Patents Examined by William David Coloman
  • Patent number: 6576489
    Abstract: The invention includes methods of forming microstructure devices. In an exemplary method, a substrate is provided which includes a first material and a second material. At least one of the first and second materials is exposed to vapor-phase alkylsilane-containing molecules to form a coating over the at least one of the first and second materials.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: June 10, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Toi Yue Becky Leung, Jeffrey D. Chinn