Abstract: Photosensitive insulating films are laminated on lower-layer interconnection layers and a connection hole is formed in the photosensitive insulating film, and a interconnection groove is formed in the photosensitive insulating film. The upper-layer interconnection layers fill the connection hole and the groove. With this arrangement, it is possible to provide a semiconductor device and a manufacturing method producing a multi-layer interconnection structure, in which the connection hole and the groove are formed in a simple process, yield is improved, and the number of process steps and cost are reduced.