Abstract: An apparatus or system of estimating a spectrum of an object includes a plurality of filters or a plurality of filter areas that respectively have spectral characteristics different from one another, wherein at least two filters or filter areas have transmittance greater than a predetermined value throughout a wavelength range subject for estimation. The image capturing apparatus or system estimates a line spectrum of an object using spectral images of the at least two filters or filter areas having transmittance greater than the predetermined value.

Abstract: A system for detecting misalignment of an aero surface relative to other aero surfaces during simultaneous deployment of the aero surfaces is disclosed. A generator configured to shine a laser through aligned apertures in a series of aero surfaces towards a reflector during deployment of the aero surfaces, a receptor to detect reflection of the laser from the reflector back through the apertures to the generator and, a controller operable to terminate further deployment of the aero surfaces in the event that no reflection is detected by the receptor, or if an actual time taken for the reflected beam of light to be detected by the receptor differs from a predetermined time.

Abstract: An aspheric face form measuring method calculates phase information of interference light from light intensity of a fringe pattern image obtained by detecting interference light that is formed by measurement light and reference light reflected off a subject aspheric face being overlaid. The method changes a relative distance between an optical system and the subject aspheric face and transitions a position of a null region. The method performs calculation of form data for a vertical incident region where measurement light is vertically incident to the subject aspheric face, using phase information and a scanning amount. The method performs calculations of form data, of the null regions, a non-vertical incident region that is outside of the vertical incident region. The method also composites a plurality of partial form data of the subject aspheric face previously calculated, using each of a plurality of the phase information and scanning amounts.

Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.

Abstract: The invention relates to a system and a corresponding method for optical coherence tomography having at least one interferometer for emitting light with which a specimen is irradiated, a specimen arm comprising a specimen objective by means of which light emitted by the interferometer is focused in a focus lying within the specimen, a detector for collecting light which is reflected by the specimen, and a control unit for controlling the system such that during the collection alight, which is respectively reflected at different depths of the specimen, the imaging properties of the specimen objective are changed.

Abstract: A defect inspection method according to the present invention is a defect inspection method for inspecting a defect of a semiconductor wafer, including the steps of: (a) forming a mark on a semiconductor wafer that is an inspection object, the mark corresponding to the size of a device chip that will be obtained from the semiconductor wafer, the mark being formed with respect to a predetermined device chip on the semiconductor wafer; and (b) during a predetermined process included in a semiconductor wafer process or before the semiconductor wafer process, performing a defect inspection on the semiconductor wafer and recognizing defect information based on the mark as a reference.

Abstract: The present invention is a color measurement device for color measurement of a printed pattern printed onto a medium, the color measurement device characterized by comprising a pressing member for pressing the medium; a color measurement section for performing color measurement of the printed pattern; a power supply for outputting power for the pressing member to press the medium; a detection section for detecting displacement of an output section of the power supply; and a controller for causing the color measurement section to perform color measurement of the printed pattern which was printed onto the medium pressed by the pressing member, the controller being adapted to reduce the power output by the power supply from a state in which the pressing member was pressed against the medium, and to detect a malfunction of the power supply on the basis of the detection result obtained from the detection section.

Abstract: A plasma generating unit for a process monitoring device includes a hollow first electrode extending in a length direction and a second electrode extending in the length direction and positioned within and displaced from the first electrode with a distance therebetween. The first electrode has an inner diameter and the second electrode has an outer diameter selected to vary the distance between the electrodes in the length direction so that the plasma generating unit generates a plasma by ionizing a gas flowing between the electrodes at a different position in the length direction based on a pressure of the gas.

Abstract: A method, system and apparatus for obtaining a parameter of interest relating to a wellbore is disclosed. A fiber optic cable having a plurality of sensors is disposed in the wellbore, wherein the plurality of sensors have reflectivity values configured to provide improved signal-to-noise ratio compared to signal-to-noise ratio of a plurality of sensors having substantially same reflectivity values. Light is propagated into the fiber optic cable from a light source and signals are received at a detector from the plurality of sensors in response to interaction of the propagated light with the plurality of sensors. A processor may be used to obtain the parameter of interest from the received signals. The fiber optic cable may be coupled to a member in the wellbore, wherein the parameter of interest is related to the member.

Abstract: The invention relates to a method and an apparatus for determining the height of a number of spatial positions on the sample, defining a height map of a surface through interferometry with a broadband light source. The method can involve for each spatial position: obtaining a correlogram during scanning of the surface plane of the objective and estimating the point of the correlogram where an amplitude of the correlogram is at its maximum, thus determining an approximation of the height of the spatial position on the sample. The estimation of the value where the correlogram has its maximum can involve subjecting the correlogram to a Fourier transform, subjecting the Fourier transformed signal to a filter, subjecting the filtered signal to an inverse Fourier transform, and calculating the location of the center of mass of the inversed filtered Fourier transformed signal.