masakazu Kanezawa
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Patent number: 12640336Abstract: There are provided a sample holder that allows in-situ observation of a sample such as a gas or liquid under light irradiation and an electron microscope. An environment cell is formed in combination of two silicon chips, each including a membrane and a frame supporting the membrane, the frame being provided on the opening. The environment cell is accommodated in a main body of the sample holder, and fixed by a lid. The openings of the lid, the two silicon chips, and the main body are placed so as to overlap with each other along the optical axis of an electron beam of an electron microscope. A light emitting element is placed at a position where any one of the openings of the two silicon chips is allowed to be irradiated with light.Type: GrantFiled: February 27, 2024Date of Patent: May 26, 2026Assignee: Hitachi. Ltd.Inventors: Toshiaki Tanigaki, Akira Sugawara, Fumiaki Ichihashi
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Patent number: 12629114Abstract: A radiation shield assembly is described, configured to block radiation emanating from a radiation source from reaching a user. Two shields are supported by a support arm, and are configured to rotate and translate relative to one another about the support arm's longitudinal axis. This allows the shield to be easily configured and reconfigured as necessary to visualize various parts of a patient's body via radiography.Type: GrantFiled: November 14, 2025Date of Patent: May 19, 2026Assignee: RAMPART IC, Inc.Inventors: Robert Evans Foster, Lloyd Guyton Bowers Cooper, William Thomas Livingston, Foster D. Phillips
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Patent number: 12626888Abstract: An ion source includes a vaporizer, an arc chamber, and an extraction electrode. The vaporizer includes a crucible and a heater. The crucible stores a solid material. The heater heats the crucible. The crucible has an interior space formed by a wall, an inlet connected to the wall that releases a reactive gas into the interior space, and an outlet connected to the wall that releases the reactive gas and a vapor of the reaction product generated by a reaction between the solid material and the reactive gas from the interior space. The interior space narrows toward at least one of the inlet and the outlet.Type: GrantFiled: February 23, 2024Date of Patent: May 12, 2026Inventors: George Sacco, Sami K. Hahto
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Patent number: 12622659Abstract: A radiation shield assembly is described, configured to block radiation emanating from a radiation source from reaching a user. Two shields are supported by a support arm, and are configured to rotate and translate relative to one another about the support arm's longitudinal axis. This allows the shield to be easily configured and reconfigured as necessary to visualize various parts of a patient's body via radiography.Type: GrantFiled: November 14, 2025Date of Patent: May 12, 2026Assignee: RAMPART IC, Inc.Inventors: Robert Evans Foster, Lloyd Guyton Bowers Cooper, William Thomas Livingston, Foster D. Phillips
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Patent number: 10242856Abstract: The invention generally relates to systems and methods for relay ionization of a sample. In certain aspects, the invention provides systems that include an ion source that generates ions, a sample emitter configured to hold a sample, and a mass spectrometer. The system is configured such that the ions generated by the ion source are directed to interact with the sample emitter, thereby causing the sample to be discharged from the sample emitter and into the mass spectrometer.Type: GrantFiled: March 9, 2016Date of Patent: March 26, 2019Assignee: PURDUE RESEARCH FOUNDATIONInventors: Robert Graham Cooks, Anyin Li, Adam Hollerbach