Abstract: The invention relates to a method for contacting parts of a component integrated into a semiconductor substrate (1). According to the inventive method, a first contact hole is produced in an insulating layer (2), said contact hole being then filled with contact material (16) and connected to a line. The aim of the invention is to minimise the processes required for contacting parts of a component integrated into a semiconductor substrate. To this end, the hard mask (3) used to produce the contact hole is also used to structure the line.
Type:
Grant
Filed:
June 24, 2003
Date of Patent:
July 8, 2008
Assignee:
Infineon Technologies AG
Inventors:
Ludwig Dittmar, Wolfgang Gustin, Maik Stegemann