Patents Examined by Susan W. Berman
  • Patent number: 7763326
    Abstract: A maskant composition and a method of diffusion coating a metal component with the use of the maskant composition, where the maskant composition comprises a cross-linkable resin, a photoinitiator, and a gettering agent.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: July 27, 2010
    Assignee: United Technologies Corporation
    Inventors: Michael J. Minor, Jason E. Huxol
  • Patent number: 7759405
    Abstract: A high-solid UV-curable coating composition of the present invention, comprising a low viscosity multifunctional urethane acrylate oligomer, a UV-curable monomer, 10% by weight or less of an organic solvent and a photoinitiator has good workability and environmental characteristics and provides a coating film having improved properties including thermal shock resistance.
    Type: Grant
    Filed: February 7, 2006
    Date of Patent: July 20, 2010
    Assignee: SSCP Co. Ltd.
    Inventors: Su Dong Hong, Dong Soo Kim, Tae Yun Jeong, Sang Hwan Kim, Jung Hyun Oh
  • Patent number: 7758930
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Grant
    Filed: April 20, 2009
    Date of Patent: July 20, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
  • Patent number: 7754327
    Abstract: An article comprising an adhesive attachment region is provided. The adhesive attachment region comprises a radiation curable hot melt pressure sensitive adhesive.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: July 13, 2010
    Assignee: Henkel AG & Co. KGaA
    Inventor: Wei Kong
  • Patent number: 7754779
    Abstract: An ink for an ink jet printer includes an ink vehicle of at least one radically curable, multifunctional acrylate monomer or oligomer, at least one colorant, and at least one photoinitiator. The ink has a low viscosity at low jetting temperatures of 30 to 50° C. and is curable upon exposure to ultraviolet radiation.
    Type: Grant
    Filed: January 13, 2005
    Date of Patent: July 13, 2010
    Assignee: Xerox Corporation
    Inventors: Peter G. Odell, Adela Goredema
  • Patent number: 7750064
    Abstract: An antibacterial measure using titanium oxide includes mixing titanium oxide in a resin to form a coating resin, and then coating a key surface with the coating resin. This method requires formation of a coating layer on a resin molding and thus increases the number of the production steps and cost. Furthermore, in the method, a coating film containing an antibacterial agent is scraped off light by little at each time of keying, and thus the film is finally completely removed to lose its antibacterial function. A conceivable measure against this includes directly mixing a resin and an antibacterial agent. However, titanium oxide used as an antibacterial agent degrades a raw material resin. It has recently be thought that photocatalytic apatite as a substitute for titanium oxide also causes chalking, and an antibacterial coating layer has been formed on a surface of a resin molding.
    Type: Grant
    Filed: January 5, 2006
    Date of Patent: July 6, 2010
    Assignee: Fujitsu Limited
    Inventors: Masato Wakamura, Noriyasu Aso
  • Patent number: 7745505
    Abstract: UV-crosslinkable acrylic hotmelt pressure sensitive adhesives comprising acrylic and vinyl monomers, and a polymerizable UV photoinitiator. The photoinitiator comprises a spacer comprising both ethylene oxide and urethane, or urea, carbonate, or siloxane functional groups. The ethylene oxide is directly bonded to the chromophore (e.g., benzophenone) moiety, while the urethane (or urea, carbonate, siloxane) is closely linked to the polymerizable moiety (e.g., styrenic C?C double bond).
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: June 29, 2010
    Assignee: Henkel AG & Co. KGaA
    Inventors: Yuxia Liu, Darwin Scott Bull
  • Patent number: 7745506
    Abstract: A UV-curable ink-jet ink is provided, which has a high sensitivity and allows soft and highly fine patterns to be formed. The UV-curable ink-jet ink includes a mono-functional polymerizable monomer (A) having a hydroxyl group, a di(meth)acrylate ester (B) and a photo-polymerization initiator (C).
    Type: Grant
    Filed: July 11, 2007
    Date of Patent: June 29, 2010
    Assignee: Chisso Corporation
    Inventors: Hiroyuki Satou, Setsuo Itami, Fumitaka Ooizumi, Toshiyuki Takahashi
  • Patent number: 7744803
    Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: June 29, 2010
    Assignee: ShawCor Ltd.
    Inventors: Peter Jackson, Eileen Wan
  • Patent number: 7745507
    Abstract: This invention is to provide an absorbent member and a method for making such an absorbent member. The absorbent member comprises modified water absorbent having good production efficiency, good absorbency against pressure, good absorption speed, gel strength, good liquid permeability, and the like. The modified water absorbent resin is made by a method, which comprises (i) a mixing step comprising mixing a water absorbent resin, water, and a water-soluble radical polymerization initiator without addition of an ethylenically unsaturated monomer, to obtain a water absorbent resin composition, and (ii) an irradiating step comprising irradiating said water absorbent resin composition obtained in the mixing step with active energy rays, wherein the surface water content of said water absorbent resin in said water absorbent resin composition at least at any point of time in the irradiating step (ii) is controlled to a level of not lower than 3.0% by weight based on 100% by weight of the water absorbent resin.
    Type: Grant
    Filed: April 4, 2007
    Date of Patent: June 29, 2010
    Assignee: The Procter & Gamble Company
    Inventors: Yoshiro Mitsukami, Makoto Matsumoto, Taku Iwamura
  • Patent number: 7740482
    Abstract: Stable and substantially filled cationic dental compositions are described which include: (1) at least one cationically reactive compound (A); (2) at least one dental filler (B); (3) optionally, at least one dispersant (C) composed of at least one organic polymer or copolymer; (4) at least one cationic photoinitiator (D); and (5) optionally, at least one photosensitizer (E). The dental filler (B) is treated with at least one organosilicon coupling agent (F), and at least one compound (G). The organosilicon coupling agent (F) has at least one reactive function (rfA) directly linked to a silicon atom forming after activation of a chemical bond with the dental filler, and at least one reactive function (rfB) not directly linked to a silicon atom, forming after activation, a chemical bond with a reactive function (rfC) of the compound (G).
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: June 22, 2010
    Assignee: Bluestar Silicones France
    Inventors: Jean-Marc Frances, Martial Deruelle, Yves Giraud
  • Patent number: 7741379
    Abstract: An ultraviolet (UV) curable ink having infrared (IR) sensitivity includes a UV light curable matrix, a UV photoinitiator, and an IR sensitive dye.
    Type: Grant
    Filed: March 1, 2005
    Date of Patent: June 22, 2010
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventor: Jayprakash C. Bhatt
  • Patent number: 7732633
    Abstract: Compositions are provided that include an electron donor and a sensitizing compound. More specifically, the electron donor is an arylsulfinate salt. Methods of polymerization are also provided that can be used to prepare polymeric material from a photopolymerizable composition that includes ethylenically unsaturated monomers and a photoinitiator system. The photoinitiator system includes an electron donor and a sensitizing compound.
    Type: Grant
    Filed: April 23, 2009
    Date of Patent: June 8, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Rajdeep S. Kalgutkar, Michael C. Palazzotto
  • Patent number: 7732504
    Abstract: The invention relates to novel photoinitiators of formula (I) wherein each of the substituents is given the definition as set forth in the Specification and the claims. The photoinitiators can be used to prepare multifunctional photoinitiators.
    Type: Grant
    Filed: January 24, 2005
    Date of Patent: June 8, 2010
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Kurt Dietliker, Rinaldo Hüsler, Jean-Luc Birbaum, Jean-Pierre Wolf
  • Patent number: 7727599
    Abstract: The invention relates to a durably homogeneous, low-viscosity, radiation-curable coating material comprising a) x (meth)acrylated polysiloxanes and if desired b) y (meth)acrylated organic compounds and c) at least one particulate emulsifier having an average particle size of <1000 nm in at least one dimension, with the proviso that x?1, y?0, the sum of x+y?2 and the mixture of components a) and b) alone is not durably homogeneous.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: June 1, 2010
    Assignee: Goldschmidt GmbH
    Inventors: Hardi Doehler, Michael Ferenz, Sascha Herrwerth, Matthias Naumann, Joachim Venzmer, Andreas Landgraf
  • Patent number: 7727811
    Abstract: The present invention relates to a pressure-sensitive adhesive sheet for processing a semiconductor wafer or semiconductor substrate, which includes a base material and a pressure-sensitive adhesive layer which is polymerizable and curable by an energy ray, the pressure-sensitive adhesive layer being disposed on a surface of the base material, in which the pressure-sensitive adhesive layer includes a base polymer, a multifunctional acrylate-based oligomer which has an energy-ray polymerizable carbon-carbon double bond and has a molecular weight of 1000 to 2500, and a multifunctional acrylate-based compound which has an energy-ray polymerizable carbon-carbon double bond and has a molecular weight of 200 to 700. The pressure-sensitive adhesive sheet of the invention is excellent in follow-up properties to a minute unevenness with a depth of about 0.
    Type: Grant
    Filed: May 11, 2007
    Date of Patent: June 1, 2010
    Assignee: Nitto Denko Corporation
    Inventors: Toshio Shintani, Fumiteru Asai
  • Patent number: 7714034
    Abstract: Polymerizable dental material which contains at least one radically-polymerizable monomer and at least one bisacylphosphine oxide of the Formula I, in which R1 is a linear or branched C2 to C14 alkyl residue, which can be interrupted by one or more O atoms, PG-Y—R2—X— or a substituted or unsubstituted, aromatic C6 to C14 radical; R2 is absent or a linear or branched C1 to C20 alkylene radical, which can be interrupted by one or more O atoms; R3 is H, a linear or branched C1 to C6 alkyl residue or PG-Y—R2—X—; R4 is a linear or branched C1-C6 alkyl or —O—C1-C6 alkyl residue; R5 is H or PG-Y—R2—X—; R6 is H or PG-Y—R213 X—; PG is a polymerizable group; X is absent, O or S; Y is absent, O, S, an ester, amide or urethane group; the bisacylphosphine oxide having at least one PG-Y—R2—X group and X and/or Y being absent if R2 is absent.
    Type: Grant
    Filed: March 21, 2006
    Date of Patent: May 11, 2010
    Assignee: Ivoclar Vivadent AG
    Inventors: Norbert Moszner, Volker M. Rheinberger, Ulrich Salz, Heinrich Gruber, Robert Liska, Beate Ganster, Gerald Ullrich
  • Patent number: 7713462
    Abstract: An ink composition is provided that includes a perfluoroalkyl group-containing polymer, a polymerizable monomer, and a radical polymerization initiator, in which at least 80 wt % of the polymerizable monomer is a monofunctional polymerizable monomer selected from the group consisting of a monofunctional acrylate, a monofunctional methacrylate, a monofunctional vinyloxy compound, a monofunctional N-vinyl compound, a monofunctional acrylamide, and a monofunctional methacrylamide.
    Type: Grant
    Filed: September 24, 2008
    Date of Patent: May 11, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Yuuichi Hayata, Kazuhiro Yokoi
  • Patent number: 7714033
    Abstract: The objective of the present invention is to provide a photosensitive insulating resin composition which is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film that are excellent in various properties including resolution, electrical insulation property and thermal shock resistance, a cured product and an electronic component having the cured product. The present photosensitive insulating resin composition comprises an alkali-soluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by the following general formula (1), and a crosslinking agent. [In the formula (1), R is hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is oxygen atom or sulfur atom.
    Type: Grant
    Filed: July 31, 2007
    Date of Patent: May 11, 2010
    Assignee: JSR Corporation
    Inventors: Atsushi Ito, Hirofumi Goto, Hirofumi Sasaki, Ryuichi Okuda
  • Patent number: 7714036
    Abstract: A method of producing an improved polyethylene, especially an ultra-high molecular weight polyethylene utilizes a sequential irradiation and annealing process to form a highly cross-linked polyethylene material. The use of sequential irradiation followed by sequential annealing after each irradiation allows each dose of irradiation in the series of doses to be relatively low while achieving a total dose which is sufficiently high to cross-link the material. The process may either be applied to a preformed material such as a rod or bar or sheet made from polyethylene resin or may be applied to a finished polyethylene part. If applied to a finished polyethylene part, the irradiation and annealing must be accomplished with the polyethylene material not in contact with oxygen at a concentration greater than 1% oxygen volume by volume.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: May 11, 2010
    Assignee: Howmedica Osteonics Corp.
    Inventors: Aiguo Wang, John H. Dumbleton, Aaron Essner, Shi-Shen Yau