Patents Examined by Stephen Kitt
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Patent number: 12214376Abstract: The present invention relates to a slot die with a structure in which a stripe shim and a cover shim are mounted between an upper body and a lower body, and a choke bar is inserted into a through path formed in the upper body, and an apparatus for coating an electrode slurry including the slot die. According to the present invention, by forming a space in which the choke bar can move by the cover shim, it is possible to adjust the flow rate of the slurry through the choke bar regardless of the shape of the stripe shim.Type: GrantFiled: June 24, 2020Date of Patent: February 4, 2025Assignee: LG Energy Solution, Ltd.Inventors: Joon Sun Park, Hyeong Geun Chae
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Patent number: 12209314Abstract: A technique enabling to heat a plating liquid rapidly while suppressing thermal deterioration of the plating liquid is provided. A substrate liquid processing apparatus includes a substrate holder configured to hold a substrate; a plating liquid supply configured to supply the plating liquid on a processing surface of the substrate; and a heating element, configured to heat at least one of the plating liquid on the processing surface or the substrate, including a heater, a liquid flow path through which pure water flows, and a vapor discharge opening which is connected to the liquid flow path and through which water vapor produced as the pure water is vaporized by heat from the heater is ejected.Type: GrantFiled: September 23, 2020Date of Patent: January 28, 2025Assignee: TOKYO ELECTRON LIMITEDInventor: Satoshi Kaneko
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Patent number: 12202005Abstract: A slot die coating apparatus according to one embodiment of the present disclosure includes: a slot die containing a first die block and a second die block, and a sensor unit for measuring the flow rate of an electrode active material slurry which is discharged through a discharge port formed by the coupling of the first die block and the second die block, wherein the sensor unit is formed inside the first die block, and the sensor unit is connected to the discharge port via an energy dissipation part and an energy absorption part.Type: GrantFiled: March 18, 2021Date of Patent: January 21, 2025Assignee: LG Energy Solution, Ltd.Inventors: Chan Woo Park, Kwan Hong Bae, Yong Tae Lee
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Patent number: 12202002Abstract: An application method for applying an adhesive to an object includes applying, prior to applying the adhesive to a specified part of the object, the adhesive to a part different from the specified part, calculating an application quantity of the adhesive applied to the part different from the specified part, making a first correction configured to correct an application condition of the adhesive based on basis of a result of the calculation, and applying the adhesive to the specified part using the application condition corrected in the first correction.Type: GrantFiled: October 18, 2022Date of Patent: January 21, 2025Assignee: NHK SPRING CO., LTD.Inventor: Akira Homma
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Patent number: 12186774Abstract: A quality control system for controlling quality of a paint target includes: an individual identification section associating a step control value and a quality control value with identification information for the paint target on the basis of the amount of movement; a state value computing section calculating a state value indicative of a paint state of the paint target on the basis of a history of a temporal change of the step control value; a learning section learning a correlation between the step control value, the state value, and the quality control value using sets of the step control value, the state value, and the quality control value; an input device receiving information on the amount of movement, the step control value, and the quality control value; and a storage device storing a set of the identification information, the step control value, the state value, and the quality control value.Type: GrantFiled: July 20, 2020Date of Patent: January 7, 2025Assignee: Taikisha Ltd.Inventors: Hidehisa Yoshioka, Tomoo Yamashita
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Patent number: 12186763Abstract: The disclosure relates to an application device for the application of an application medium onto a component, preferably for application of a paint onto a motor vehicle body component, comprising: at least one print head for application of the application medium preferably in series and for mounting on an application robot, and at least two nozzle rows which can be moved by the application robot, wherein the at least two nozzle rows comprise a first nozzle row with several nozzles for the output of application medium jets and at least one further nozzle row with several nozzles for the output of application medium jets. The application device is characterised in particular in that at least one nozzle row of the at least two nozzle rows is movable for the purpose of position adjustment of the nozzles of the first nozzle row and the nozzles of the at least one further nozzle row.Type: GrantFiled: December 1, 2017Date of Patent: January 7, 2025Assignee: Dürr Systems AGInventors: Hans-Georg Fritz, Benjamin Wöhr, Marcus Kleiner, Moritz Bubek, Timo Beyl, Frank Herre, Steffen Sotzny
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Patent number: 12179485Abstract: The present invention relates to devices and methods for coating surfaces including surfaces of medical devices, in particular the coating of microprojections on microprojection arrays. The present invention also relates to print head devices and their manufacture and to methods of using the print head devices for manufacturing articles such as microprojection arrays as well as to coating the surfaces of microprojection arrays. The present invention also relates to high throughput printing devices that utilize the print heads of the present invention.Type: GrantFiled: January 7, 2022Date of Patent: December 31, 2024Assignee: Vaxxas Pty LimitedInventors: Xi Wang, Michael Carl Junger, Sasikaran Kandasamy, Neil Harris, Christopher Flaim
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Patent number: 12142496Abstract: A substrate processing apparatus includes a holder, a nozzle arm and a position adjusting device. The holder is configured to hold a substrate. The nozzle arm has a nozzle configured to supply a processing liquid to a peripheral portion of the substrate. The position adjusting device is provided at the nozzle arm and is configured to adjust a position of the substrate to a given position on the holder.Type: GrantFiled: May 13, 2020Date of Patent: November 12, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Yoshifumi Amano, Kazuhiro Aiura
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Patent number: 12116664Abstract: A transport carrier includes a carrier body being able to hold a substrate that is a deposition target, by which the substrate is transported in a deposition apparatus while being held, wherein the carrier body includes magnetic chucking means which magnetically chucks a mask which shields a non-deposition region of the substrate through the substrate and holds the mask in a state in which the mask has come into contact with a film formation surface of the substrate.Type: GrantFiled: December 12, 2019Date of Patent: October 15, 2024Assignee: CANON TOKKI CORPORATIONInventors: Shigeyuki Ogawa, Takumi Shibata, Kenta Tsukamoto, Kazuo Akita
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Patent number: 12091754Abstract: An embodiment is a nozzle for use in additive manufacturing and other applications. The nozzle defines a flow path and is configured to generate a supersonic flow of particles or fluid during operation. The embodiment provides at least one auxiliary flow path port that is configured to introduce an auxiliary flow into the nozzle relative to the flow path that protects an internal surface of the nozzle from wear and corrosion, thereby extending the life of the nozzle for extended periods of continuous operation. An embodiment centralizes particle location along its continuous flow path to achieve small footprint material deposition, thereby increasing 3D print resolution for building more intricate components.Type: GrantFiled: April 22, 2020Date of Patent: September 17, 2024Assignee: Northeastern UniversityInventor: Ozan C. Ozdemir
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Patent number: 12084756Abstract: Provided are a carrier component and a coating developer device. The carrier component includes a supporting pillar, a first carrier stage and a second carrier stage that is provided with an accommodating cavity and a through mounting hole in communication with the accommodating cavity and includes at least two casings which are assembled to form the through mounting hole matched with the supporting pillar and the accommodating cavity surrounding the first carrier stage; and the at least two casings are detachably connected to one another.Type: GrantFiled: August 12, 2021Date of Patent: September 10, 2024Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.Inventor: Buxiang Chen
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Patent number: 12070805Abstract: A drill spindle accessory is disclosed. The drill spindle accessory includes a fixed plate, a drive shaft, a pivot plate, and a working shaft. The drive shaft is mounted to the fixed plate. The drive shaft has a longitudinal axis that extends through a center of the fixed plate. The drive shaft is configured to be rotated by a drill motor. The pivot plate is pivotally coupled to the fixed plate at a pivot point offset from the longitudinal axis of the drive shaft. The working shaft is mounted to the pivot plate. The working shaft has a longitudinal axis that extends through a center of the pivot plate.Type: GrantFiled: December 21, 2021Date of Patent: August 27, 2024Assignee: The Boeing CompanyInventor: James N. Buttrick
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Patent number: 12051629Abstract: A semiconductor device manufacturing system includes a spin coater and a coating layer inspector. The spin coater includes: a chuck, a rotation driver configured to rotate the chuck; and a solution dispenser configured to spray a solution onto a portion of the coating layer formed on an edge portion of the wafer, wherein the coating layer inspector includes an edge inspection camera and an inspection controller configured to determine a radius, eccentricity, and a top-view shape of the coating layer, based on images of the edge portion of the wafer.Type: GrantFiled: March 20, 2020Date of Patent: July 30, 2024Assignee: Samsung Electronics Co., Ltd.Inventors: Seunghwa Hyun, Younghwan Kim, Hwayoung Park, Youngsu Ryu, Yusang Cheon
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Patent number: 12023699Abstract: Provided is a container processing system capable of improving a speed of processing containers with a simple configuration and providing a compact production line. The container processing system (10) includes a container conveyer (20) having a container conveying path (21a) that conveys containers (C) arranged in a row and a container processor (40) that performs processing on the containers (C) in a container processing area (A2) set lateral to a container transfer area (A1) set in a segment of the container conveying path (21a). The container conveyer (40) includes a container carrier (21) conveying the containers (C) arranged in the row along the container conveying path (21a) and a container transferer (22) moving a container row including the plurality of containers (C) arranged in the row in the container transfer area (A1) toward the container processing area (A2).Type: GrantFiled: December 3, 2020Date of Patent: July 2, 2024Assignee: TOYO SEIKAN CO., LTD.Inventors: Taketoshi Manou, Kouhei Endo, Takuya Mori, Masaaki Fujitani, Tomoyuki Miyazaki, Keisuke Nyuu
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Patent number: 12024772Abstract: In accordance with some embodiments herein, apparatuses for deposition of thin films are provided. In some embodiments, a plurality of stations is provided, in which each station provides a different reactant or combination of reactants. The stations can be in gas isolation from each other so as to minimize or prevent undesired chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) reactions between the different reactants or combinations of reactants.Type: GrantFiled: July 12, 2022Date of Patent: July 2, 2024Assignee: ASM IP Holding B.V.Inventors: Jun Kawahara, Suvi Haukka, Antti Niskanen, Eva Tois, Raija Matero, Hidemi Suemori, Jaako Anttila, Yukihiro Mori
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Patent number: 11998943Abstract: An application method of an application device configured to apply an adhesive to an object. The method includes applying, prior to applying the adhesive to a specified part of the object, the adhesive to a part different from the specified part, calculating an application quantity of the adhesive applied to the part different from the specified part, making a first correction configured to correct an application condition of the adhesive based on a result of the calculation, and applying the adhesive to the specified part using the application condition corrected in the first correction.Type: GrantFiled: March 12, 2021Date of Patent: June 4, 2024Assignee: NHK SPRING CO., LTD.Inventor: Akira Homma
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Patent number: 11992859Abstract: Disclosed herein is a system for slurry coating leveling. The system includes a guide frame and a scrapper apparatus coupled to the guide frame. The scrapper apparatus includes a plurality of scrapper fingers aligned substantially parallel to each other. The system also includes a contour guide coupled to the scrapper fingers. The contour guide is configured to guide movement of the scrapper fingers across a surface of a component having a slurry coating. The scrapper fingers conform to a contour profile of the surface to level the slurry coating on the surface of the component.Type: GrantFiled: April 23, 2021Date of Patent: May 28, 2024Assignee: RTX CORPORATIONInventors: Guolin Oo, Tracy A. Propheter-Hinckley
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Patent number: 11971661Abstract: A substrate processing apparatus includes a first unit block including a first substrate transfer region, a first and a second processing modules provided to face a first and a second sides of the first substrate transfer region in a left-right direction, and a first and a second transfer mechanisms provided at the first and the second sides and configured to deliver a substrate to the first and the second processing modules; a second unit block, stacked on the first unit block, including a second substrate transfer region and a third transfer mechanism; a substrate carry-in/out block provided at a first side of a stack of the unit blocks and configured to deliver the substrate to the first and the third transfer mechanisms; a relay block provided at a second side of the stack and configured to deliver the substrate to the second and the third transfer mechanisms.Type: GrantFiled: March 4, 2021Date of Patent: April 30, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Yoji Sakata, Masashi Tsuchiyama, Tsuyoshi Watanabe
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Patent number: 11972976Abstract: A planarization system comprises a substrate chuck configured to hold a substrate, a superstrate chuck configured to hold a superstrate, a planarizing head configured to support the superstrate chuck, a positioning system configured to cause the superstrate to come into contact with formable material dispensed on the substrate to form a multilayer structure, the multilayer structure including the superstrate, a film of the formable material, and the substrate, and an annular light source disposed between an upper end of the planarizing head and the substrate chuck. The annular light source is configured to emit light onto an outer annular region of the multilayer structure without emitting the light onto an inner central region of the multilayer structure. The inner central region is located radially inward relative to the outer annular region.Type: GrantFiled: April 29, 2021Date of Patent: April 30, 2024Assignee: CANON KABUSHIKI KAISHAInventor: Byung-Jin Choi
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Patent number: 11968881Abstract: Shadow masks comprising a multi-layer membrane having a mechanical pre-bias that compensates the effect of gravity on the membrane are disclosed. A shadow mask in accordance with the present disclosure includes a membrane that is patterned with a desired pattern of apertures. The layers of the membrane are selected such that their residual stresses collectively give rise to a stress gradient that is directed normal to the plane of the membrane such that the stress gradient mitigates gravity-induced sag. In some embodiments, the membrane includes a layer pair having internal stresses that are of opposite signs to effect a tendency to bulge outward from the plane of the membrane prior to its release from the substrate. An exemplary membrane includes a layer pair comprising a layer of stoichiometric silicon dioxide that is under residual compressive stress and a layer of stoichiometric silicon nitride that is under residual tensile stress.Type: GrantFiled: July 20, 2021Date of Patent: April 23, 2024Assignee: eMagin CorporationInventor: James A. Walker