Abstract: A system for treating a patient during radiation therapy includes range compensators. Each of the range compensators shapes a distribution of a dose delivered to the patient by a beam emitted from a nozzle of a radiation treatment system. A positioning component holds the range compensator in place relative to the patient such that the range compensator lies on a path of the beam.

Abstract: Provided is a method for introducing into a probe 22 an eluate eluted from a component separation unit 14 that temporally separates components contained in a liquid sample, for obtaining charged particles, and for delivering the charged particles to a charged particle analysis unit 30 provided at a subsequent stage through a charged particle introduction opening 23, comprising steps of: supplying a gasification promoting gas for promoting gasification of the eluate and applying a predetermined charged-particle obtaining voltage to the probe 22 while the eluate is being introduced into the probe 22; and hindering the eluate nebulized by the probe 22 from moving toward the ion introduction opening 2 only in a time period other than a time period in which a target-component containing eluate is introduced into the probe 22.

Abstract: An impact ionisation spray or electrospray ionisation ion source comprising a nebuliser (30) having a first conduit (11) for providing a liquid sample and a second conduit (10) for providing a nebulisation gas in order to nebulise the liquid sample is disclosed. The first conduit (11) and second conduit (10) are of unitary construction with each other and may be made from glass. The ion source can provide a consistent and/or predictable spray profile for the nebulised sample.

Abstract: It is provided a charged particle beam manipulation device for a plurality of charged particle beamlets, the charged particle beam manipulation device including a lens having a main optical axis, the lens including at least a first array of multipoles, each multipole of the first array of multipoles configured to compensate for a lens deflection force on a respective charged particle beamlet of the plurality of charged particle beamlets, the lens deflection force being a deflection force produced by the lens on the respective charged particle beamlet towards the main optical axis of the lens.

Abstract: An ion source is provided comprising a nebuliser or electrospray probe (1) for nebulising a sample and an impact surface or target electrode (5). The impact surface or target electrode (5) comprises a tarnishable or oxidisable metal or an alloy comprising a tarnishable or oxidisable metal. Also provided is an ion source comprising a nebuliser or electrospray probe with a central wire comprising a tarnishable or oxidisable metal or an alloy comprising a tarnishable or oxidisable metal or an alloy comprising a tarnishable or oxidisable metal. Adducts with relatively heavy metals result in simplified multiply-charged mass spectra that are easier to interpret.

Abstract: Disclosed are techniques for mass spectrometry. In one example, an isotopologue of a target analyte is added to a sample. The sample and isotopologue are analyzed as it elutes from a chromatography system to form precursor ions. The precursor ions are mass analysed using a data independent acquisition (DIA) methodology comprising performing mass analysis scans in the MS1 domain and performing mass analysis scans in the MS2 domain. Upon identifying that the isotopologue is eluting from the chromatography system, a plurality of target scans are performed, each having a target isolation window including a mass to charge ratio representative of the target analyte over the duration of a chromatographic peak of the isotopologue for at least one of identification and quantitation of the target analyte. The target scans are configured to provide additional quantitation data for the target analyte.

Abstract: An environmental sensor may acquire data related to flux and energy of charged particles in an environment for using the data to determine, in substantially real time, whether the environment is conducive to an anomaly caused by the charged particles. The sensor may include an electrostatic analyzer structurally configured for charged particle detection, the electrostatic analyzer generating controllable electric fields to provide energy filtering of incoming charged particles, where, after filtering, the charged particles impact a charge multiplier to establish a detectable signal. The sensor may further include a plurality of silicon detector telescopes structurally configured to collectively detect electrons having energy within the range of about 100 electronvolts (eV) to about 5 mega-electronvolts (MeV) and to collectively detect protons having energy within the range of about 2 MeV to about 100 MeV.

Abstract: The invention provides a charged particle irradiation apparatus including: a collimator apparatus provided in an irradiation nozzle that emits a charged particle beam to an irradiation target; and a collimator control unit that controls the collimator apparatus. The collimator apparatus includes a collimator mechanism having one or more arm-shape collimators extending from a base part and a drive mechanism that moves the collimator mechanism on a plane perpendicular to a traveling direction of a charged particle beam. The arm-shape collimator includes one or more movable leaves that rotate independently of each other on the perpendicular plane. By moving the collimator mechanism and/or rotating the movable leaves so that the arm-shape collimators are arranged along a shape of an edge of an irradiation target on the perpendicular plane, the collimator control unit causes the arm-shape collimators to block a charged particle beam that would otherwise irradiate outside of the edge of the irradiation target.

Abstract: In one aspect, an ion source for use in a mass spectrometry system is disclosed, which comprises a housing, a first and a second ion probe coupled to said housing, and a first and a second emitter configured for coupling, respectively, to said first and second ion probes. The first ion probe is configured for receiving a sample at a flow rate in nanoflow regime and the second ion probe is configured for receiving a sample at a flow rate above the nanoflow regime. Each of the ion probes includes a discharge end (herein also referred to as the discharge tip) for ionizing at least one constituent of the received sample. In some embodiment, each ion probe receives the sample from a liquid chromatography (LC) column. Further, the ion probes can be interchangeably disposed within the housing.

Abstract: The invention relates to a measuring device for a scanning probe microscope that includes a sample receptacle which is configured to receive a measurement sample to be examined, a measuring probe which is arranged on a probe holder and has a probe tip with which the measurement sample can be measured. A displacement device is configured to move the measuring probe and the sample receptacle relative to each other, in order to measure the measurement sample, such that the measuring probe, in order to measure the measurement sample, executes a raster movement relative to said measurement sample in at least one spatial direction. Movement measurement signals indicating a first movement component in a first spatial direction that disrupts the raster movement and a second movement component in a second spatial direction that disrupts the raster movement, which second spatial direction extends transversely to the first spatial direction.

Abstract: A method of analyzing a sample, the method includes separating precursor ions from the sample into narrow mass range groups based on mass-to-charge ratio; fragmenting the ions from each group to create groups of fragment ions; and mass analyzing fragment ions from each group of fragment ions using a long transient time mass analyzer, wherein the separation and fragmentation are decoupled from the mass analyzing and the cycle time of the high transient mass analyzer is greater than about five times longer than the cycle time of a narrow mass range scan time, and wherein the separation and fragmentation has a high duty cycle and the mass analyzing has a high duty cycle.

Abstract: An ion implantation has an ion source and a mass analyzer configured to form and mass analyze an ion beam. A bending element is positioned downstream of the mass analyzer, and respective first and second measurement apparatuses are positioned downstream and upstream of the bending element and configured to determine a respective first and second ion beam current of the ion beam. A workpiece scanning apparatus scans the workpiece through the ion beam. A controller is configured to determine an implant current of the ion beam at the workpiece and to control the workpiece scanning apparatus to control a scan velocity of the workpiece based on the implant current. The determination of the implant current of the ion beam is based, at least in part, on the first ion beam current and second ion beam current.

Abstract: A mass spectrometer comprising: a vacuum chamber; and an ion inlet assembly for transmitting analyte ions into the vacuum chamber; wherein the spectrometer is configured to operate in a cooling mode in which it selectively controls one or more gas flow to the ion inlet assembly for actively cooling the ion inlet assembly.

Abstract: The present disclosure relates to a light and disinfection system, comprising: a lighting system which includes an illumination source and a diffusion hood suitable for the illumination source; a disinfection system which includes a disinfection light source and a cover adapted to transmit the disinfection light source, wherein the diffusion hood and the cover are respectively used for the illumination source and the disinfection light source.

Abstract: An electron optical system includes an electromagnetic lens configured to include a yoke, and refract an electron beam passing through the yoke by generating a magnetic field, and a shield coil disposed along the inner wall of the yoke, and configured to reduce a leakage magnetic field generated by the electromagnetic lens.

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.

Abstract: The present invention in general relates to a method of localization and structural characterization of peptides in a formaldehyde-fixed paraffin-embedded biological sample using matrix assisted ionization (such as in MALDI). Specifically, the invention relates to the combination of the development of a sample preparation protocol which does not require any enzymatic digestion nor antigen-retrieval steps, with highly sensitive mass spectrometry.

Abstract: A volume interrogation system can use an accelerated beam of charged particles to interrogate objects using charged-particle attenuation and scattering tomography to screen items such as portable electronic devices, packages, baggage, industrial products, or food products for the presence of materials of interest inside. The exemplary systems and methods in this patent document can be employed in checkpoint applications to scan items. Such checkpoint applications can include border crossings, mass transit terminals (subways, buses, railways, ferries, etc.), and government and private-sector facilities.

Abstract: A thermal field emitter, an apparatus, and a method for generating multiple beams for an e-beam tool are provided. The thermal field emitter includes an electron emitting portion configured to emit an electron beam and a nano-aperture array (NAA) having a plurality of openings. The NAA is positioned in a path of the electron beam. The NAA is configured to form multiple beams. The multiple beams include electrons from the electron beam that pass through the plurality of openings.

Abstract: A scanning electron microscopy (SEM) system is disclosed. The SEM system includes an electron source configured to generate an electron beam and a set of electron optics configured to scan the electron beam across the sample and focus electrons scattered by the sample onto one or more imaging planes. The SEM system includes a first detector module positioned at the one or more imaging planes, wherein the first detector module includes a multipixel solid-state sensor configured to convert scattered particles, such as electrons and/or x-rays, from the sample into a set of equivalent signal charges. The multipixel solid-state sensor is connected to two or more Application Specific Integrated Circuits (ASICs) configured to process the set of signal charges from one or more pixels of the sensor.