Abstract: A method of determining overlay error comprises creating a first and second layers of an integrated circuit, each having an active circuit feature and an adjacent kerf area. Each kerf area includes a first measurement feature separated from and corresponding substantially to the layer's active circuit feature. The circuit and kerf areas of the layers are substantially superimposed. The distance of separation between the active circuit feature and the layer kerf measurement feature in each layer in the direction of overlay error is the same. The second layer kerf measurement feature is displaced from the first layer kerf measurement feature in a direction perpendicular to the direction that the overlay error is to be determined. Overlay error is determined by measuring distance of separation in the direction of overlay error between the common points of reference of each of the first and second layer kerf measurement features.

Abstract: A device for detecting the relative position of a generally horizontal reference plane of light includes a plurality of photodetector elements, a weighting circuit, and an output circuit. The photodetector elements are positioned on the device in a generally vertically oriented row. The weighting circuit provides a portion of the electrical output of each photodetector element as a first reference signal related to the spacing of the photodetector element from a first end of said row, and a portion of the electrical output of each photodetector element as a second reference signal related to the spacing of the photodetector element from the second end of said row. The output circuit is responsive to the weighting circuit for determining the relative levels of the first and second reference signals and the position of said reference plane of light with respect to the detector device.

Abstract: The present invention provides a light scattering particle size distribution measuring apparatus, which does not require a burdensome optical axis adjustment of operator for every measurement and which is capable of maintaining a state most suitable for measuring. In the present invention, the light scattering particle size distribution measuring apparatus irradiates a sample with light from a light source, detects the resulting scattered light from the sample by a photodetector. Thereafter, the present invention calculates the size distribution of particles in the sample on the basis of the scattered light intensity pattern obtained. In addition, an automatic adjustment mechanism aligns and maintains the central position of the foregoing photodetector with the central position of the foregoing light source.

Abstract: A method and apparatus for the spectrochemical analysis of a sample in which a solid state array detector (82) is used to detect radiation (62) of spectrochemical interest. The invention involves the use of a shutter (72) adjacent the entrance aperture (70) of a polychromator (74-80) to expose the detector (82) to the radiation (62) for varying lengths of time whereby for short duration exposure times charge accumulation in elements (i.e. pixels) of the detector (82) due to high intensity components of the radiation is limited and for longer exposure times charge accumulation in elements (pixels) of the detector (82) due to feeble intesity components of radiation (62) is increased. This ensures that each reading of the detector (82) includes at least one exposure in which the amount of charge accumulated at each wavelength of interest is neither too little or too great.

Abstract: An optical system for detecting and coupling light to optical devices, and a method for aligning and calibrating the system. The system includes positioning stages and fiber sensors. The fiber sensors are used to detect the positions of calibration pieces and other sensors in a variety of configurations. From these detected positions, any misalignment of the sensors or positioning stages may be calculated and corrected for. The fiber sensors calibrate the system.

Abstract: An offset measuring board is formed of a rectangular metal plate which can be positioned at a component mounting position by a positioning device and which has at least in proximity to one corner portion thereof a recognition through hole, serving as a recognition mark, having a black bottom face within a recessed portion.

Abstract: In the light-receiving element array device according to the present invention, a light-receiving section can be arranged at a position close to an input optical fiber so that the light-receiving element array device can be used as an optical demultiplexer based on the Littrow arrangement. Further the present invention enables suppression of coma aberration and minimization of an optical demultiplexer by shortening a length of the optical system. To achieve the above-described object, a rectangular chip having a light-receiving section with a number of light-receiving elements arrayed in row thereon is sealed in a rectangular package having external leads and the bonding pads on the chip and the bonding terminals of the packages are connected with a bonding wire or the like.

Abstract: A method (and system) for manufacturing an optical switching device. The method includes forming an array plate comprising at least one hundred sites from a first physical process, where each of the sites is for coupling to an optical fiber. The sites have a first spatial degree of error relative to an ideal mathematical grid of the sites. The first spatial degree of error is derived from at least the first physical process. The method forms a lens plate comprising a plurality of lenses from a second physical process. Each of the lenses is going to be coupled to at least one of the sites on the array plate. The lenses have a second spatial degree of error relative to a second mathematical grid of lenses. The second spatial degree of error is derived from at least the second physical process. The method then derives lens measurement values from each of the plurality of lenses.

Abstract: The method for determining radiation stability of a crystal to radiation of a working wavelength to be employed in a subsequent application includes taking a first absorption spectrum (A) of a cleaved piece of the crystal with a given thickness (D) over a predetermined wavelength range from a first wavelength (&lgr;1) to a second wavelength (&lgr;2) by means of a spectrophotometer. Then the cleaved piece of the crystal is irradiated with an energetic radiation source so as to form all theoretically possible color centers (saturation). After the irradiating a second absorption spectrum (B) of the cleaved piece of crystal is taken over the same predetermined wavelength range. Then a surface integral of a difference spectrum of the first absorption spectrum and the second absorption spectrum over the predetermined wavelength range is formed and divided by the thickness (D) to obtain a scaled surface integral value.

Abstract: A method and an apparatus for nondestructively detecting the orientation of anisotropic molecules in thin films and in molecular layers in general. The present invention is based on a single measurement of the non-polarized photoluminescence spectrum, in order to determine whether the molecules are orientated at right angles or parallel to the surface of the molecular layer, fabricated with any technique. The method is fast and noninvasive and can also allow to observe noninterferingly in real time during growth the orientation of the molecules in the film. The result of this real-time observation can be used to optimize the growth conditions of the film in order to achieve the intended molecular orientation.