Patents Examined by Steve H. Ver Steeg
  • Magnetron sputter source with multipart target
    Patent number: 6692618
    Abstract: A device and method has a magnetron sputter source with a multipart target (3, 4) and movable magnet system (5). By variation of the power delivery of the power supply (6), specific areas of the multipart target (3, 4) can be preferably affected, which permits setting the stoichiometry of the sputtered-off target materials on the substrate (15) to be covered and positively affecting the homogeneity of the layer structure.
    Type: Grant
    Filed: April 29, 2002
    Date of Patent: February 17, 2004
    Assignee: Unaxis Balzers Limited
    Inventor: Martin Dubs