Abstract: An injector system for a vertical furnace which has a pedestal and a semiconductor article support within a process container. The injector system includes an injector which is an elongate tube extending into the process chamber. The tube includes a circuitous section in the area of the pedestal to increase residence time for the contents of the tube prior to introduction to the semiconductor articles. A substantially direct section leads from the circuitous section to a discharge end located above the semiconductor article support. The injector system further includes a vertical column heater arranged with the vapor outlet at the upper end of the heater connected via a coupling to the injector in an arrangement to reduce thermal loss.