Abstract: The disclosure concerns an applicator for applying a coating agent (e.g. thick matter) to a component (e.g. motor vehicle body part) with a nozzle with a nozzle opening with a certain nozzle geometry, in particular for applying a thick matter bead to a component surface. The disclosure provides that the nozzle geometry of the nozzle opening can be adjusted without replacing the nozzle, in particular by a relative movement of two nozzle parts. Furthermore, the disclosure comprises an exchange part for such an applicator and an operating method therefor.

Abstract: A semiconductor processing station including a central transfer chamber, a load lock chamber disposed adjacent to the central transfer chamber, and a cooling stage disposed adjacent to the load lock chamber and the central transfer chamber is provided. The load lock chamber is adapted to contain a wafer carrier including a plurality of wafers. The central transfer chamber communicates between the cooling stage and the load lock chamber to transfer a wafer of the plurality of wafers between the cooling stage and the load lock chamber.

Abstract: A fluid application device includes an applicator head and a nozzle assembly fluidically coupled to the applicator head. The nozzle assembly includes a first conduit configured to receive a first fluid from the applicator head, the first conduit having a first inlet configured to receive the first fluid and a flow-distributing channel downstream from, and in fluid communication with the fluid inlet, the flow-distributing channel configured to direct the first fluid in a lateral direction. The nozzle assembly further includes an application conduit having a first fluid receiving section configured to receive the first fluid from the flow-distributing channel, and an orifice fluidically connected to the application conduit, the orifice configured to discharge the first fluid for application onto a strand of material.

Abstract: A rotary atomizer is disclosed for the even distribution of a treatment fluid within a treatment chamber. The treatment fluid is delivered onto a rotating disk atomizer through multiple outlet ports. Fluid passages provide each outlet port with an even flow of treatment fluid at generally the same time and rate. This even and simultaneous flow of treatment fluid results in a more even distribution of treatment fluid on the seed that flows through the treatment chamber throughout the treatment cycle.

Abstract: An arrangement (40) and process for coating a vehicle component (30) with a solid lubricant including a thermal spray device (10) having a spray direction along a spray line (S) corresponding to a central axis of a spray plume (16); a solid lubricant injection device (20) having an injection direction along an injection line (L) corresponding to a central axis of an injection plume (24); and a vehicle component (30) to be coated, having a surface (31) arranged at a distance (d) from an outlet orifice (13) of the thermal spray device (10) along the spray line (S). The solid lubricant injection device (20) is positioned such that the injection line (L) intersects the spray line (S) at an intersection point (P), which is intermediate the outlet orifice (13) of the thermal spray device (10) and the surface (31) of the component (30) to be coated. Also a process for thermal spray coating a vehicle component (30) with a solid lubricant coating and a vehicle, with such a coated component.

Abstract: A system for producing three-dimensional objects forms fluid paths within the support structure to facilitate the removal of the support structure following manufacture of the object. The system includes a first ejector configured to eject a first material towards a platen to form an object, a second ejector configured to eject a second material towards the platen to form support for portions of the object, at least one portion of the support having a body with at least one fluid path that connects at least one opening in the body to at least one other opening in the body, and a fluid source that connects to the at least one fluid path of the support to enable fluid to flow through the at least one fluid path to remove at least an inner portion of the support from the object.

Abstract: A coating system for coating objects with a coating material includes at least one material source for a coating material, which can be fluidically connected to an application device. A feed system can be used for feeding coating material back to its material source in a feeding-back direction over a feed path. It can be determined by means of a detection device whether coating material or some other material is present in a control portion of the feed path, the detection device generating a corresponding output signal. Also specified is a method for coating objects in which it is determined during the feeding back of coating material to its material source whether regions made up of material other than the coating material are being carried along by the coating material to be fed back.

Abstract: An aerial cable treatment system having a cable surface preparation assembly and a coating assembly. The cable treatment system is translatable along an in-situ aerial cable. The cable surface preparation assembly can remove dirt and debris, such as carbon deposit, grease, mud, fertilizers, bird droppings, fungal growth, mosses, soot, ice, and like from aerial cables with varying sizes as it translates along the cable. The coating assembly can apply a coating to the outer surface of the in-situ aerial cable it translates along the cable.

Abstract: A coating processing apparatus includes: a substrate holding part for horizontally holding a substrate and configured to rotate around a vertical axis; a coating liquid supply part for supplying a coating liquid onto the substrate; a cup body surrounding the substrate; an annular exhaust path formed along a circumferential direction of the cup body between an inner peripheral surface of the cup body and an inner member installed inside the cup body; a coating liquid collecting member installed to cover the exhaust path and having an opening, and configured to collect the coating liquid scattering from the substrate; at least one solvent storage portion formed in the coating liquid collecting member and configured to store a first solvent for dissolving the coating liquid collected in the coating liquid collecting member; and a solvent supply part for supplying the first solvent to the at least one solvent storage portion.

Abstract: The present invention provides a laser cladding nozzle apparatus, where the laser cladding nozzle apparatus is mounted on a laser head, and the laser cladding nozzle apparatus includes a conical nozzle head, where the conical nozzle head is connected to an inner side of the laser head; the conical nozzle head includes a plurality of first powder channels, a plurality of first inlets is evenly distributed on an upper end circumference of the conical nozzle head, a plurality of first outlets is evenly distributed on a lower end circumference of the conical nozzle head, the first inlet is in communication with the first outlet through the first powder channel, and a size and a quantity of the first inlet are the same as those of the first outlet. The present invention further provides a puncturing method for a laser cladding nozzle apparatus.

Abstract: This document relates to adhesive application devices and methods for applying an adhesive on a shoe during manufacturing.

Abstract: The present disclosure discloses a fixing apparatus for fixing a substrate to be processed below a bearing base during an evaporation process, the substrate to be processed includes a base substrate, a ferromagnetic material is formed on a front surface or a back surface of the base substrate, and a magnetic field generator is disposed on a back surface of the bearing base at a location corresponding to the ferromagnetic material; the magnetic field generator is configured to generate a magnetic field so that the ferromagnetic material and the magnetic field generator are approaching to each other under an effect of the magnetic field generated by the magnetic field generator to fix a front surface of the bearing base with the back surface of the base substrate. An evaporation method is further disclosed.

Abstract: The present disclosure relates to a semiconductor processing apparatus. The processing chamber includes a chamber body and lid defining an interior volume, a substrate support disposed in the interior volume and a showerhead assembly disposed between the lid and the substrate support. The showerhead assembly includes a faceplate configured to deliver a process gas to a processing region defined between the showerhead assembly and the substrate support and an underplate positioned above the faceplate, defining a first plenum between the lid and the underplate, the having multiple zones, wherein each zone has a plurality of openings that are configured to pass an amount of inert gas from the first plenum into a second plenum defined between the faceplate and the underplate, in fluid communication with the plurality of openings of each zone such that the inert gas mixes with the process gas before exiting the showerhead assembly.

Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.

Abstract: An applicator for applying adhesive to a moving web has a housing with an interior chamber, an inlet and a discharge port. The inlet and discharge port are in fluid communication with the interior chamber. A rotor is disposed within the interior chamber of the housing. The rotor has a body and a nonlinear channel extending about at least a portion of the body. The nonlinear channel is selectively positionable for fluid communication with the inlet and the discharge port of the housing such that adhesive flowing into the housing through the inlet flows through and is directed by the nonlinear channel to the discharge port in the housing. The rotor is rotatable relative to the housing to change the position of the nonlinear channel relative to the discharge port and thereby change the location from which adhesive flows from the discharge port.

Abstract: According to various embodiments, a wafer chuck may include at least one support region configured to support a wafer in a receiving area; a central cavity surrounded by the at least one support region configured to support the wafer only along an outer perimeter; and a boundary structure surrounding the receiving area configured to retain the wafer in the receiving area.

Abstract: A rubber fixing apparatus and a coater are provided. The rubber fixing apparatus includes: a storing device, in which a cavity configured to receive at least one rubber and an outlet communicated with the cavity are provided; and a fixing structure provided on the storing device and outside the cavity. The rubber is moved from the cavity through the outlet in a first direction and is fixed to the fixing structure.

Abstract: A system for delivering and applying a flowable mixture to an article (311-313) is disclosed. The system includes a mixture delivery system (200) and a skinning system (300). The mixture delivery system (200) includes a mixer (220) configured to mix a dry material and a fluid to produce the flowable mixture, and a pump (235) configured to pump the flowable mixture to a delivery line. The skinning system (300) receives the flowable mixture from the mixture delivery system (200) through the delivery line. The skinning system (300) includes a skinning pipe (310) configured to apply the flowable mixture to the article (311-313) and a manifold (305) that supports the skinning pipe (310). The skinning system (300) also includes an article feeding mechanism (315) configured to push the article (311-313) into the skinning pipe (310). The skinning system (300) includes a transfer system (320) configured to hold the article (311-313) and move the article (311-313) out of the skinning pipe (310).

Abstract: Embodiments described herein relate to a thermal chamber utilized in the processing of display substrates. The thermal chamber may be part of a larger processing system configured to manufacture OLED devices. The thermal chamber may be configured to heat and cool masks and/or substrates utilized in deposition processes in the processing system. The thermal chamber may include a chamber body defining a volume sized to receive one or more cassettes containing a plurality of masks and/or substrates. Heaters coupled to the chamber body within the volume may be configured to controllably heat masks and/or substrates prior to deposition processes and cool the masks and/or substrates after deposition processes.

Abstract: An embodiment includes a support unit, substrate treating apparatus and substrate treating method. The substrate treating apparatus comprises: a process chamber having a treatment space inside thereof; a support unit for supporting a substrate inside of the process chamber; and a gas supply unit for supplying the treatment gas into the treatment space, wherein the support unit comprises: an electrode layer of a metal material to which a high frequency electric power can be applied; a ground line having one end connected to the electrode layer and the other end grounded; and a switch provided on the ground line.