Abstract: The invention relates to a method of generating short, cyclically repeating, unipolar or bipolar pulse currents I.sub.G, I.sub.E for electroplating, and to a circuit arrangement for electroplating with which pulse currents I.sub.G, I.sub.E can be generated. Electroplating methods of this type are referred to as pulse-plating methods. According to the invention, the secondary winding 6 of a current transformer 1 is connected in series into the electroplating direct current circuit 5, consisting of a bath direct current source 2 and a bath which is contained in an electroplating cell and which is represented by resistor R.sub.B. The primary winding 7 of the transformer has a larger number of turns than the secondary winding. The primary winding is controlled with pulses of high voltage and with relatively low current. The high pulse current on the secondary side temporarily compensates in pulses the electroplating direct current.