Abstract: Systems configured to provide illumination for wafer inspection performed by a wafer inspection tool are provided. One system includes one or more pupil lenses configured to focus a first far field pattern having a shape different than a shape of light generated by a light source. The system also includes a field lens array positioned between the one or more pupil lenses and an aperture stop. In addition, the system includes a lens group configured to focus a second far field pattern generated by the field lens array to a back focal plane of the lens group. The back focal plane of the lens group is a field plane of a wafer inspection tool at which a wafer to be inspected is placed during wafer inspection.

Abstract: In an LCD panel substrate and a manufacturing method thereof, a gate pattern includes a gate line formed on a pixel region and a peripheral region of a transparent insulating substrate and a gate electrode branched from the gate line. A gate insulating film is formed on the substrate having the gate pattern. An active pattern is formed on the gate insulating film and including a first impurity region, a second impurity region, and a channel region therebetween. A data pattern is formed on the active pattern and the gate insulating film. The data pattern includes a first electrode, a second electrode, and a data line. A first insulating interlayer is formed on the data pattern and the gate insulating film.