Patents Examined by Shahim Ahmed
  • Polishing liquid, polishing liquid set, and polishing method
    Patent number: 11773291
    Abstract: A polishing liquid containing abrasive grains, a hydroxy acid, a polyol, a cationic compound, and a liquid medium, in which a zeta potential of the abrasive grains is positive and a weight average molecular weight of the cationic compound is less than 1000.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: October 3, 2023
    Assignee: RESONAC CORPORATION
    Inventors: Tomohiro Iwano, Takaaki Matsumoto, Tomoyasu Hasegawa
  • Process for control of contours formed by etching substrates
    Patent number: 7147789
    Abstract: The present invention provides a process for controlling the contour of a feature in a transition area made by etching a substrate. This process includes applying a patterned resist mask to the substrate to form a plurality of mask openings and mask land areas. The mask land areas are sized and spaced to a control the contour of a feature on the substrate.
    Type: Grant
    Filed: September 15, 2003
    Date of Patent: December 12, 2006
    Assignee: Hutchinson Technology Incorporated
    Inventors: Catherine A. Morley, Mark P. Sponholz, Steven R. Young, Steven A. Fank, Jacob D. Bjorstrom