Abstract: A light-sensitive composition comprising a diazonium compound and a polymer having the recurring units represented by the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group; R.sub.2 represents an unsubstituted alkyl group; R.sub.3 represents an aliphatic or aromatic hydrocarbon group having a carboxyl group; R.sub.4 represents an aliphatic or aromatic hydrocarbon group which has at least one hydroxyl or nitrile group and which may be further substituted; n.sub.1, n.sub.2, n.sub.3, n.sub.4 and n.sub.5 represent the molar percents of the respective recurring units, provided that n.sub.1 is from about 5 to about 85 mol %, n.sub.2 is from 0 to about 60 mol %, n.sub.3 is from 0 to about 20 mol %, n.sub.4 is from about 3 to about 60 mol % and n.sub.5 is from greater than 0 to about 60 mol %.

Abstract: A high-resolution photosensitive composition which can be plasma-developed, including an acrylic polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H) for example ##STR1##

Abstract: Bead polymers are prepared by reverse suspension polymerization by a process in which an aqueous solution of water-soluble ethylenically unsaturated monomers are polymerized in an aliphatic hydrocarbon using an inorganic suspending agent based on a modified finely divided mineral and, in addition, from 0.1 to 5% by weight, based on the monomers used, of a nonionic surfactant, in the presence of a polymerization initiator, with the formation of a water-in-oil polymer suspension.

Abstract: The negative-working photosensitive composition of the invention, which is suitable as a photoresist material in the photolithographic processing of semiconductor devices, comprises (a) a condensation product of a hydroxy-substituted diphenylamine compound such as 4-hydroxy diphenylamine and a methylol melamine or alkoxylated methylol melamine by the reaction in a medium of phosphoric or sulfuric acid and (b) an azide compound capable of strongly absorbing UV or far UV light. The composition gives a photoresist layer having high resistance against heat in the post-baking and the attack of gas plasma encountered in the dry etching for semiconductor processing.

Abstract: This invention concerns the production of 1,4-cis polybutadiene, or copolymers of butadiene with other related diolefins, through the catalytic polymerization or copolymerization of butadiene monomer by a continuous or discontinuous process carried out in the absence or substantial absence of solvents or diluents and operating in the presence of solid bodies.

Abstract: Preparation of a starch ester having an Mn of 1000-50,000 and a degree of substitution of 0.4-3.0 by heating a mixture of starch, a Cl-7 monocarboxylic acid, water, and optionally a catalyst and meanwhile withdrawing water until the ester being formed has attained the desired degree of substitution. Optionally remaining free hydroxyl groups may be esterified by reaction with a carboxylic anhydride of -halide. The resulting solution may be treated to neutralize remaining free monocarboxylic acid by mixing it with an esterifiable hydroxyl compound and esterifying it at 40.degree.-270.degree. under the removal of water. In this way, use is made of cheap ingredients, and the resulting product is suitable for immediate use in a number of applications, e.g., as binder in coating compositions.

Abstract: Emulsion developers for diazo-sensitized printing plates are disclosed which are characterized by an oil phase containing a partially water-soluble aliphatic cyclic carbonate having the formula: ##STR1## where n is an integar from 0-2, and Z is selected from hydrogen, C.sub.1 -C.sub.3 alkyl, hydroxyl alkyl or chloroalkyl, chlorine, hydroxy or phenyl. The preferred carbonate is propylene carbonate.