Patents Examined by Susan McBee
  • Patent number: 4810618
    Abstract: A photopolymerizable composition comprises at least one polymerizable compound having at least one ethylenically unsaturated bond therein and at least one photopolymerization initiator and optionally at least one linear organic high molecular weight polymer and characterized in that the photopolymerization initiator comprises a specific combination of two kinds of compounds, for instance, 2,4,6-tris(trichloromethyl)-s-triazine and compound (12) represented by the following formula: ##STR1## The photopolymerizable composition exhibits a high sensitivity to extremely wide range of actinic rays extending from ultraviolet light to visible light and is useful for manufacturing PS plates and photoresist layer for use in making print circuit-boards or the like.
    Type: Grant
    Filed: January 11, 1988
    Date of Patent: March 7, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Mitsuru Koike, Koichi Kawamura