Abstract: A scanning type exposure apparatus, which is used to expose a wafer with an image of a pattern on a reticle by synchronously moving the reticle and the wafer, comprises a second gas conditioner for circulating a temperature-controlled gas in a subsidiary chamber which encloses an optical path of an interferometer for measuring a position of a reticle stage. The apparatus comprises a third gas conditioner for supplying a temperature-controlled gas to an internal space of a pedestal including a wafer stage and an optical path of an interferometer for measuring a position of the wafer stage. A positional error of the stage, which would be otherwise caused by temperature-dependent fluctuation of the gas on the optical path of the interferometer, is reduced. A heat insulating material is installed on a top plate of the pedestal so as to intercept heat transfer from a heat source on the pedestal to the internal space of the pedestal.

Abstract: An alignment system (30) is provided for use during the lithography process of producing multiple layer (24-26) integrated circuits. The location of each previous layer (24-26) in the integrated circuit is measured and evaluated with respect to each other and the wafer (14). The next layer is placed on the wafer (14) in a manner which optimizes its alignment relationship to each of the previous layers (24-26). Weighting factors are used to optimize alignment in multiple layer (24-26) integrated circuits.

Abstract: A method of improving uneven illumination in a photographic printer having an original image position and a light source to illuminate the original image position, and an exposure position at which a light sensitive element is positioned for exposure, wherein the exposure position may have an inherent non-uniform illumination absent the original image, the method comprising:inputting into a computer, data representative of illumination at multiple laterally spaced locations positioned in a direction from the light source to the exposure position;processing the data in the computer to form an illumination correction function with a visually indistinguishable resolution.The illumination correction function is typically applied to an original image signal so that when the original image is printed and positioned at the original image position, the inherent non-uniform illumination at the exposure position is reduced. This corrected original image is then typically printed on a support.

Abstract: A film feeder/winder is capable of winding films compactly, feeding films backward and keeping films damage-free. A plurality of films wound in a magazine case are fed one by one into a film guide. The film guide is partially openable, so that a film being fed backward can be looped by protruding from the film guide. Films are fed into a scanner/exposure unit for scanning and printing. After printing, films are fed into another magazine case and wound into a roll. It is possible to print any additional films by inserting them into an inlet opening of an extra passage branching from the film feed path. Also, a film being fed backward may be guided into this extra passage until it protrudes from the inlet opening. Both magazine cases have guides and rollers for smoothly winding films around their respective film take-up cores.

Abstract: A photolithographic projection system for transferring a predetermined pattern from a photomask to a wafer includes a radiation source and a grating mask. The radiation source projects radiation along a path through the photomask toward the wafer. The grating mask is positioned along the radiation path and is separate from the photomask. In a method for transferring a predetermined pattern from a photomask to a wafer, radiation is projected along a path through a grating mask and a photomask toward the wafer, and the grating mask is separate from the photomask.

Abstract: A projection lens, a reticle stage and a light source optical system are supported by a cast frame above a wafer stage for holding a wafer thereon. A top portion of the cast frame has an enclosed hollow structure in which strengthening ribs are built, thereby substantially increasing the rigidity of the top portion. Since the ribs are built in the top portion of the cast frame, the surface area exposed to the wafer stage is reduced. As a result, there is little chance that the wafer is contaminated by any adherents to the cast frame.

Abstract: An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.

Abstract: A film charging apparatus for a photographic printer is disclosed. The apparatus includes a film mount for supporting a film or a holder of the film from the under, a fixing cover manually openable and closable relative to the film mount and operable, in a full-closed state thereof, to fix the film or the holder supported on the film mount by pressing the film or holder from the above, and a positioning mechanism switchable between a position-fixing state for restricting a movable range of the film relative to the film mount thereby to fixedly position the film relative to the mount and a position-releasing state for releasing the restriction. The positioning mechanism is set at the position-fixing state when the fixing cover is under a predetermined opened condition. The mechanism is switched over to the position-releasing state when the fixing cover has reached an intermediate state before a full closed state in the course of movement thereof to the full closed state.

Abstract: Disclosed is a projection exposure apparatus for projecting a pattern of an original onto different regions on a substrate sequentially, wherein, on the basis of information related to a chip layout upon the substrate and of at least a chip layout within a projection exposure field and a chip layout within the pattern of the original, a first shot layout with which the number of shots is minimum when the shot layout takes a grid-like form, is determined. Also, on the basis of the information, a second shot layout with which shots are placed in sequence, from an end of the chip layout upon the substrate, without overlap of shots, is determined. The first and second shot layouts are then compared with each other, and one of them which provides a smaller number of shots is selected as a shot layout for the projection exposure operation.

Abstract: An electro-optic system and method for exposing data characters line segments on an edge region of rapidly moving strip film. The system includes a source of pulse illumination directed onto a light valve device that is addressed to form a plurality of discrete, multiple data character line segments. The illumination is synchronized with the film movement and the line segments are sequentially scanned to a strip image region to form a stitched, end to end, image of the line segments.

Abstract: Exposure control for cameras and photographic enlargers in which image light from a lens or light source is reflected off a spatial light modulator having a plurality of controllable elements able to be positioned in three dimensions. This reflected light is received by a photoelectric conversion device, analyzed by electronics, modulated and reflected by the spatial light modulator in a second dimension onto photosensitive material.

Abstract: A scanning system includes an illuminating device for illuminating an object with coherent illumination light, and a scanning device for relatively and scanningly moving the object relative to the illumination light, along a scan direction, wherein the illuminating device is arranged so that a direction of interference fringe to be produced on the object by the illumination light is inclined with respect to the scan direction.