Abstract: The present techniques generally concern methods and systems for managing undesired effects in an electrical grid, which may include rapid voltage change(s) and/or flicker(s). The system includes an event detection module operatively connected to a plurality of horticultural light sources. The event detection module is configured to determine a power usage of the horticultural light sources, based on illumination conditions, detect an event affecting the illumination conditions, determine whether the event causes the undesired effects in the electrical grid, based on an evolution of the power usage of the horticultural light sources in response to the event, and send illumination instructions to the horticultural light sources to adjust the power usage of the horticultural light sources, if the event causes the undesired effects.

Abstract: Embodiments disclosed herein include a process power controller for a plasma processing tool. In an embodiment, the process power controller includes a process power source optimizer, a source predictor, and a process uniformity controller. In an embodiment, the source predictor is communicatively coupled to the process power source optimizer and the process uniformity controller.

Abstract: A linear driving module includes: a control circuit, a dimming module, and a low-dropout regulator. The control circuit generates switch signals in response to a change in a pulsed DC voltage. The dimming module receives the pulsed DC voltage. The dimming module includes dimming units. Light-emitting diode units in the dimming units are in a light-on state or a light-off state. The low-dropout regulator receives an input voltage from the dimming unit, and converts the input voltage into a regulated voltage. The input voltage varies with the number of light-emitting diode units in the light-on state. The input voltage is lower than the pulsed DC voltage, and the regulated voltage is lower than the input voltage.

Abstract: Embodiments provided herein generally include apparatus and methods in a plasma processing system for rapid and inexpensive repair and replacement of RF sensors necessary for the operation of radio frequency (RF) power generation and impedance matching equipment used for generating a plasma in a plasma chamber during semiconductor processing therein. Flexible communications between equipment of the plasma processing system allows sharing of process information and equipment settings for batch processing of a plurality of semiconductor wafers during the manufacturing process. Operational settings of a master plasma processing system may be used to control the operation of a plurality of slave processing systems. In addition, the operational settings of the master plasma processing system may be recorded and reused for controlling the plurality of slave processing systems.

Abstract: According to the present invention, provided is an antenna mechanism 3 that adjusts the impedance of an antenna body through which a high-frequency current flows to generate plasma by means of a simple configuration, and generates plasma P, and comprises: the antenna body 31 through which high-frequency current flows; and one or a plurality of adjustment circuits 32 provided adjacent to the antenna body 31. The adjustment circuit 32 has a metal conductor 321 forming a closed circuit and a capacitor 322 forming the closed circuit.

Abstract: A first radiofrequency signal generator is set to generate a low frequency signal. A second radiofrequency signal generator is set to generate a high frequency signal. An impedance matching system has a first input connected to an output of the first radiofrequency signal generator and a second input connected to an output of the second radiofrequency signal generator. The impedance matching system controls impedances at the outputs of the first and second radiofrequency signal generators. An output of the impedance matching system is connected to a radiofrequency supply input of a plasma processing system. A control module monitors reflected voltage at the output of the second radiofrequency signal generator. The control module determines when the reflected voltage indicates a change in impedance along a transmission path of the high frequency signal that is indicative of a particular process condition and/or event within the plasma processing system.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a process chamber having a treating space therein; a support unit for supporting a substrate within the process chamber; a gas supply unit for supplying a process gas inside the process chamber; and a plasma generation unit for generating a plasma from the process gas, wherein the plasma generation unit comprises: a top electrode disposed above the substrate; a bottom electrode disposed below the substrate; an edge electrode disposed at an edge surrounding the substrate; three high frequency power sources applying a high frequency power to the bottom electrode; and an edge impedance control circuit connecting to the edge electrode.

Abstract: An exemplary RF module includes a dielectric substrate with metal traces on one surface that connect high frequency components and provide reference ground. Other metal traces on the other surface of the substrate also provide high frequency transmission lines and reference ground. An enclosure made using semiconductor manufacturing technology is mounted to the substrate and has conductive interior recesses defined by extending walls that are connected to the reference ground. The recesses surround the respective components and provide electromagnetic shielding. The dimensional precision in the location and smoothness of the walls and recesses due to the semiconductor manufacturing technology provides repeatable unit-to-unit RF characteristics of the RF module. One way of mounting the enclosure to the substrate uses a plurality of metal bonding bumps extending outwardly from the walls to engage reference ground metal traces on the substrate.

Abstract: An integrated multi-layered lighting system includes a first board having a first component area and a first light area, a second board coupled to and offset from the first board, the second board having a first opening overlapping the first light area of the first board in a plan view, and a second component area overlapping the first component area of the first board in a plan view, a plurality of light emitting diodes (LEDs) coupled to the first board and positioned in the first light area corresponding to the first opening of the second board, and a light driver configured to drive the plurality of LEDs and including a plurality of first components coupled to the first board and positioned in the first component area and a plurality of second components coupled to the second board and positioned in the second component area.

Abstract: A trim element that includes a cover layer defining an outer surface and having at least two distinct backlit pattern areas, the trim element further including at least one lighting module having at least one light source and a first light guide arranged for guiding light from the light source toward the backlit areas of the cover layer. The trim element includes a switching module extending between the cover layer and the lighting module, the switching module having at least two optical shutter areas extending opposite every backlit pattern area of the cover layer and being configurable between an open position and a closed position.

Abstract: A lighting control system having a driver for independently controlling multiple light sources. One lighting control system includes an input capable of being driven in a first polarity and a second polarity reversed from the first polarity, a first light source connected to the input and configured to generate light when driven at the first polarity, and a second light source connected to the input and configured to generate light when driven at the second polarity. The lighting control system includes a steering bridge connected to the input and configured to control the polarity of the input, and a controller connected to the steering bridge. The controller is configured to control, based on a steering drive command, the steering bridge, and provide, to the input, lighting control signals to independently control the first light source and the second light source.

Abstract: A method is provided for storing light distributions of a matrix headlight system. The method includes loading, from a memory, first control data for lighting means of a first matrix light module for generating a first light distribution; feeding the first control data to a comparison module; loading, from the memory, second control data for the lighting means of the first matrix light module or for lighting means of a second matrix light module for generating a second light distribution and feeding the second control data to a comparison module. The method compares the first and second control data; stores the first control data for the first light distribution if there is a similarity or equality between the first and second control data; and linking the second control data for the second light distribution by means of a link to the control data for the first light distribution.

Abstract: Apparatus and methods for lighting. The apparatus may include a power supply. The apparatus may include a controller. The controller may be configured to receive power from the power supply. The controller may be configured to receive a dimming signal generated external to the controller. The controller may be configured to receive from a user selection that includes a CCT partition set-point. The controller may be configured to transmit to a light source lighting power. The lighting power may correspond to the dimming signal. The lighting power may correspond to the CCT partition set-point. The light source may include a high correlated color temperature (“CCT”) LED. The light source may include a low CCT LED. The CCT partition set-point may correspond to a selected value of a partition of power between the high CCT LED and the low CCT LED.

Abstract: In order to suppress the amount of time needed for the start-up of a microwave tube carried out when voltage fed from a power source has decreased, while avoiding increase in scale of a power storage unit, this power supply device includes: a power supply unit that supplies power fed from the power source to the microwave tube that is provided with a cathode, a heater for heating the cathode, an anode, and a collector; a power storage unit that stores the fed power and, if the voltage of the fed power decreases, supplies stored power that is power obtained by the power storing, to the microwave tube; and a power supply switching unit that, if the voltage of the fed power decreases, stops supplying the stored power to the anode and does not stop supplying the stored power to the heater.

Abstract: Disclosed herein are system, apparatus, article of manufacture, method and/or computer program product embodiments, and/or combinations and sub-combinations thereof, for a dimmer device including a driver, and a controller communicatively coupled to the driver and to a monitor device. The monitor device can include a camera and is configured to take a plurality of images of the illumination load. The controller provides a control signal that indicates to the driver to adjust power supplied to an illumination load. The control signal is provided in response to a determination that a performance of the illumination load fails to satisfy a predetermined performance indicator. The performance of the illumination load is determined based on information related to the plurality of images of the illumination load taken by the camera of the monitor device. The controller can adjust a dimming level of the illumination load by providing the control signal to the driver.

Abstract: A lighting device includes lens which delimits the inner region of the lighting device and is configured so that light exits outwards from the inner region. The lighting device includes one or more light sources in the inner region to emit a first light radiation in a first wavelength range, the lens being non-transparent to the first light radiation. The inner region also includes one or more elements, each of which contains a photoluminescent phosphor, the element(s) being arranged to be illuminated by the first light radiation. The photoluminescent phosphor is configured to emit a second light radiation in a second wavelength range, based on the first light radiation illuminating the element(s), the second light radiation at least partly exiting through the lens which is transparent to at least a part of the second light radiation.

Abstract: A magnet system comprising: a supplied magnetic field producer configured for creating a supplied magnetic field (SMF) or a supplied radial electric field producer configured for creating a supplied radial electric field (SREF); and an electron gun positioned so as to fire electrons into the SMF or the SREF such that the electrons fired from the electron gun form an electron coil, wherein the electron coil creates a self-generated magnetic field (SGMF), wherein the electron coil is formed in a vacuum.

Abstract: Disclosed is a light source control apparatus, which includes an image acquirer that obtains information about an image to be displayed from a light source matrix, and a controller that changes a resolution of the image based on the information about the image and controls an operation of the light source matrix such that the image having the changed resolution is displayed.

Abstract: An ion implantation method includes acquiring a first data set for setting beam energy of an ion beam output from the high energy multi-stage linear acceleration unit to be a first output value, determining a second data set for setting the beam energy of the ion beam output from the high energy multi-stage linear acceleration unit to be a second output value different from the first output value, based on the first data set, and performing ion implantation by irradiating a workpiece with the ion beam output from the high energy multi-stage linear acceleration unit operating in accordance with the second data set. An acceleration phase of the high frequency accelerator in each of the plurality of stages is the same between the first data set and the second data set, in all of the high frequency accelerators respectively in the plurality of stages.

Abstract: A device for measuring a density of plasma is provided. The device includes a first sensor configured to measure a microwave spectrum of an input port reflection parameter of plasma, the first sensor having a probe including a conductive material and a flat plate shape, and a second sensor configured to measure an optical signal generated from the plasma, the second sensor being configured to detect the optical signal through the probe of the first sensor.