Patents Examined by Ton Minh-Toan
  • Exposure apparatus, exposure method, method for manufacturing device
    Patent number: 8896813
    Abstract: An exposure method and apparatus exposes a substrate via a projection optical system and a liquid. The liquid is circulated in a circulation path. At least a part of the liquid in the circulation path is supplied through a discharge path to a space below the projection optical system, the discharge path being connected to the circulation path. The substrate is exposed via the projection optical system and the liquid.
    Type: Grant
    Filed: June 2, 2011
    Date of Patent: November 25, 2014
    Assignee: Nikon Corporation
    Inventor: Yoshitomo Nagahashi
  • Extreme UV radiation generating device comprising a contamination captor
    Patent number: 8891058
    Abstract: The invention relates to an improved EUV generating device having a contamination captor for “catching” contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.
    Type: Grant
    Filed: July 10, 2009
    Date of Patent: November 18, 2014
    Assignee: Koninklijke Philips N.V.
    Inventors: Christof Metzmacher, Achim Weber