Patents Examined by Silverman Stanley
  • Patent number: 7645512
    Abstract: The present invention features additions of nano-structures to interconnect conductor fine particles (spheres) to: (1) reduce thermal interface resistance by using thermal interposers that have high thermal conductivity nano-structures at their surfaces; (2) improve the anisotropic conductive adhesive interconnection conductivity with microcircuit contact pads; and (3) allow lower compression forces to be applied during the microcircuit fabrication processes which then results in reduced deflection or circuit damage. When pressure is applied during fabrication to spread and compress anisotropic conductive adhesive and the matrix of interconnect particles and circuit conductors, the nano-structures mesh and compress into a more uniform connection than current technology provides, thereby eliminating voids, moisture and other contaminants, increasing the contact surfaces for better electrical and thermal conduction.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: January 12, 2010
    Assignee: The Research Foundation of the State University of New York
    Inventors: Bahgat Sammakia, Wayne E. Jones, Jr., Ganesh Subbarayan