Abstract: A polishing liquid containing abrasive grains, a hydroxy acid, a polyol, a cationic compound, and a liquid medium, in which a zeta potential of the abrasive grains is positive and a weight average molecular weight of the cationic compound is less than 1000.
Abstract: The present invention provides a process for controlling the contour of a feature in a transition area made by etching a substrate. This process includes applying a patterned resist mask to the substrate to form a plurality of mask openings and mask land areas. The mask land areas are sized and spaced to a control the contour of a feature on the substrate.
Type:
Grant
Filed:
September 15, 2003
Date of Patent:
December 12, 2006
Assignee:
Hutchinson Technology Incorporated
Inventors:
Catherine A. Morley, Mark P. Sponholz, Steven R. Young, Steven A. Fank, Jacob D. Bjorstrom