Abstract: Stain-resistant compositions comprising sulfonated phenol-formaldehyde condensation products and polymers of ethylenically unsaturated monomers, polyamide textile substrates treated with the same, and processes for their preparation. The stain-resistant compositions and substrates possess improved stain resistance but do not suffer from yellowing to the extent that previously known materials do.
Type:
Grant
Filed:
December 6, 1988
Date of Patent:
November 28, 1989
Assignee:
E. I. Du Pont De Nemours and Company
Inventors:
Patrick H. Fitzgerald, Nandakumar S. Rao, Yashavant Vinod, Jeffrey R. Alender