Abstract: A coated cutting tool has a CVD coated and a substrate of a cemented carbide, wherein the metallic binder in the cemented carbide includes Ni. The CVD coating has an inner layer of TiN and a subsequent layer of TiCN. The C-activity relative to graphite in the metallic binder is lower than 0.15 and an average d electron value of the metallic binder is 7.00-7.43, wherein an interface between the substrate and the inner TiN layer is free of Ti-containing intermetallic phase.

Abstract: The method includes providing a computer model for producing the desired metal workpiece from the flat metal product in a processing procedure, the processing procedure including processing step on the flat metal product by a processing device, receiving technical data record characterizing the flat metal product, at least part of the data of the technical data record having been recorded during the production of the flat metal product, passing the technical data record to the input of the computer model, based on the passing of the technical data record, receiving a model value for an operating parameter of the processing device from the output of the computer model, producing the desired metal workpiece by controlling the processing procedure, the control of the processing procedure including a controlling of the processing device to perform the processing step on the flat metal product using the operating parameter set to the model value.

Abstract: A film forming apparatus includes: a rotary table provided in a chamber; a processing unit configured to perform plasma processing on a workpiece transferred by the rotary table; an inner wall configured to define a processing space and having an opening facing the rotary table; an outer wall configured to cover a periphery of the inner wall with a gap, and configured to form an exhaust space having an opening facing the rotary table; and an exhaust port connected to an exhaust device, wherein the processing unit is a film forming part configured to form a film by sputtering, and wherein both ends of the outer wall are in contact with a side surface of the chamber, and a portion of an outer periphery of the inner wall and the side surface of the chamber are partitioned, so that a reaction gas does not circulate in the exhaust space.

Abstract: Provided are an array substrate, a display panel and a display apparatus. The array substrate includes a main display region, at least one secondary display region adjacent to the main display region, and a transition display region adjacent to the at least one secondary display region and the main display region.

Abstract: The present disclosure discloses an apparatus. The apparatus according to the present disclosure may include a communication interface, one or more memories, and one or more processors. The one or more processors may be configured to: control the thin-film deposition devices to execute the thin-film deposition process by accessing the memory and executing a recipe; obtain in-process thin-film state data of the thin film from the thin-film measurement result received via the communication interface during the thin-film deposition process; and derive post-process thin-film state data of the thin film from the process condition data, the sensing data, and the in-process thin-film state data using a first correlation model.

Abstract: According to one aspect of the technique, there is provided a processing apparatus including: a process structure including: a process furnace, in which an object to be processed is processed by a gas, provided in a housing; and an opening configured to enable a maintenance and provided at a rear side of the housing; an exhaust structure configured to allow a maintenance region to be provided at a region facing the opening and to exhaust the gas from the process furnace; and an exhaust apparatus configured to secure the maintenance region at the region facing the opening and placed in contact with a side of the exhaust structure opposite to the process structure.

Abstract: Methods for forming a boron nitride film by a plasma enhanced atomic layer deposition (PEALD) process are provided. The methods may include: providing a substrate into a reaction chamber; and performing at least one unit deposition cycle of a PEALD process, wherein a unit cycle comprises, contacting the substrate with a vapor phase reactant comprising a boron precursor, wherein the boron precursor comprises less than or equal to two halide atoms per boron atom; and contacting the substrate with a reactive species generated from a gas comprising a nitrogen precursor.

Abstract: The current disclosure relates to methods for forming a film comprising transition metal on a substrate. The disclosure further relates to a transition metal layer, to a structure and a device comprising a layer that comprises a transition metal. In the method, transition metal is deposited on a substrate by a cyclic deposition process. The method comprises providing a substrate in a reactor chamber and executing a cyclical deposition process. The cyclical deposition process comprises the steps of providing a transition metal precursor in vapor phase into the reaction chamber and providing a halogen precursor in vapor phase into the reaction chamber to form a film comprising elemental transition metal on a substrate. The halogen precursor comprises only one halogen atom. The disclosure further relates to a deposition assembly for depositing a material comprising transition metal on a substrate.

Abstract: A deposition apparatus includes: a decompressable process container; a showerhead configured to supply a gas in the process container, the showerhead including a lower member having a plurality of gas holes and an upper member that forms, between the upper member and the lower member, a diffusion space that diffuses the gas; a mounting table arranged to face the showerhead and to form a process space between the mounting table and the showerhead; a lifting and lowering mechanism configured to lift and lower the mounting table; a cylindrical section that penetrates the showerhead and communicates with the process space; and a pressure sensor that is airtightly provided in the cylindrical section and configured to measure a pressure in the process space.

Abstract: Vapor deposition methods for depositing transition metal dichalcogenide (TMDC) films, such as rhenium sulfide thin films, are provided. In some embodiments TMDC thin films are deposited using a deposition cycle in which a substrate in a reaction space is alternately and sequentially contacted with a vapor phase transition metal precursor, such as a transition metal halide, a reactant comprising a reducing agent, such as NH3 and a chalcogenide precursor. In some embodiments rhenium sulfide thin films are deposited using a vapor phase rhenium halide precursor, a reducing agent and a sulfur precursor. The deposited TMDC films can be etched by chemical vapor etching using an oxidant such as O2 as the etching reactant and an inert gas such as N2 to remove excess etching reactant. The TMDC thin films may find use, for example, as 2D materials.

Abstract: The present disclosure relates to a cold spray metal process for providing an electrical connection within a multilayered composite article. The present disclosure relates to a cold sprayed metal coated article or a structural component having a polymeric composite material having at least one surface, a thermoplastic electrochemical insulating layer on the at least one surface, an electrical circuit may include a cold sprayed metal coating present on at least a portion of a surface of the electrochemical insulating layer, and at least one additional layer, the at least one additional layer encapsulating at least a portion of the cold sprayed metal between the additional layer and the electrochemical insulating layer. The structural component may include a cold sprayed metal coating having one or more non-continuous segments, where the one or more non-continuous segments are not in lateral contact with one another.

Abstract: An electronic device such as a wristwatch may include a conductive housing. A corrosion-resistant coating may be deposited on the conductive housing. The coating may include transition layers and an uppermost alloy layer. The transition layers may include a chromium seed layer on the conductive housing and a chromium nitride layer on the chromium seed layer. The uppermost alloy layer may include TiCrCN or other alloys and may provide the coating with desired optical reflection and absorption characteristics. The transition layers may include a minimal number of coating defects, thereby eliminating potential sites at which visible defects could form when exposed to salt water. This may allow the electronic device to exhibit a desired color and to be submerged in salt water without producing undesirable visible defects on the conductive housing structures.

Abstract: An electrocatalyst, a method of producing hydrogen gas by a hydrogen evolution reaction, and a method of producing oxygen gas by an oxygen evolution reaction. The electrocatalyst includes manganese oxide nanoparticles, and silver containing nanoparticles disposed on the manganese oxide nanoparticles, the silver-containing nanoparticles include a shell of silver tungstate disposed on a core of Ag. The electrocatalyst has an electrical resistivity of 0.50×107 ohm (?) to 6.0×107?, a charge transfer resistance of 325? to 450?, a Tafel slope of 55 mV/dec to 125 mV/dec, and an overpotential at 10 mA/cm2 of 0.05 mV to 200 mV.

Abstract: A bismuth vanadate electrode including vanadium-functionalized graphene quantum dots and a method for preparing the same is disclosed. More particularly, the addition of graphene quantum dots (GQDs) in the process of immersing a bismuth vanadate (BiVO4) electrode in an alkaline solution to remove vanadium oxide (V2O5) excessively formed on the surface of the electrode during its preparation, protects the electrode from the alkaline solution as the graphene quantum dots are adsorbed onto the surface of BiVO4 while V2O5 is removed. This improves the efficiency of oxygen evolution reaction (OER) when applied to a photoanode due to vanadium (V)-functionalized graphene quantum dots formed as the etched vanadium ions ((VO)43?) are adsorbed onto the graphene quantum dots.

Abstract: An electrolyser operates within an energy system, for example to provide grid services, energy storage or fuel, or to produce hydrogen from electricity produced from renewable resources. The electrolyser may be configured to operate at frequently or quickly varying rates of electricity consumption or to operate at a specified power consumption.

Abstract: A multi-channel alkaline hydrogen production system is disclosed. Using liquid outlets of a hydrogen alkali treatment unit and an oxygen alkali treatment unit, a circulating alkaline liquid is outputted to an alkaline liquid circulating pump and a controllable channel, and then the circulating alkaline liquid is returned to the negative electrode of an electrolyzer; Thus, a controller can control the amount of produced hydrogen according to the measured current of the electrolyzer, then calculates a corresponding alkaline liquid circulation volume reference value according to the amount of produced hydrogen, and according to the alkaline liquid circulation volume reference value, adjusts the circulation amount of the alkaline liquid of the multi-channel alkaline hydrogen production system and changes the gas purity of the multi-channel alkaline hydrogen production system by controlling the working states of the controllable channels on the two ends of the alkaline liquid circulating pump.

Abstract: The invention relates to a process for the oxidation of carbon-containing organic compounds where the said compounds have at least one bond with a bond order >1, wherein an oxidizing of these carbon-containing organic compounds to be oxidized is performed with electrochemically generated C—O—O oxidizing agents, in particular peroxodicarbonate. Also described is the use of C—O—O oxidizing agents generated electrochemically from carbonate, in particular peroxodicarbonate, as oxidizing agents for the oxidation of carbon-containing organic compounds, in particular carbon-containing organic compounds where the said compounds have at least one bond with a bond order >1.

Abstract: The present document describes an electrolytic cell comprising a protective layer comprising elemental copper covering at least in part or all of a refractory material assembly covering an interior surface thereof. Also described is a copper oxide containing composition comprising copper oxide and any one of a reducing agent and a binder. Also described is a method of protecting a refractory material assembly covering an interior surface of an electrolytic cell, comprising covering at least in part, or all of the refractory material assembly with a copper sheet, a structure comprising elemental copper, a copper oxide, an elemental copper comprising composite material, a copper oxide containing composition and combinations thereof, to provide a protective layer comprising elemental copper.

Abstract: A semiconductor apparatus for pre-wetting a semiconductor workpiece includes a process chamber, a workpiece holder disposed within the process chamber to hold the semiconductor workpiece, a pre-wetting fluid tank disposed outside the process chamber and containing a pre-wetting fluid, and a conduit coupled to the pre-wetting fluid tank and extending into the process chamber. The conduit delivers the pre-wetting fluid from the pre-wetting fluid tank out through an outlet of the conduit to wet a major surface of the semiconductor workpiece, wherein the outlet of the conduit is positioned above the major surface of the semiconductor workpiece by a vertical distance.

Abstract: A plumbing fixture having a multi-color appearance includes a first portion including a first finish having a first appearance and a second portion including a second portion having a second appearance that differs from the first appearance. The plumbing fixture further includes a transition region between the first portion and the second portion, wherein the appearance of the third region is graduated from the first appearance to the second appearance between a first end of the transition region adjacent the first portion and a second end of the transition region adjacent the second portion. The plumbing fixture has an ombre appearance as a result of the graduated transition between the first portion and the second portion.