Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and overlay misregistration. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: A sample analyzer including a detection unit for irradiating a biological sample with light and obtaining optical information; a cell classification processor for classifying cells contained in the biological sample into cell groups based on the optical information; a scattered light information obtaining processor for obtaining scattered light information relating to a cell included in a predetermined cell group; a calculation processor for calculating a component value corresponding to an amount of component contained in cell included in the predetermined cell group based on the scattered light information; and an output device for outputting the component value calculated by the calculation means is disclosed. A computer program product is also disclosed.