Patents Examined by Sin J. Lu
  • Photosensitive composition, image-forming material and image-forming method employing it
    Patent number: 6544720
    Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.
    Type: Grant
    Filed: December 19, 2000
    Date of Patent: April 8, 2003
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Ryuichiro Takasaki, Toshiyuki Urano