Patent number: 7959310
Abstract: An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.
Type:
Grant
Filed:
September 13, 2007
Date of Patent:
June 14, 2011
Assignees:
Carl Zeiss SMT GmbH, ASML Netherlands B.V.
Inventors:
Dirk Heinrich Ehm, Annemieke Van De Runstraat, Bastiaan Theodoor Wolschrijn, Arnoldus Jan Storm, Thomas Stein, Marco G. H. Meijerink, A. G. Ton M. Bastein, Esther L. J. Van Soest-Vercammen, Norbertus Benedictus Koster, Frits G. H. M. Gubbels, Peter J. Oprel, Michiel Nienoord, Michel Riepen, Johannes Hubertus Josephina Moors
Publication number: 20080143981
Abstract: An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.
Type:
Application
Filed:
September 13, 2007
Publication date:
June 19, 2008
Applicants:
Carl Zeis SMT AG, ASML Netherlands B.V.
Inventors:
Dirk Heinrich EHM, Annemieke van de Runstraat, Bastiaan Theodoor Wolschrijn, Arnoldus Jan Storm, Thomas Stein, Marco G. H. Meijerink, A. G. Ton M. Bastein, Esther L. J. van Soest-Vercammen, Norbertus Benedictus Koster, Frits G. H. M. Gubbels, Peter J. Oprel, Michiel Nienoord, Michel Riepen, Johannes Hubertus Josephina Moors